伪随机编码超宽带短脉冲的探测能力研究

 为进行弱信号检测,研究在脉冲雷达中获得大信号时间宽度与信号带宽积的方法,利用伪随机编码方法调制超宽带短脉冲,可以在保持子脉冲信号带宽的情况下,以低功率发射长脉冲串类噪声信号,而提高信号的能量,提高探测距离。通过仿真实验得出,利用伪随机编码技术可以使超宽带信号具有更强的探测能力,可以在回波信号功率水平远远小于噪声水平（如信噪比5%）的情况下实现对探测目标的高保真成像。     

光学表面非均匀中频误差的评价与修正

针对光学元件使用过程中中频误差将导致光学元件的激光破坏这一问题,提出一种中频误差突出频率提取方法。采用基于统计学的多样本数据处理,对于每一种采样方向都可以得到数个较为突出的不合格频率。利用这些频率进行确定性加工后,在特定方向,空间频率0.044 1 mm-1,0.085 8 mm-1,0.041 7 mm-1所出现的不合格次数分别降至加工前的23.9%,18.3%,29.2%,而整体中频误差减少至50.1%。结果表明,此方法降低了由光学表面中频误差方向性与局部性引起的不确定性。     

N2/Ti微空心阴极放电等离子体阴极溅射模拟

采用Monte Carlo方法模拟N2/Ti微空心阴极放电等离子体阴极溅射过程,其中,氮离子(N2+,N+)轰击阴极表面采用PIC/MC模型模拟.计算溅射钛原子的热化过程、钛原子的密度及其平均能量分布.结果表明,沿各方向溅射出的90%金属Ti原子所带的初始能量小于30 eV,其散射角主要分布在30°和60°之间;溅射Ti原子在离微空心阴极壁约0.04 mm处出现热化极大值.     

界面态电荷对n沟6H-SiC MOSFET场效应迁移率的影响

针对界面态密度在禁带中的不均匀分布，分析了界面态电荷对n沟6H碳化硅MOSFET场效应迁移率的影响.分析结果显示，界面态电荷使n沟碳化硅器件的场效应迁移率明显降低.并给出了实验测定的场效应迁移率和反型层载流子迁移率的比值与界面态密度之间关系. 关键词： 碳化硅 界面态 反型层迁移率 场效应迁移率     

Bias dependence of a deep submicron NMOSFET response to total dose irradiation

Deep submicron n-channel metal-oxide-semiconductor field-effect transistors (NMOSFETs) with shallow trench isolation (STI) are exposed to ionizing dose radiation under different bias conditions.The total ionizing dose radiation induced subthreshold leakage current increase and the hump effect under four different irradiation bias conditions including the worst case (ON bias) for the transistors are discussed.The high electric fields at the corners are partly responsible for the subthreshold hump effect.Charge trapped in the isolation oxide,particularly at the Si/SiO 2 interface along the sidewalls of the trench oxide creates a leakage path,which becomes a dominant contributor to the offstate drain-to-source leakage current in the NMOSFET.Non-uniform charge distribution is introduced into a threedimensional (3D) simulation.Good agreement between experimental and simulation results is demonstrated.We find that the electric field distribution along with the STI sidewall is important for the radiation effect under different bias conditions.     

消荧光现象与表面谐波产生

消荧光现象是激光与物质表面非线性相互作用的结果，这是一种普遍现象。在表面谐波产生的研究中，它常常被忽略。大量研究表明：表面谐波产生与消荧光现象，有着密切的内在联系。本文以消荧光观点详细讨论了表面谐波产生的机制，提出了表面谐波产生的消荧光模型。新机制可归纳为：（ａ）多光子受激吸收产生消荧光光斑，（ｂ）激光热效应等促进自发辐射转向准受激辐射，（ｃ）伴随荧光消失，部分产生荧光的激光能量转换为产生表面谐波     

$lt;i$gt;γ$lt;/i$gt;射线总剂量辐照效应对应变Sip型金属氧化物半导体场效应晶体管阈值电压与跨导的影响研究

分析了双轴应变Si p型金属氧化物半导体场效应晶体管(PMOSFET)在γ射线辐照下载流子的微观输运过程, 揭示了γ射线的作用机理及器件电学特性随辐照总剂量的演化规律, 建立了总剂量辐照条件下的双轴应变Si PMOSFET 阈值电压与跨导等电学特性模型, 并对其进行了模拟仿真. 由仿真结果可知, 阈值电压的绝对值会随着辐照总剂量的积累而增加, 辐照总剂量较低时阈值电压的变化与总剂量基本呈线性关系, 高剂量时趋于饱和; 辐照产生的陷阱电荷增加了沟道区载流子之间的碰撞概率, 导致了沟道载流子迁移率的退化以及跨导的降低. 在此基础上, 进行实验验证, 测试结果表明实验数据与仿真结果基本相符, 为双轴应变Si PMOSFET辐照可靠性的研究和应变集成电路的应用与推广提供了理论依据和实践基础. 关键词： 应变Sip型金属氧化物半导体场效应晶体管 总剂量辐照 阈值电压 跨导     

基于倏逝波界面散射的单个纳米颗粒无标记成像

介绍了一种利用倏逝波界面散射对单个纳米颗粒进行无标记成像的方法。分别使用全内反射(TIR)倏逝波与表面等离激元(SPPs)两种倏逝波与单个纳米颗粒相互作用,激发纳米颗粒极化并发生散射,所产生的界面散射与入射倏逝波发生干涉,形成了纳米颗粒极化场与抛物线形干涉条纹的特征成像。分别对直径为500,200,100nm的聚苯乙烯颗粒进行了单个纳米颗粒无标记成像。比较了两种倏逝波界面散射对单个纳米颗粒成像结果,发现表面等离激元界面散射成像中的单个纳米颗粒极化强度约是全内反射极化强度的10倍,并且接近于暗场成像。因此,表面等离激元界面散射对单个纳米颗粒无标记成像具有更高灵敏度。所提单个纳米颗粒无标记成像方法可以拓展到病毒检测、生物单分子成像等领域。     

Nano-Crystalline Diamond Films with Pineapple-Like Morphology Grown by the DC Arcjet vapor Deposition Method

A nano-crystlline diamond film is grown by the dc arcjet chemical vapor deposition method. The film is characterized by scanning electron microscopy, high-resolution transmission electron microscopy （HRTEM）, x-ray diffraction （XRD） and Ftaman spectra, respectively. The nanocrystalline grains are averagely with 80hm in the size measured by XRD, and further proven by Raman and HRTEM. The observed novel morphology of the growth surface, pineapple-like morphology, is constructed by cubo-octahedral growth zones with a smooth faceted top surface and coarse side surfaces. The as-grown film possesses （100） dominant surface containing a little amorphous sp2 component, which is far different from the nano-crystalline film with the usual cauliflower-like morphology.     

A MOCVD-Growth Multi-Wavelength Laser Monolithically Integrated on InP

We present an arrayed waveguide grating multi-wavelength laser （MWL）. The device is operated with five wave- length channels of 194 GHz spacing around a central wavelength of 1.57μm. A side mode suppression ratio of better than 35 dB for all channels is demonstrated. A very attractive feature of the MWL is that it has been realized by a novel one step regrowth approach to achieve a high quality active and passive interface.