非周期多层膜Kirkpatrick-Baez显微镜成像

从光线传播的角度分析了非周期多层膜Kirkpatrick-Baez(KB)显微镜的成像性能,并与单层膜KB显微镜、周期多层膜KB显微镜进行了对比。与单层膜KB显微镜相比,多层膜KB显微镜提高了工作掠入射角度,在同样分辨力和集光效率要求下具有更大的视场。周期多层膜KB显微镜的反射率和能量分辨本领高于非周期多层膜KB显微镜,但非周期多层膜元件具有较大的角度带宽和均一的反射率,克服了周期多层膜KB显微镜视场范围和像场均匀性的不足。在此基础上,制备了中心角度1.133 0°的非周期多层膜反射镜元件,以8 keV能量的X射线光管为背光源进行了KB显微镜成像实验,实验结果与理论分析一致。     

基于辅助光学系统的KB显微镜瞄准方法

 研究了利用辅助可见光系统精确瞄准KB显微镜物点的方法。设计了工作能点8 keV的周期多层膜KB显微镜系统,通过光线追迹和X射线成像实验,得到5 μm空间分辨率所对应的视场和景深,进而计算出诊断实验对应的指向和景深要求。基于KB系统的物像关系和精度要求,设计了辅助的可见光成像系统,实现了可见光系统与X射线KB系统间的等效瞄准,利用耦合好的系统进行了瞄准和X射线成像实验。实验结果表明:辅助光路可以实现±20 μm的垂轴面和±300 μm的轴向定位精度,满足KB显微镜的瞄准要求。     

Mo/Si多层膜表面保护层设计

为提高Mo/Si多层膜的稳定性与使用寿命,通过分析多层膜驻波电场的分布,对表面保护层及多层膜最上层材料的厚度进行优化设计,使优化后的反射率最高.计算表明,一定厚度的表面保护层总对应一个最优的最上层材料厚度.在13.36 nm波长,膜对数为50的Mo/Si多层膜10度入射的理论反射率为74.47%;当添加厚度为2.3 nm的Ru作为表面保护层,对应多层膜最上层Si的优化厚度为3.93 nm,其理论反射率为75.20％.设计结果表明,通过优化设计表面保护层,可以提高多层膜稳定性,改善多层膜性能.     

Influence of interface roughness on reflectivity of tungsten/boron-carbide multilayers with variable bi-layer number by X-ray reflection and diffuse scattering

Infuence of interface roughness on the reflectivity of Tungsten/boron-carbide （W/B4C） multilayers varying with bi-layer number, N, is investigated. For W/B4C multilayers with the same design period thickness of 2.5 nm, a real-structure model is used to calculate the variation of reflectivities with N = 50, 100, 150, and 200, respectively. Then, these multilayers are fabricated by a direct current （DC） magnetron sputtering system. Their reflectivity and scattering intensity are measured by an X-ray diffractometer （XRD） working at Cu Kα line. The X-ray reflectivity measurement indicates that the reflectivity is a function of its bi-layer number. The X-ray scattering measured results show that the interface roughness of W/B4C multilayers increases slightly from layer to layer during multilayer growing. The variation of the reflectivity and interface roughness with bi-layer number is accurately explained by the presented realstructure model.     

30.4 nm波长处Mg基多层膜反射镜

太阳光谱中重要的He-Ⅱ谱线(波长30.4 nm)的观测对于研究太阳活动和日地空间环境具有重要意义,实现空间极紫外太阳观测需要采用多层膜作为反射元件.研究了工作在30.4 nm的Mg基多层膜.以反射率最高为评价函数设计了多层膜,采用直流磁控溅射技术制备了SiC/Mg,B4C/Mg和C/Mg多层膜,用X射线衍射仪测量了多层膜的结构.研究表明虽然B4C/Mg多层膜理论反射率最高,但实际制备结果显示,SiC/Mg多层膜的成膜质量最好,反射率最高.同步辐射反射率测量表明:在入射角10°时实测的SiC/Mg多层膜反射率为44.6%.     

Thinning and polishing of cross-section of depth-graded WSi2 /Si multilayer for linear zone plate application

A linear zone plate named multilayer laue lens (MLL) is fabricated using a depth-graded multilayer structure. The lens shows considerable potential in focusing an X-ray beam into a nanometer scale with high efficiency. In this letter, a depth-graded multilayer consisting of 324 alternating WSi 2 and Si layers with a total thickness of 7.9 μm is deposited based on the thickness sequence according to the demands of the zone plate law. Subsequently, the multilayer sample is sliced and thinned to an ideal depth along the cross-section direction using raw abrasives and diamond lapping. Finally, the cross-section is polished by a chemical mechanical polishing (CMP) technique to remove the damages and improve the surface smoothness. The final depth of the MLL is approximately 7 μm with an achieved aspect ratio greater than 400. Results of scanning electron microscopy (SEM) and atomic force microscopy (AFM) indicate that interfaces are sharp, and the multilayer structure remains undamaged after the thinning and polishing processes. The surface roughness achieved is 0.33 nm.     

Fabrication and characterization of sliced multilayer transmission grating for X-ray region

To develop high quality dispersion optics in the X-ray region, the sliced multilayer transmission grating is examined. Dynamical diffraction theory is used to calculate the diffraction property of this volume grating. A WSi 2 /Si multilayer with a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a superpolished silicon substrate by direct current magnetron sputtering technology. To make the transmission grating, the multilayer is sliced and thinned in the cross-section direction to a depth of 23-25 μm. The diffraction efficiency of the grating is measured at E = 8.05 keV, and the 1st-order efficiency is 19%. The sliced multilayer grating with large aspect ratio and nanometer period can be used for high efficiency and high dispersion optics in the X-ray region.     

适用于激光聚变实验的短焦距高放大倍率Wolter显微镜设计

围绕内爆压缩及阻滞阶段相关物理实验的诊断需求,提出了一种满足阿贝正弦条件的短焦距高放大倍率Wolter-Ⅲ型X射线显微镜的光学设计。详细介绍了Wolter-Ⅲ型显微镜的结构特点和设计方法,与Wolter-Ⅰ型相比可以通过将主平面向靠近物点方向移动的方式减小系统焦距,从而获得更大的放大倍数,实现显微镜与探测器的像质匹配,提高诊断系统的空间分辨。由光线追迹可以得出,在±190 μm的视场范围内,空间分辨率优于3 μm;在±240 μm范围内分辨率优于5 μm;在±300 μm范围内分辨率优于8 μm,几何集光立体角约为5×10?6 sr。     

Epoxy replication of hard X-ray supermirrors

The direct replication of W/Si supermirrors is investigated systematically. W/Si supermirrors are fabricated by direct current(DC) magnetron sputtering technology. After deposition,the supermirrors are replicated from the supersmooth mandrels onto ordinary float glass substrates by epoxy replication technique. The properties of the supermirrors before and after the replication are characterized by grazing incidence X-ray reflectometry(GIXR) measurement and atomic force microscope(AFM) . The results show that before and after replication,the multilayer structures are almost the same and that the surface roughness is 0.240 and 0.217 nm,respectively,which are close to that of the mandrel. It is demonstrated that the W/Si supermirrors are successfully replicated from the mandrel with good performance.     

Color space conversion of digital photofinishing by neural network

Digital photofinishing is developed with the combine ofdigital technology and silver printing technology. To re-produce high-quality image on printing paper, the colorspace conversion between colorimetric values and expo-sure control must be set up. However, this relation isvery difficult and is almost impossible to be expressedby a theoretical equation. Currently, neural network andthree-dimensional lookup table (3D LUT) are the rela-tively feasible method[1]. Comparatively, neural networkc…