Accuracy design of ultra-low residual reflection coatings for laser optics

Refractive index inhomogeneity is one of the important characteristics of optical coating material, which is one of the key factors to produce loss to the ultra-low residual reflection coatings except using the refractive index inhomogeneity to obtain gradient-index coating. In the normal structure of antireflection coatings for center wavelength at 532 nm, the physical thicknesses of layer H and layer L are 22.18 nm and 118.86 nm, respectively. The residual reflectance caused by refractive index inhomogeneity(the degree of inhomogeneous is between -0.2 and 0.2) is about 200 ppm, and the minimum reflectivity wavelength is between 528.2 nm and 535.2 nm. A new numerical method adding the refractive index inhomogeneity to the spectra calculation was proposed to design the laser antireflection coatings, which can achieve the design of antireflection coatings with ppm residual reflection by adjusting physical thickness of the couple layers. When the degree of refractive index inhomogeneity of the layer H and layer L is-0.08 and 0.05 respectively, the residual reflectance increase from zero to 0.0769% at 532 nm. According to the above accuracy numerical method, if layer H physical thickness increases by 1.30 nm and layer L decrease by 4.50 nm, residual reflectance of thin film will achieve to 2.06 ppm. When the degree of refractive index inhomogeneity of the layer H and layer L is 0.08 and -0.05 respectively, the residual reflectance increase from zero to 0.0784% at 532 nm. The residual reflectance of designed thin film can be reduced to 0.8 ppm by decreasing the layer H of 1.55 nm while increasing the layer L of 4.94 nm.     

双离子束溅射中红外SiO2薄膜热稳定性研究

通过双离子束溅射方法在蓝宝石、硅衬底上制备了单层SiO2薄膜,分析了SiO2薄膜残余应力、表面形貌、微观结构以及光学性能(可见-近红外0.4~1.2 μm和中红外3~5 μm波段)在400 ℃~1 000 ℃温度范围内的演化规律.研究结果表明:在400 ℃附近,SiO2薄膜残余应力存在局部极小值;SiO2薄膜光学性能的演化与膜层表面质量、内部残余应力及微观结构变化密切相关;经1 000 ℃高温处理后,蓝宝石窗口表面SiO2薄膜红外透射性能仍能保持很好的稳定性,且膜层表面没有出现显著的气泡、开裂等损伤形貌.该研究结果可为恶劣环境下光学窗口头罩表面薄膜系统的设计提供指导.     

周期结构薄膜在折射率色散下反射区特性研究

周期性结构是光学薄膜设计的基本物理模型,给出了反射区中心波长的一般性条件,研究了在膜层材料存在折射率色散情况下,等厚周期结构和非等厚周期结构的薄膜反射区中心波长与带宽特性.研究结果表明:在等厚和非等厚周期结构中,考虑膜层材料折射率色散与忽略色散情况相比,中心波长向长波方向移动,反射级次与相对波数的线性关系偏离;在薄膜光学厚度一定的非等厚周期结构中,高折射率层光学厚度大于低折射率层时,反射级次与相对波数的线性关系偏离度高;非等厚周期结构薄膜的带宽在低反射级次上小于等厚周期结构,同时膜层的色散对反射带宽影响不大.     

金属氧化物薄膜在中波红外光谱区内光学常数色散特性

基于金属氧化物薄膜材料在中波红外波段应用的需求,研究了含水状态的TiO2、HfO2、Ta2O5和Y2O34种金属氧化物薄膜在中波红外波段内(2.5~5μm)光学常数的色散特性。利用电子束蒸发沉积技术,在超光滑的硅表面制备了4种氧化物薄膜,基于洛仑兹振子介电常数色散模型,通过透射率光谱反演计算了4种氧化物薄膜的光学常数。研究结果表明:4种氧化物均有少量的水分子、羟基,水含量从少到多的薄膜依次为TiO2、HfO2、Ta2O5和Y2O3,在远离水吸收的位置,消光系数从小到大的薄膜分别为TiO2、HfO2、Ta2O5和Y2O3;在电子束蒸发沉积工艺条件下,为了降低水的影响,TiO2和HfO2是中红外波段较为理想的金属氧化物薄膜材料。