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841.
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843.
A nearly free sustained copper (Cu) film system has been successfully fabricated by thermal evaporation deposition of Cu atoms on silicone oil surfaces, and a characteristic ordered pattern has been systematically studied. The ordered pattern, namely, band, is composed of a large number of parallel key-formed domains with different width w but nearly uniform length L; its characteristic values of w and L are very susceptible to the growth period, deposition rate and nominal film thickness. The formation mechanism of the ordered patterns is well explained in terms of the relaxation of the internal stress in the films, which is related to the nearly zero adhesion of the solid-liquid interface. By using a two-time deposition method, it is confirmed that the ordered patterns really form in the vacuum chamber. 相似文献
844.
Fifth-order phase-sensitive detection of ultrafast polarization beats in cascade four-level system 下载免费PDF全文
We study the colour-locked twin-noisy-field correlation effects in the fifth-order nonlinear susceptibility of ultrafast polarization beats in a cascade four-level system. More importantly, the fifth-order phase-sensitive heterodyne detection of ultrafast polarization beats has been exploited. The fifth-order nonlinear optical response can be controlled and modified through the colour-locked correlation of twin noisy fields. Thus, this method with the phase dispersion information is a good way to measure the real and imaginary parts of the fifth-order nonlinear susceptibility. 相似文献
845.
The general expressions of the average dissipative and dipole forces acting on a A-configuration three-level atom in an arbitrary light field are derived by means of the optical Bloch equations based on the atomic density matrix elements, and the general properties of the average dissipative and dipole forces on a three-level atom in the linearly-polarized high-order Bessel beams (HBBs) are analysed. We find a resonant property (with two resonant peaks) of the dissipative force and a non-resonant property (with two pairs of non-resonant peaks) of the dipole force on the three-level atom, which are completely different from those on the two-level atom. Meanwhile we find a saturation effect of the average dissipative force in the HBB, which comes from the saturation of the upper-level population. Our study shows that the general expressions of the average dissipative and dipole forces on the three-level atom will be simplified to those of the two-level atom under the approximation of large detuning. Finally, we study the axial and azimuthal Doppler cooling of atoms in ID optical molasses composed of two counter-propagating HBBs and discuss the azimuthal influence of the HBB on the Doppler cooling limit. We also find that the Doppler limit of atoms in the molasses HBB is slightly below the conventional Doppler limit of hГ/(2kB) due to the orbital angular momentum lh of the HBB. 相似文献
846.
Complex wave excitations general (2+1)-dimensional and chaotic patterns for a Korteweg-de Vries system 下载免费PDF全文
Starting from an improved mapping approach and a linear variable separation approach, a new family of exact solutions (including solitary wave solutions, periodic wave solutions and rational function solutions) with arbitrary functions for a general (2+1)-dimensional Korteweg de solutions, we obtain some novel dromion-lattice solitons, system Vries system (GKdV) is derived. According to the derived complex wave excitations and chaotic patterns for the GKdV 相似文献
847.
研究了沉积银原子及其团簇在液相基底(硅油)表面的凝聚过程随基底温度的变化关系.实验结果表明:当硅油基底温度升高时,沉积银原子及其团簇的凝聚过程仍基本符合二阶段生长模型; 样品具有明显的边缘效应,在样品中心区域,凝聚体的覆盖率比边缘的相应值小,样品中心区域的凝聚体覆盖率先随薄膜名义厚度的增加迅速增大,然后逐渐趋于饱和,覆盖率趋于饱和时的膜厚值随基底温度的升高而降低; 对于一定的薄膜名义厚度,硅油基底温度越高,中心区域的凝聚体覆盖率越小.银原子凝聚体的分枝平均长度随基底温度的演化过程也具有类似的规律.对沉积银
关键词:
薄膜
液相基底
分枝状凝聚体
生长模型 相似文献
848.
849.
分别在苏打石灰玻璃、Mo箔、无择优取向的Mo薄膜以及(110)择优取向的Mo薄膜四种不同衬底上,采用共蒸发工艺沉积约2μm厚的Cu(In,Ga)Se2薄膜,用X射线衍射仪测量薄膜的织构,研究衬底对Cu(In,Ga)Se2薄膜织构的影响.在以上四种衬底上沉积的Cu(In,Ga)Se2薄膜的(112)衍射峰强度依次逐渐减弱,(220/204)衍射峰从无到有且强度逐渐增强.在苏打石灰玻璃和Mo箔衬底上的Cu(In,Ga)Se2薄膜具有明显的(112)择优生长,而在(110)取向的Mo薄膜衬底上,Cu(In,Ga)Se2薄膜的织构为(220/204)取向.研究结果表明,只有(110)择优取向的Mo薄膜衬底对Cu(In,Ga)Se2薄膜(220/204)织构的形成有重要影响. 相似文献
850.