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41.
Incident laser modulation of a repaired damage site with a rim in fused silica rear subsurface
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Local CO2 laser treatment has proved to be an effective method to prevent the 351-nm laser-induced damage sites in a fused silica surface from exponentially growing, which is responsible for limiting the lifetime of optics in high fluence laser systems. However, the CO2 laser induced ablation crater is often surrounded by a raised rim at the edge, which can also result in the intensification of transmitted ultraviolet light that may damage the downstream optics. In this work, the three-dimensional finite-difference time-domain method is developed to simulate the distribution of electrical field intensity in the vicinity of the CO2 laser mitigated damage site located in the exit subsurface of fused silica. The simulated results show that the repaired damage sites with raised rims cause more notable modulation to the incident laser than those without rims. Specifically, we present a theoretical model of using dimpled patterning to control the rim structure around the edge of repaired damage sites to avoid damage to downstream optics. The calculated results accord well with previous experimental results and the underlying physical mechanism is analysed in detail. 相似文献
42.
Rear-surface light intensification caused by a Hertzian-conical crack in 355-nm silica optics
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Theoretical studies show that a Hertzian-conical crack can be considered to be composed of double cone faces for simplicity. In the present study, the three-dimensional finite-difference time-domain method is employed to quantify the electric-field distribution within the subsurface in the presence of such a defect under normal incidence irradiation. Both impurities (inside the crack) and the chemical etching have been investigated. The results show that the maximum electric field amplitude |E| max is 9.57374 V/m when the relative dielectric constant of transparent impurity equals 8.5. And the near-field modulation will be improved if the crack is filled with the remainder polishing powders or water vapor/drops. Meanwhile, the laser-induced initial damage moves to the glass-air surface. In the etched section, the magnitude of intensification is strongly dependent on the inclination angle θ. There will be a highest modulation when θ is around π/6, and the maximum value of |E| max is 18.57314 V/m. When θ ranges from π/8 to π/4, the light intensity enhancement factor can easily be larger than 100, and the modulation follows a decreasing trend. On the other hand, the modulation curves become smooth when θ > π/4 or θ < π/8. 相似文献
43.
Surface defects,stress evolution,and laser damage enhancement mechanism of fused silica under oxygen-enriched condition
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Wei-Yuan Luo 《中国物理 B》2022,31(5):54214-054214
Oxygen ions (O+) were implanted into fused silica at a fixed fluence of 1×1017 ions/cm2 with different ion energies ranging from 10 keV to 60 keV. The surface roughness, optical properties, mechanical properties and laser damage performance of fused silica were investigated to understand the effect of oxygen ion implantation on laser damage resistance of fused silica. The ion implantation accompanied with sputtering effect can passivate the sub-/surface defects to reduce the surface roughness and improve the surface quality slightly. The implanted oxygen ions can combine with the structural defects (ODCs and E' centers) to reduce the defect densities and compensate the loss of oxygen in fused silica surface under laser irradiation. Furthermore, oxygen ion implantation can reduce the Si-O-Si bond angle and densify the surface structure, thus introducing compressive stress in the surface to strengthen the surface of fused silica. Therefore, the laser induced damage threshold of fused silica increases and the damage growth coefficient decreases when ion energy up to 30 keV. However, at higher ion energy, the sputtering effect is weakened and implantation becomes dominant, which leads to the surface roughness increase slightly. In addition, excessive energy aggravates the breaking of Si-O bonds. At the same time, the density of structural defects increases and the compressive stress decreases. These will degrade the laser laser-damage resistance of fused silica. The results indicate that oxygen ion implantation with appropriate ion energy is helpful to improve the damage resistance capability of fused silica components. 相似文献
44.
Bright blue photoluminescence from a mixed tin and manganese oxide xerogel prepared via solben hydrothermalben gel process
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A new blue photoluminescent material, a mixed tin and manganese oxide xerogel, is prepared via sol-hydrothermal-gel process assisted by citric acid. The composition xerogel exhibits strong blue emission at room temperature, with an emission maximum at 434 nm under short (234 nm) or long-wavelength (343 nm) ultraviolet excitation. The photoluminescent excitation spectrum of the mixed tin and manganese oxide xerogel, monitored at an intensity maximum wavelength of 434 nm of the emission, consists of two excitation peaks at 234 nm and 343 nm. With heat treatment temperature increasing from 110 ℃ to 200 ℃, the blue emission intensity increases remarkably, whereas it is almost completely quenched after being treated at 300 ℃. The carbon impurities in the mixed tin and manganese oxide xerogel, confirmed by Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy, should be responsible for the bright blue photoluminescence. 相似文献
45.
TiNiCu记忆合金在美国Argonne国家实验室IVEM Tandem National Facility加速器产生的400keV Xe+离子辐照到0.4dpa时发生非晶化转变。通过电子显微镜研究了非晶化的TiNiCu合金的回复和再结晶过程。退火加热的速度是10℃/min。在280℃时非晶环附近出现电子衍射斑点以及明场像中出现少量析出相,表明回复和再结晶开始。退火到550℃出现多晶环,650℃时有片状马氏体变体生成,750℃时有很锐利的多晶环出现,表明再结晶过程基本完成。经标定再结晶晶粒仍然是TiNiCu记忆合金。再结晶组织与辐照前TiNiCu 合金的显微组织相比有较大差异。 相似文献
46.
从惯性约束聚变(ICF)装置中靶场关键材料易受辐照损伤、从而限制材料使用寿命和装置稳定运行的现实问题出发,总结归纳了有关不锈钢、铝合金、终端光学组件三大类靶场关键材料的辐照效应研究进展,详细介绍了靶室内高能中子束、γ射线、X射线等高能粒子和射线引起靶室第一壁材料出现烧蚀、中子活化等辐照损伤问题,以及靶室环境对关键材料的影响和防护处理。此外,还阐述了打靶试验中所产生的复杂辐射环境、基频与三倍频激光对靠近靶室的终端光学组件所产生的各类辐照损伤现象和相关作用机理。 相似文献
47.
研究了CO2激光局域辐照对熔石英损伤特性的影响, 发现当辐照中心温度较低时(1139 K), 辐照对损伤阈值没有明显影响, 但辐照中心温度较高时(1638 K), 辐照对损伤阈值有明显的影响, 损伤阈值随距离辐照中心间距的增大而减小, 在残余应力产生光程差最大处附近, 损伤阈值降到最小, 随着与辐照中心间距的进一步增加, 损伤阈值略有上升. 对导致此现象的原因做了分析. 由于残余应力的存在, 在辐照中心发生再损伤产生的裂纹后, 裂纹先沿径向扩展, 在残余应力产生光程差最大处附近, 裂纹转而向切向扩展, 这可能与径向和环向张应力随半径的变化有关. 在采用热处理炉退火消除残余应力时, 必须注意元件的洁净处理, 否则退火会出现析晶现象, 对损伤阈值和透射率造成不良影响.
关键词:
2激光局域辐照')" href="#">CO2激光局域辐照
熔石英
损伤特性 相似文献
48.
Preparation of p-type ZnO:(Al, N) by a combination of sol--gel and ion-implantation techniques
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We report the preparation of p-type ZnO thin films on (0001)
sapphire substrates by a combination of sol--gel and
ion-implantation techniques. The results of the Hall-effect
measurements carried out at room temperature indicate that the
N-implanted ZnO:Al films annealed at 600\du\ have converted to
p-type conduction with a hole concentration of
$1.6\times1018cm-3, a hole mobility of
3.67cm2/V.s and a minimum resistivity of
4.80cm.\Omega$. Ion-beam induced damage recovery has been
investigated by x-ray diffraction (XRD), photoluminescence (PL) and
optical transmittance measurements. Results show that diffraction
peaks and PL intensities are decreased by N ion implantation, but
they nearly recover after annealing at 600\du. Our results
demonstrate a promising approach to fabricate p-type ZnO at a low
cost. 相似文献
49.
研究不同参数退火处理的熔石英表面损伤修复点再次损伤及损伤增长时的形貌和损伤增长率的差异, 同时与未退火的基底及修复点的损伤增长行为对比. 结果表明: 未退火的修复点再次损伤后, 损伤点周围的裂纹会在应力的作用下继续扩展, 导致更加严重、尺寸更大的损伤点; 当退火处理将修复点周围应力导致的光程差控制在25 nm左右时, 虽损伤增长速率较快, 但可有效抑制裂纹扩展. 同时研究结果也表明只要退火过程能将修复点周围应力导致的光程差控制在10 nm以下, 其损伤增长率与基底的损伤增长率没有明显差异, 从而可以有效控制修复点的损伤增长速率. 研究结果可为分析应力对修复点损伤增长的影响、指导退火参数的优化提供参考. 相似文献
50.
用1.064 μm波长的单脉冲(6 ns)激光对K9玻璃基底上电子束沉积的单层SiO2薄膜进行了辐照损伤实验。以扫描电镜对K9基底的断面进行分析,并采用表面热透镜装置对膜层中的缺陷进行了检测,最后采用Matlab偏微分工具箱对缺陷的散射光光场进行了有限元模拟。实验研究表明:膜层中存在缺陷,基底中也存在大量缺陷。模拟研究表明:缺陷的位置越深,形成的条纹间距也越宽;当缺陷的形状不规则时,在局部出现近似平行的纹波结构;当缺陷的数目增加时,这些缺陷的散射光的叠加就形成相互叠加的条纹。 相似文献