微小孔径激光器的光谱特性综述

微小孔径激光器(Very-small-aperture laser,VSAL)是近年发展起来的新型有源纳米激光光源。出射光端面的孔径形状是决定其性能的重要因素之一。多种异形孔径被先后提出并证明能极大地提高VSAL的出射效率。相关研究结果表明,常规孔径形状的通光效率随入射波长的增大急剧下降,但异形孔径的通光效率会出现一个谐振峰,在谐振峰位置通光效率得到了显著的提高。通过改变孔径形状参数或增加表面纳米形貌结构,可以调整纳米孔径本身的谐振波长峰值,改善VSAL的性能。综述了纳米孔径的光谱特性以及利用这种特性优化VSAL的性能,并对未来的研究前景做了适当的展望。     

6H-SiC晶片的退火处理

本文在背景Ar气压力为8×104Pa、温度为1800～2000℃的条件下,对升华法生长SiC单晶的籽晶进行了原位退火处理,利用原子力显微镜和光学显微镜对退火后的6H-SiC晶片表面进行了观察,研究了退火温度和时间对晶片表面的影响.发现经过退火处理后的籽晶表面存在规则的生长台阶,有助于侧面生长模式的发展,进一步有助于台阶流生长模式的发展.通过对籽晶的退火处理,降低了螺旋生长中心的密度,从而减少多型夹杂、小角度晶界和微管等缺陷的出现,提高了晶体质量.     

Efficiency droop in InGaN/GaN-based LEDs with a gradually varying In composition in each InGaN well layer

Temperature-dependent and driving current-dependent electroluminescence spectra of two different InGaN/GaN multiple quantum well structures SA and SB are investigated,with the In composition in each well layer(WL)along the growth direction progressively increasing for SA and progressively decreasing for SB.The results show that SB exhibits an improved efficiency droop compared with SA.This phenomenon can be explained as follows:owing to the difference in growth pattern of the WL between these two samples,the terminal region of the WL in SB contains fewer In atoms than in SA,and therefore the former undergoes less In volatilization than the latter during the waiting period required for warming-up due to the difference in the growth temperature between well and barrier layers.This results in SB having a deeper triangular-shaped potential well in its WL than SA,which strongly confines the carriers to the initial region of the WL to prevent them from leaking to the p-GaN side,thus improving the efficiency droop.Moreover,the improvement in the efficiency droop for SB is also partly attributed to its stronger Coulomb screening effect and carrier localization effect.     

Comparison of Different Crucible Materials for the Growth of AlN Crystals

Choice of crucible material is a key issue during the growth of AlN crystal. The stabilities at high temperature and life-spans of boron nitride (BN) crucible,tantalum (Ta) crucible and tungsten (W) crucible were compared. Tantalum crucible behaved worse at high temperature and life-span was shortened as compared with the other two crucible materials. It was very crisp and easy to crack. In contrast,self-seeded AlN crystals with different morphologies could be obtained at different high temperatures using BN crucible. The boron nitride crucible was stable below 2200 ℃,above which it would decompose. Thus it was unsuitable for the bulky AlN crystal growth. Tungsten crucible could endure the temperatures higher than 2200℃. Unfortunately we could only get AlN polycrystallines using tungsten crucible. After 50～100 hours’ run,the crucible was destroyed completely due to the multiple deep cracks. XRD results of destroyed tungsten crucible indicated that the main phases are tungsten carbide and tungsten nitride.     

8英寸导电型4H-SiC单晶的生长

采用物理气相传输(PVT)法扩径获得了8英寸(1英寸=2.54 cm)4H-SiC籽晶,用于8英寸导电型4H-SiC晶体生长,并加工出厚度520 μm的8英寸4H-SiC衬底。使用拉曼光谱、全自动显微镜面扫描、非接触电阻率测试仪面扫描和高分辨X射线衍射仪对衬底的晶型、微管、电阻率和结晶质量进行了表征。衬底颜色均一并结合拉曼光谱表明衬底4H-SiC晶型面积比例为100%;衬底微管密度小于0.3 cm^-2;衬底电阻率范围20~23 mΩ·cm,平均值为22 mΩ·cm;(004)面高分辨X射线摇摆曲线半峰全宽为32.7″,表明衬底良好的结晶质量。     

碳化硅单晶位错研究进展

SiC作为代表性的第三代半导体材料,具有优异的物理化学性能。随着材料及应用的发展,SiC衬底在航天电源、电动汽车、智能电网、轨道交通、工业电机等领域的应用日益重要。相比第一代半导体材料如Si和第二代半导体材料如GaAs而言,SiC衬底质量还有很大的改善空间,是现阶段研发和产业的热点。其中SiC单晶缺陷,特别是一维位错缺陷的检测和降低,是近10年内重要的研究内容。本文重点对SiC中位错的形成原因、位错检测技术、位错密度降低方法及近年来SiC单晶中位错的优化水平进行总结归纳,并提出了SiC需要继续突破和发展的方向。     

半绝缘SiC单晶生长和表征

使用升华法生长碳化硅(SiC)单晶,借助数值模拟方法优化温场,在不同条件下分别获得单一晶型的4H-SiC和6H-SiC单晶,利用拉曼光谱进行表征。采用V掺杂的方法,制备半绝缘SiC单晶,使用非接触式电阻率测试仪进行了测试,并对4H-SiC和6H-SiC电阻率进行了比较和分析。     

MOCVD growth of AlGaInP/GaInP quantum well laser diode with asymmetric cladding structure for high power applications

In order to improve the characteristics of the general broad-waveguide 808-nm semiconductor laser diode (LD),we design a new type quantum well LD with an asymmetric cladding structure.The structure is grown by metal organic chemical vapor deposition (MOCVD).For the devices with 100-μm-wide stripe and 1000-μm-long cavity under continuous-wave (CW) operation condition,the typical threshold current is 190 mA,the slope efficiency is 1.31 W/A,the wall-plug efficiency reaches 63%,and the maximum output power reac...     

纳米氮化铝常压溶剂热合成及其光致发光

低温常压下,在有机溶剂中制备出了氮化铝纳米晶.通过XRD、FTIR和定域电子衍射分析,样品中立方相和六方相共存;经XRD和TEM分析,样品中颗粒的平均粒度约为50nm;在样品的PL谱中,在475nm有一个非常强的由氮空位引起的发射峰,而在550nm有一个由AlN的本征缺陷及纳米颗粒的表面效应引起的宽且弱的发射峰.     

Ⅲ-Ⅴ族半导体纳米晶体表面对氮分子的吸附作用

研究了Ⅲ-Ⅴ族半导体纳米晶表面氧化状态对它们表面活性的影响,并比较了具有不同阳离子的纳米晶体对氮分子吸附能力的差异,对这些现象进行了解释;用XPS、红外光谱等测试手段对样品进行了性质表征.结果表明:当Ⅲ-Ⅴ族半导体纳米晶表面氧化严重时,其表面活性明显降低;含Ga的Ⅲ-Ⅴ族半导体纳米晶对氮分子的吸附作用明显强于含In的纳米晶.这是因为Ga能够与氮分子形成较强的配位键,对氮分子的吸附作用增强.