Ni(110)上氯和氧共吸附表面的结构和性质

用XPS,UPS,AES和功函数测定等方法考察了氯和氧在Ni(110)上的共吸附。氯强烈阻碍了氧的接续吸附;相反,氯接续吸附的速度和吸附量却因氯能驱使预吸附的氧溶入体相而没有明显影响。角分辨XPS分析为这一共吸附模型提供了进一步的证据。共吸附表面上氯和氧的热脱附和两者单独在Ni(110)表面上热脱附过程相似,但两者的脱附温度都有明显的降低。对共吸附和热脱附的机理进行了详细的讨论。     

Nb表达的清洁处理

本文介绍了用电子束加热（1500℃）及同时用氩离子溅射的方法进行金属Nb的表面清洁处理，处理结果良好。     

Structure and properties of Ni(110) surface coadsorbing chlorine and oxygen

The coadsorption of chlorine with oxygen on Ni(110) surface has been investigated by XPS, UPS, AES and work function measurements. The chlorine preadsorption drastically inhibits the further uptake of oxygen. On the contrary, precovered oxygen has hardly any influence on the additional adsorption of chlorine due to the incorporation of precovered oxygen into the subsurface driven by the chlorine coadsorption. ARXPS measurements provide the evidence for this coadsorption model. The thermal desorption of chlorine and oxygen from the coadsorption surface is very similar to that of both individual adsorbates under the same heating conditions, but the desorption temperature of both the adsorbates apparently decreases on the coadsorption surface. The coadsorption and thermodesorption mechanisms are also discussed in detail.     

SrS/α-SiO~2界面的XPS研究

TFEL器件中绝缘层与发光层之间的界面对电荷的输运特性、发光特性等有着十分重要的作用。本文通过XPS的测量,分析了新结构器件中SrS/α-SiO~2界面的各成分的芯电子能谱的变化和深度分布,发现Sr^2^+向SiO~2中扩散较深并以氧化物的形态存在,介质层以SiO~x(x=1.65～1.70)的形态存在。这些丰富的界面态有可能成为TFEL器件的初电子源而对SrS:Ce发光有贡献。     

硫化的MoO_3/γ—Al_2O_3催化剂的表面结构和价态的研究

本文应用XPS、ESR和TEM等手段研究了硫化的MoO_3/γ-Al_2O_3催化剂样品,在不同钼含量、不同硫化条件以及进行甲烷反应前后,其表面结构和价态的变化规律。观察到硫化时Mo~( 6)。还原为Mo~( 5)和Mo~( 4)的变化过程。硫化除了生成S~(-2)价态外,还有硫的高价中间态生成。证明了经甲烷化反应后,表面上的MoS_2晶粒明显长大。