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31.
对于超细长弹性杆静力学的Kirchhoff方程,用动力学的概念和方法研究其常值特解 和稳定性问题.计算了Kirchhoff方程相对固定坐标系、截面主轴坐标系以及中心线Frenet 坐标系的常值特解,进行了Kirchhoff动力学比拟,用一次近似理论分别讨论了它们的Lyapu nov稳定性,导出了若干稳定性判据,并在参数平面上绘出了稳定域.
关键词:
超细长弹性杆
Kirchhoff方程
常值特解
Lyapunov稳定性 相似文献
32.
We shall answer several questions concerning additive or multiplicative commutators in a division ring which are algebraic of bounded degree over its center. 相似文献
33.
New heuristics for over-constrained flight to gate assignments 总被引:1,自引:0,他引:1
We consider the over-constrained Airport Gate Assignment Problem where the number of flights exceed the number of gates available, and where the objectives are to minimize the number of ungated flights and the total walking distances. The problem is formulated as a binary quadratic programming problem. We design a greedy algorithm and use a Tabu Search meta-heuristic to solve the problem. The greedy algorithm minimizes ungated flights while we devise a new neighbourhood search technique, the Interval Exchange Move, which allows us flexibility in seeking good solutions, especially when flight schedules are dense in time. Experiments conducted give good results. 相似文献
34.
In this paper, we study a problem central to crossdocking that aims to eliminate or minimize storage and order picking activity using JIT scheduling. The problem is modelled naturally as a machine scheduling problem. As the problem is NP-hard, and for real-time applications, we designed and implemented two heuristics. The first uses Squeaky Wheel Optimization embedded in a Genetic Algorithm and the second uses Linear Programming within a Genetic Algorithm. Both heuristics offer good solutions in experiments where comparisons are made with the CPLEX solver. 相似文献
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37.
K. Venkatakrishnan B.K.A. Ngoi P. Stanley L.E.N. Lim B. Tan N.R. Sivakumar 《Applied Physics A: Materials Science & Processing》2002,75(4):493-496
Photomasks are the backbone of microfabrication industries. Currently they are fabricated by a lithographic process, which
is very expensive and time consuming since it is a multi-step process. These issues can be addressed by fabricating photomasks
by direct femtosecond laser writing, which is a single-step process and comparatively cheaper and faster than lithography.
In this paper we discuss our investigations on the effect of two types of laser writing techniques, namely front- and rear-side
laser writing, with regard to the feature size and the edge quality of a feature. It is proved conclusively that for the patterning
of masks, front-side laser writing is a better technique than rear-side laser writing with regard to smaller feature size
and better edge quality. Moreover the energy required for front-side laser writing is considerably lower than that for rear-side
laser writing.
Received: 22 May 2001 / Accepted: 14 September 2001 / Published online: 17 October 2001 相似文献
38.
在e-A深度非弹性散射过程中, 喷注穿过冷核介质时, 多重散射诱导胶子辐射会导致对碎裂函数的修正及喷注的能量损失.前期研究中关于计算e-A深度非弹性散射中胶子辐射振幅的两种方法: 螺旋振幅近似和微扰QCD严格计算都异常繁杂.
本文发展了一种新的方法, 可以方便计算出多重散射导致胶子辐射的振幅, 得到的碎裂函数的修正以及能量损失与严格计算的结果一致. 相似文献
39.
The dry etching characteristics of transparent and conductive indium-zinc oxide (IZO) films have been investigated using an inductively coupled high-density plasma. While the Cl2-based plasma mixture showed little enhancement over physical sputtering in a pure argon atmosphere, the CH4/H2/Ar chemistry produced an increase of the IZO etch rate. On the other hand, the surface morphology of IZO films after etching in Ar and Ar/Cl2 discharges is smooth, whereas that after etching in CH4/H2/Ar presents particle-like features resulting from the preferential desorption of In- and O-containing products. Etching in CH4/H2/Ar also produces formation of a Zn-rich surface layer, whose thickness (∼40 nm) is well-above the expected range of incident ions in the material (∼1 nm). Such alteration of the IZO layer after etching in CH4/H2/Ar plasmas is expected to have a significant impact on the transparent electrode properties in optoelectronic device fabrication. 相似文献
40.