排序方式: 共有30条查询结果,搜索用时 15 毫秒
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采用化学气相沉积方法,在无催化剂的条件下,通过改变衬底位置在Si(100)衬底上制备出了高取向的磷掺杂ZnO纳米线和纳米钉.测试结果表明,当衬底位于反应源上方1.5 cm处时,所制备的样品为钉状结构,而当衬底位于反应源下方1 cm处时样品为线状结构.对不同形貌磷掺杂ZnO纳米结构的生长机理进行了研究.此外,在ZnO纳米结构的低温光致发光谱中观测到了一系列与磷掺杂相关的受主发光峰.还对磷掺杂ZnO纳米结构/n-Si异质结I-V曲线进行了测试,结果表明,该器件具有良好的整流特性,纳米线和纳米钉异质结器件的开启电压分别为4.8和3.2 V. 相似文献
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Effect of Different Substrate Temperature on Phosphorus-Doped ZnO Thin Films Prepared by PLD on Sapphire Substrates 下载免费PDF全文
Phosphorus-doped ZnO (ZnO:P) thin films are deposited on a c-plane sapphire in oxygen at 350℃, 450℃, 550℃ and 650℃, respectively, by pulsed laser deposition (PLD), then all the ZnO:P samples are annealed at 650℃ in oxygen with a pressure of 1 × 10^5 Pa. X-ray diffraction measurements indicate that the crystalline quality of the ZnO:P thin films is improved with the increasing substrate temperature from 350℃ to 550℃. With a further increase of the deposition temperature, the crystalline quality of the ZnO:P sample is degraded. The measurements of low-temperature photoluminescence spectra demonstrate that the samples deposited at the substrate temperatures of 350℃ and 450℃ show a strong acceptor-bound exciton (A^0X) emission. The electrical properties of ZnO:P films strongly depend on the deposition temperature. The ZnO:P samples deposited at 350℃ and 450℃ exhibit p-type conductivity. The p-type ZnO:P film deposited at 450℃ shows a resistivity of 1.846Ω·cm and a relatively high hole concentration of 5.100 × 10^17 cm^-3 at room temperature. 相似文献
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取向Zn1-xMgxO纳米线阵列的制备及光学特性 总被引:1,自引:0,他引:1
采用化学气相沉积(CVD)法, 以高纯ZnO、Mg和活性C混合粉末为原料, 在Si(111)衬底上制备了不同配比的取向Zn1-xMgxO纳米线阵列. 用X射线衍射仪(XRD), 扫描电镜(SEM), 能量色散X射线分析(EDAX)及光致发光(PL)光谱分析仪对样品的晶体结构、形貌、成分组成和光致发光特性进行了分析. 用霍尔效应测量系统测试了不同配比样品的载流子浓度. 实验发现, 当Zn1-xMgxO纳米线阵列中Mg原子相对Zn原子摩尔比x值较小时(x<0.29), XRD衍射谱中只有ZnO晶体标准衍射峰, 没有MgO晶体衍射峰, 说明此时制备的Zn1-xMgxO纳米线样品晶格结构以ZnO纤锌矿结构为主, Mg原子只是作为替位或填隙原子分布在ZnO晶体中. 但当样品中x>0.53时, ZnO与MgO的特征衍射峰同时出现在样品的衍射谱图中, 说明随原料中Mg原子摩尔比的增加, 制备的Zn1-xMgxO纳米阵列样品中ZnO纤锌矿结构与MgO岩盐结构同时存在, 样品呈现多晶体结构形式. 实验还对比了制备的纯ZnO与不同配比的Zn1-xMgxO纳米线阵列的光致发光光谱和载流子浓度, 发现随Mg含量的增加, Zn1-xMgxO阵列紫光发光峰出现了较明显的蓝移现象, 同时, 测试结果也表明, 随Mg含量的增加, Zn1-xMgxO阵列的紫光和绿光峰发光强度都有所减弱, 样品的载流子浓度也随之下降. 文章对实验结果进行了分析和探讨. 相似文献
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利用外电场辅助化学气相沉积(CVD)方法,在蓝宝石衬底上制备出了由三组生长方向构成的网格状β-Ga2O3纳米线.研究了不同外加电压大小对β-Ga2O3纳米线表面形貌、晶体结构以及光学特性的影响.结果表明:外加电压的大小对样品的表面形貌有着非常大的影响,有外加电场作用时生长的β-Ga2O3纳米线取向性开始变好,只出现了由三组不同生长方向构成的网格状β-Ga2O3纳米线;并且随着外加电压的增加,纳米线分布变得更加密集、长度明显增长.此外,采用这种外电场辅助的CVD方法可以明显改善样品的结晶和光学质量. 相似文献
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Realization of Ultraviolet Electroluminescence from ZnO Homojunction Fabricated on Silicon Substrate with p-Type ZnO:N Layer Formed by Radical N2O Doping 下载免费PDF全文
ZnO homojunction light-emitting diodes are fabricated on Si(100) substrates by plasma assisted metal organic chemical vapour deposition. A p-type layer of nitrogen-doped ZnO film is formed using radical N2O as the acceptor precursor. The n-type ZnO layer is composed of un-doped ZnO film. The device exhibits desirable rectifying behaviour with a turn-on voltage of 3.3 V and a reverse breakdown voltage higher than 6 V. Distinct electrolumineseence emissions centred at 395nm and 490nm are detected from this device at forward current higher than 20mA at room temperature. 相似文献
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Ag掺杂对ZnO薄膜的光电性能影响 总被引:3,自引:1,他引:3
采用超声喷雾热分解法在石英衬底上以醋酸锌水溶液为前驱体,以硝酸银水溶液为Ag掺杂源,以高纯O2为载气生长了Ag掺杂ZnO(ZnO∶Ag)薄膜。研究了Ag掺杂ZnO薄膜的表面结构、电学和光学性质。结果表明所得ZnO∶Ag薄膜表面结构良好,扫描电子显微镜(SEM)测试表明薄膜表面光滑平整,结构致密均匀;在室温光致发光(PL)光谱中检测到很强的近带边紫外发光峰;透射光谱中观测到非常陡峭的紫外吸收截止边和较高的可见光区透过率,表明薄膜具有较高的晶体质量与较好的光学特性;霍尔效应测试表明,在550℃下获得了p型导电的ZnO∶Ag薄膜。 相似文献
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Effect of Au/Ni/4H–SiC Schottky junction thermal stability on performance of alpha particle detection 下载免费PDF全文
Au/Ni/n-type 4H–SiC Schottky alpha particle detectors are fabricated and annealed at temperatures between 400℃ and 700℃ to investigate the effects of thermal stability of the Schottky contact on the structural and electrical properties of the detectors. At the annealing temperature of 500?C, the two nickel silicides(i.e., Ni_(31)Si_(12) and Ni_2Si) are formed at the interface and result in the formation of an inhomogeneous Schottky barrier. By increasing the annealing temperature,the Ni_(31)Si_(12) transforms into the more stable Ni_2Si. The structural evolution of the Schottky contact directly affects the electrical properties and alpha particle energy resolutions of the detectors. A better energy resolution of 2.60% is obtained for 5.48-MeV alpha particles with the detector after being annealed at 600℃. As a result, the Au/Ni/n-type 4 H–SiC Schottky detector shows a good performance after thermal treatment at temperatures up to 700℃. 相似文献
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研究了MOCVD系统中原位SiN插入层对GaN薄膜应力和光学性质的影响。采用SiN插入层后,GaN薄膜的裂纹数量大大减少,薄膜所承受的张应力得到了一定的释放。同时,GaN薄膜的缺陷密度降低一倍,晶体质量得到了极大的改善。研究表明,位错密度的降低在GaN薄膜中留存较大的残余应力,补偿了降温过程中所引入的张应力。同样,随着SiN插入层的应用,低温PL谱的半峰宽降低,薄膜光学质量提高。最后研究了PL谱发光峰与应力的关系,得到了一个-13.8的线性系数。 相似文献