HfO2薄膜生长应力演化研究

薄膜应力的存在是薄膜材料的本征特性,对过程中薄膜应力的测量与精确控制具有重要意义.搭建了基于双光束偏转基底曲率测量装置,再结合薄膜厚度的实时监控,实现了对薄膜应力演化过程的观测.对HfO2薄膜的生长过程做了实时研究.结果显示,在所研究条件下,HfO2薄膜的生长应力随厚度的增加,在360～660 MPa范围内变化;沉积温度越高,沉积真空度越高,张应力越大;在真空度较高的沉积条件下,薄膜应力强烈地受到基底表面的影响,随着薄膜厚度的增加,应力也趋于稳定.     

Preparation of CoFe alloy nanoparticles with tunable electromagnetic wave absorption performance

CoFe alloy nanoparticles with different particle sizes were successfully prepared by hydrogen-thermal reduction of CoFe₂O₄ microspheres at different temperatures. It was found that the real part of the permeability of the CoFe alloy nanoparticles increased with the decrease of the particle size, and accordingly the reflection loss (RL) peak moved towards the low-frequency region. The maximum RL of the coating based on CoFe alloy nanoparticles exceeded −23 dB, and a wide effective absorption band width (RL≤−10 dB) of about 6 GHz was simultaneously achieved. The EMA performance was confirmed to be tunable by the control of the absorber's particle size, and thus a new clue for the design of the EMA applications was supplied.     

Nuclear EMC effect in a statistical model

A simple statistical model in terms of light-front kinematic variables is used to explain the nuclear EMC effect in the range x[0.2,0.7], which was constructed by us previously to calculate the parton distribution functions (PDFs) of the nucleon. Here, we treat the temperature T as a parameter of the atomic number A, and get reasonable results in agreement with the experimental data. Our results show that the larger A, the lower T thus the bigger volume V, and these features are consistent with other models. Moreover, we give the predictions of the quark distribution ratios, i.e., q^A(x)/q^D(x), , and s^A(x)/s^D(x), and also the gluon ratio g^A(x)/g^D(x) for iron as an example. The predictions are different from those by other models, thus experiments aiming at measuring the parton ratios of anti-quarks, strange quarks, and gluons can provide a discrimination of different models.     

双轴晶体会聚偏光干涉的理论与实验研究

晶体会聚偏光干涉图包含了晶体特性的许多信息,建立偏光干涉图的定量分析方法可以使这些信息得到充分利用。基于双轴晶体折射时满足的波矢关系,导出了两折射光波相位差的精确计算公式。分析了光波在各界面折射时偏振态的变化,提出了会聚偏光干涉合成振幅的计算方法。针对任意取向的双轴晶体,计算了完整的偏光干涉图,反映了相位分布决定等色线、振幅分布决定消光影的规律。用数字图像模似了干涉图,并讨论了干涉图的变化情况。对4块不同取向的KTP晶片进行实验,实验干涉图与理论干涉图的特征完全一致,两者仔细对比可判断现有KTP晶体色散方程的优劣。     

具有存储功能的衍射图像光刻系统的研制

研制了一种在衍射光变图像器件上进行信息存储的新型数字化激光光刻系统。采用空间光调制器作图形自动输入,双远心投影成像系统在光刻记录面上缩微图形。通过光栅干涉光学头对记录面上的微图形进行干涉调制,使微图形上产生干涉条纹,条纹空间频率范围为500-1200lp／mm。在光刻胶干版上的存储实验表明,在衍射光变图像上的单角度存储信息密度大于3．7Mbit／cm^2。改变干涉条纹取向、条纹间隔和需要存储的图形,光刻系统可实现信息的旋转复用存储。上述光刻系统将会在防伪和衍射光变图像器件制造领域有良好应用。     

脉冲激光辐照光学薄膜的缺陷损伤模型

建立了缺陷吸收升温致薄膜激光损伤模型,该模型从热传导方程出发,考虑了缺陷内部的温度分布以及向薄膜的传导过程,通过引入散射系数简化了Mie散射理论得出的吸收截面.对电子束蒸发沉积的ZrO₂:Y₂O₃单层膜进行了激光破坏实验,薄膜样品的损伤是缺陷引起的,通过辉光放电质谱法对薄膜制备材料的纯度分析发现材料中的主要杂质元素为铂,其含量为0.9％.利用缺陷损伤模型对损伤过程进行了模拟,理论模型和实验结果取得了较好的一致性.     

On the Laplacian spectral radii of trees with perfect matchings

Denote by the set of trees of order 2k with perfect matchings. GUO [Guo, Linear Algebra Appl. 368:379–385, 2003.] determined the largest value of Laplacian spectral radii μ(T) of the trees T in and gave the corresponding tree T in whose μ(T) reaches this largest value. In this paper, we determine the second to the sixth largest values of μ(T) of the trees T in and also give the corresponding trees T in whose μ(T) reach these values.     

Synthesis and properties of thiophene-functionalized π-extended tetrathiafulvalenes

Two molecular ensembles composed of an array of thiophene-extended tetrathiafulvalene-thiophene were synthesized using Stille coupling and Horner-Wittig reaction as the key steps. Electrochemical redox and electronic absorption properties were investigated by voltammetric and UV-vis spectroscopic analyses.     

Synthesis and Structure of an Extremely Air‐Stable Binuclear Hafnocene Perfluorooctanesulfonate Complex and Its Use in Lewis Acid‐Catalyzed Reactions

Stable complexes : An extremely air‐stable μ²‐hydroxy‐bridged binuclear hafonocene perfluorooctanesulfoante complex shows high catalytic efficiency in Lewis acid‐catalyzed reactions, such as esterification, Friedel–Crafts acylation, the Mukaiyama aldol reation, and the allylation of aldehyde (see scheme).

     

稳定同位素表征有机物甲烷化代谢动力学

有机物甲烷化可通过乙酸发酵型、氢营养型和甲基营养型3种途径进行,确定各个途径对甲烷生成的贡献率是其动力学研究的基本问题,稳定同位素示踪技术是研究生态体系甲烷主导生成途径的创新方法.本文综述了稳定同位素技术表征甲烷生成途径的方法进展及影响测试解析结果的因素.产甲烷过程中的稳定同位素分馏效应是影响测试结果解析的关键,甲烷菌类型、生长阶段、底物丰度、温度等是其主要影响因素;对典型产甲烷生态体系进行控制实验,积累分馏效应数据及联合应用微生态分子生物学表征方法,是提高稳定同位素技术对甲烷生成途径区分水平的可行方法.联合应用稳定同位素表征技术和微生态原位表征方法,对高浓度有机酸胁迫条件下的生物质类有机物厌氧发酵甲烷化途径的研究结果表明,面临高浓度有机酸迅速累积的环境,中温发酵条件下,优势菌种为甲烷八叠球菌,依时间次序,通过乙酸发酵和氢营养型途径利用累积的有机酸产生甲烷;而在高温条件下,有机酸则通过乙酸氧化和氢营养型甲烷化途径的串联反应被降解.运用稳定同位素表征技术揭示甲烷生成途径可为针对性的微生态调控提供依据.