Tl系1223相超导体的不可逆线

研究了(Tl_(0.5)Pb_(0.5))(Sr_(0.8)Ba_(0.2))_2Ca_2Cu_3O_y超导体的不可逆场H~*(T),并与Y系、Bi系和Tl1212相超导体作了比较。实验表明,在77K下Tl 1223相的不可逆场高达5T。证明了该材料在高温下的磁通钉扎比Bi系超导体和Tl 1212相超导体强得多,并对此作了讨论,由磁滞回线估计的磁化电流密度J_c在77K和2T磁场下大于10~4A/cm~2。     

赝二元化合物Dy(Fe_(0.9)M_(0.1))_2(M=B,Al,Ga)的磁性研究

研究了赝二元化合物Dy(Fe_(0.9)M(0.1))_2(M=B,Al,Ga)的磁性。M对Fe的置换,使居里温度下降,Fe原子的磁矩改变。矫顽力随温度的降低,增加很快,增加的幅度与M有关。磁化强度的温度关系,在磁场小于临界值时,出现反常和热磁效应。用Fe原子局域环境的变迁和低温下内禀磁硬度的急剧增加,解释了上述现象。     

Re effects in model Ni-based superalloys investigated with first-principles calculations and atom probe tomography

The phase partition and site preference of Re atoms in a ternary Ni-Al-Re model alloy,including the electronic structure of different Re configurations,are investigated with first-principles calculations and atom probe tomography.The Re distribution of single,nearest neighbor(NN),next-nearest neighbor(NNN),and cluster configurations are respectively designed in the models withγandγphases.The results show that the Re atoms tend to enteringγphase and the Re atoms prefer to occupy the Al sites inγphase.The Re cluster with a combination of NN and NNN Re-Re pair configuration is not preferred than the isolated Re atom in the Ni-based superalloys,and the configuration with isolated Re atom is more preferred in the system.Especially,the electronic states are analyzed and the energetic parameters are calculated.The electronic structure analyses show there exists strong Ni-Re electronic interaction and it is mainly contributed by the d-d hybridization.The characteristic features of the electronic states of the Re doping effects are also given.It is also found that Re atoms prefer the Al sites inγside at the interface.The density of states at or near the Fermi level and the d-d hybridizations of NN Ni-Re are found to be important in the systems.     

无孪晶的LaBa_(2-x)Ca_xCu_3O_y系统的磁临界电流

测量了无孪晶的LaBaCaCu_3O_y和LaBa_(1.5)Ca_(0.5)Cu_3O-y的磁临界电流J_c,其数值及随温度的变化都与YBa_2Cu_3O_y系统比较接近,而与Tl_2Ba_2ca_2Cu_3O_y明显不同。这表明孪晶并不是使这些材料的临界电流有差别的主要因素。     

各种工艺因素对固着磨料抛光的影响

<正> 一、前言在光学加工技术中,一种全新的抛光方法——固着磨料抛光,已引起光学行业的普遍关注。其原因,是在于这种抛光方法,具有效率高、质量好、成本低和污染小等优点,特别是对中等尺寸、中等精度,批量生产的光学零件十分适合。为改变光学零件制造技术中落后的抛光工艺,提高经济效益,将起重要作用。固着磨料抛光是依赖于固着在抛光模中的磨料去完成抛光任务。在抛光的全过程中,抛光液中不需添加抛光粉,因而不同于传统的散粒磨料抛光方法。影响固着磨料抛光效果的工艺因素很多,诸如:机床参数、抛光模、玻璃材料、抛光液和加工时间等。因此,开展对以上各方面工作的研究,是必要和有意义的。这对合理选择各     

Dislocation formation and twinning from the crack tip in Ni3Al: molecular dynamics simulations

The mechanism of low-temperature deformation in a fracture process of L12 Ni3Al is studied by molecular dynamic simulations.Owing to the unstable stacking energy,the [01ˉ1] superdislocation is dissociated into partial dislocations separated by a stacking fault.The simulation results show that when the crack speed is larger than a critical speed,the Shockley partial dislocations will break forth from both the crack tip and the vicinity of the crack tip;subsequently the super intrinsic stacking faults are formed in adjacent {111} planes,meanwhile the super extrinsic stacking faults and twinning also occur.Our simulation results suggest that at low temperatures the ductile fracture in L12 Ni3Al is accompanied by twinning,which is produced by super-intrinsic stacking faults formed in adjacent {111} planes.     

埋置量子点应力分布的有限元分析

通过衬底材料和外延材料的交替生长方式制备出多层排列的自组装量子点超晶格结构.这些埋置量子点的应力/应变场影响着它们的光电性能、压电性能以及力学稳定性.基于各向异性弹性理论的有限元方法,研究了埋置金字塔形应变自组织Ge/Si半导体量子点的应力/应变分布以及流体静应变和双轴应变分布,并与非埋置量子点的应力/应变分布做了比较,指出了它们之间的异同以及覆盖层对量子点应力/应变分布的影响. 关键词： 量子点 应力分布 应变分布