LD抽运被动调Q固体激光器的脉冲稳定性

报道了二极管激光抽运Cr,Nd∶YAG被动调Q Nd∶YVO4 1064 nm激光输出.为了提高被动调Q激光的输出稳定性,谐振腔采用长腔,增益介质位于谐振腔中间位置.实验中获得了稳定的被动调Q激光输出.在最高入射抽运功率为17.5 W时,脉冲重复频率达到71.3 kHz,脉冲宽度为0.4 μs.调Q脉冲幅度不稳定性低于±10%,脉冲时间波动性低于±3.5%.     

超Li系统的Bargmann对称约束和双非线性化

给出超Li系统的一个显式对称约束和关于其Lax对的双非线性化.在此对称约束下,超Li系统的时间部分和空间部分分别被约化为有限维Liouville可积超Li系统.     

广义逆矩阵行处理法

给出求解满足关系式ＡＡ＾＋Ａ＝Ａ的广义逆矩阵Ａ＾＋的行处理法并证明算法的正确性的收敛性。     

加速行处理法q叉树MIMD算法

利用正交化行处理法、行处理法贪心方法和分治策略给出一个基于分布式存储多指令流多数据流(multiple instruction stream,multiple dsts stream,MIMD)一级q叉树树机模型求解任意线性代数方程组的并行迭代算法，证明算法对相容性线性代数方程组收敛并分析算法的通信复杂度。     

关于迭代数列的审敛法

从迭代数列及其基本性质出发,给出单调有界定理、压缩映象原理、Cauchy收敛准则和上(下)极限四种判别迭代数列收敛的方法.     

强相依高斯序列的最大值与和的联合渐近分布

{X_n,n≥1)是标准高斯序列,T_(ij)=cov(X_i,X_j)。本文在强相依条件rijlog(j-i)→r∈(0,∞)(j-i→ ∞)下,得到了高斯序列的最大值M_n与标准化部分和S_n=sum from i=1 to n(X_i/(E(sum from i=1 to n X_i)~2)/(1/2))     

反应条件对水热合成二硫化镍NiS2粉晶的影响

本文采用水热法一步合成了二硫化镍粉晶,利用X射线衍射(XRD),扫描电子显微镜讨论了样品N iS2粉晶的晶体结构及形貌,研究了X射线衍射峰积分强度以及半峰宽等随反应条件的变化,并分析了N iS2粉晶的合成机理.     

计算机辅助教学通用子程序二则

在计算机辅助教学工作中,充分利用BASIC语言的人机对话功能和图形处理功能,可使教学程序更加形象直观,灵活方便。本文通过两则简短的教学子程序,和同志们交流探讨。     

Design and preparation of LWIR narrow-band filter with wide rejection band

In this letter, using mult-half-wave structure and some chosen films optimized method, the long-wave infrared （LWIR） narrow-band pass filter is investigated, meanwhile the opposite of the substrate coated with long-wavelength pass film. The transmittance of design spectrum is more than 80% at wavelength region of 8.05 8.35 μm, and the average transmittance is less than 0.5% at wavelength region of less than 7.95 and 8.45 14 pro. The filter is prepared by thermal evaporation method, and plasma-assisted deposition technology. The experiment result shows that the average transmittance is about 75% in the transmission wavelength range, and the average transmittance of cut-off band is about 0.3%. The results show that multi-half-wave structure and some chosen films optimized method for the preparation LWIR narrow-band pass filter are feasible. The film system is simplified and is convenient to prepare the film.     

Hard X-ray one dimensional nano-focusing at the SSRF using a WSi2 /Si multilayer Laue lens

The multilayer Laue lens (MLL) is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current (DC) magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35-41 μm. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility (SSRF). One-dimensional (1D) focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale.