GaAs/AlGaAs量子线的制备和光致荧光谱

利用分子束外延材料的化学选择腐蚀和再生长制备出了GaAs/AIGaAs量子线并且测量了77K的光致荧光谱.也得到透射电子显微镜的照片. 关键词：     

氮化镓基发光二极管产业化中的材料物理问题

第三代半导体氮化镓化合物半导体已成为蓝光发光二极管的主流材料,国际上的产业化已成规模,国内也有多家处于中试阶段,由于氮化镓基材料中有如此多的问题没有解决,材料制备设备,器件工艺也极需改进及优化,这既给了中国科研人员及工程技术人员一个机遇,也使他们面临着严峻的挑战.     

COULOMB BLOCKADE OSCILLATIONS OF Si SINGLE-ELECTRON TRANSISTORS

Coulomb blockade oscillations of Si single-electron transistors, which are fabricated completely by the conventional photolithography technique, have been investigated. Most of the single-electron transistors clearly show Coulomb blockade oscillations and these oscillations can be periodic by applying negative voltages to the in-plane gates. A shift of the peak positions is observed at high temperatures. It is also found that the fluctuation of the peak spacing cannot be neglected.     

SINGLE-ELECTRON TRANSISTORS FOR FUTURE APPLICATIONS

Single electron transistors with wire channels are fabricated by a nanoelectrode-pair technique. Their characteristics strongly depend on the channel widths and the voltages on the in-plane gates. A few dips in the Coulomb blockade oscillations were observed at the less positive gate voltages for a device with a 70nm-wide wire due to Coulomb blockade between the coupled dots. By applying negative voltages to the in-plane gates, the oscillations became periodic, which indicated the formation of a single dot in the conducting channel. These gates facilitate fabricating single-electron transistors with single dot structures, which have potential applications on its integration.     

Synthesis and Optical Properties of ZnO Nanostructures

ZnO nanostructures with different morphologies were fabricated by changing the partial oxygen pressure. The structures, morphologies and optical properties of ZnO nanostructures were investigated by x-ray diffraction, field emission scanning electron microscopy and photoluminescence (PL) spectra at room temperature. All the samples show preferred orientation along the c-axis. The oxygen partial pressure and the annealing atmosphere have important effect on the PL property of ZnO nanostructures. The high oxygen partial pressure during growth of samples and high-temperature annealing of the ZnO samples in oxygen can increase oxygen vacancies and can especially increase antisite oxygen (OZn) defects, which degraded the near band-edge emission. However, the annealing in 1-12 can significantly modify the NBE emission.     

Properties of InGaP／GaAs Grown by Solid-Source Molecular Beam Epitaxy with a GaP Decomposition Source

Lattice-matched InGaP on GaAs (001) was successfully grown by solid-source molecular beam epitaxy witha GaP decomposition source. A 0.5-μm-thick InGaP epilayer shows photoluminescence peak energy as large as 1.991eV at 15K, the full width at half maximum as small as 9.4meV and x-ray diffraction rocking curve linewidth as narrow as 25 arcsec. The electron mobilities of undoped and Si-doped InGaP layers obtained by Hall measurements are comparable to similar InGaP/GaAs heterojunction grown by solid-source molecular beamepitaxy with other sources or other growth techniques. The results reveal that the InGaP/GaAs heterojunction grown bY the present growth way have great potential applications for semiconductor devices.     

用推广的平面波展开法检验平面内极化的电子子带跃迁

把平面波展开包络函数的方法推广到求解8带的哈密顿量，使它同时包括Γ^c₁和Γ^v₁₅．在这种方法里，可以考虑反演不对称性、能带的非抛物性、有效质量不连续性以及自旋轨道耦合等效应的影响．作为应用，计算了两个量子阱结构的子带和光跃迁概率．实验上在这两个结构中观察到了平面内极化的电子子带跃迁．计算表明这种跃迁的概率很小．实验上观察到的平面内极化的电子子带吸收可能有其他的机制 关键词：     

(110)取向的调制掺杂GaAs-AIGaAs单异质结的光致荧光谱

测量了含碳量高低不同的(110)取向的调制掺杂GaAs-Al_0.3Ga_0.7As单异质结在4.2K下的光致荧光谱。在含碳量高的样品中,出现了强的沟道二维电子到受主的复合荧光峰;而在含碳量很低的样品的光致荧光中则只出现体GaAs的荧光峰。     

Electroluminescence of an n-ZnO/p-GaN Heterojunction under Forward and Reverse Biases

Electroluminescent characteristics of n-ZnO/p-GaN heterojunctions under forward and reverse biases are studied. Emissions at 389nm and 57Ohm are observed under forward bias. An unusual emission at 390ram appears under reverse bias, and is attributed to the recombination in the p-GaN side of the heterojunction. The yellow emission peaked at 57Ohm is suppressed under reverse bias. The light intensity exponentially depends on the reverse current. The emission under reverse bias is correlated to tunnelling carrier transport in the heterostructure. Our results also support that the well-known yellow band of GaN comes from the transitions between some near-conduction-band-edge states and deep localized acceptor states.     

Growth of Highly Conductive n-Type Al0.7Ga0.3N Film by Using AlN Buffer with Periodical Variation of Ⅴ/Ⅲ Ratio

High quality and highly conductive n-type Al0.7Ga0.3N films are obtained by using AlN multi-step layers （MSL） with periodical variation of Ⅴ/Ⅲ ratios by low-pressure metalorganic chemical vapour deposition （LP-MOCVD）. The full-width at half-maximum （FWHM） of （0002） and （1015） rocking curves of the Si-doped Al0.7Ga0.3N layer are 519 and 625 arcsec, respectively, Room temperature （RT） Hall measurement shows a free electron concentration of 2.9 × 10^19 cm^-3, and mobility of 17.8cm^2V^-1s^-1, corresponding to a resistivity of 0.0121 Ω cm. High conductivity of the Si-doped AlGaN film with such high Al mole fraction is mainly contributed by a remarkable reduction of threading dislocations （TDs） in AlGaN layer. The TD reducing mechanism in AlN MSL growth with periodical variation of Ⅴ/Ⅲ ratio is discussed in detail.