Normal and anomalous conductivity hystereses in the channel of a transparent ferroelectric transistor

Structures of the transparent ferroelectric field-effect transistor PZT/SnO₂/Al₂O₃ with “normal” and “anomalous” conductivity hystereses of the channel are prepared and investigated. The “normal” modulation loop for these structures is obtained for the first time. Antimony-doped SnO₂/Al₂O₃ epitaxial films evaporated by a YAG laser from a metal target are used as a channel of the field-effect transistor. Ferroelectric PZT films are deposited using magnetron sputtering. The distribution of deep levels at the PZT/SnO₂ interface is measured by the modified relaxation current method. It is established that the ratio between the polarization charge and the trap charge at the PZT/SnO₂ interface critically affects the direction of the conductivity hysteresis of the channel.     

Reactive epitaxy of cobalt disilicide on Si(100)

The growth of cobalt disilicide on the Si(100) surface by reactive epitaxy at T=350°C was studied within the 10–40 ML cobalt coverage range. A new method of mapping the atomic structure of the surface layer by inelastically scattered medium-energy electrons was employed. The films thus formed were shown to consist of CoSi₂(221) grains of four azimuthal orientations turned by 90° with respect to one another. This domain structure originates from substrate surface faceting by (111) planes, a process occurring during silicide formation. B-oriented CoSi₂(111) layers grow epitaxially on (111) facets.     

Hopping conductivity of carbynes modified under high pressures and temperatures: Galvanomagnetic and thermoelectric properties

The conductivity, thermopower, and magnetoresistance of carbynes structurally modified by heating under a high pressure are investigated in the temperature range 1.8–300 K in a magnetic field up to 70 kOe. It is shown that an increase in the synthesis temperature under pressure leads to a transition from 1D hopping conductivity to 2D and then to 3D hopping conductivity. An analysis of transport data at T ≤ 40 K makes it possible to determine the localization radius a ～ (56?140) Å of the wave function and to estimate the density of localized states _g(E _F) for various dimensions d of space: _g(E _F) ≈ 5.8 × 10⁷ eV^?1 cm^?1 (d=1), _g(E _F) ≈5×10¹⁴ eV^?1 cm ^?2 (d=2), and _g(E _F)≈1.1×10²¹ eV^?1 cm_?3 (d=3). A model for hopping conductivity and structure of carbynes is proposed on the basis of clusterization of sp ² bonds in the carbyne matrix on the nanometer scale.     

1D-3D crossover in hopping conduction of carbynes

D.C. and A.C. conductivities of carbyne samples were studied over the temperature range 1.8–300 K at frequencies 10 MHz–1 GHz. It was established that a variation in the fraction of sp ² bonds in carbynes induces transition from one-to two-and then to three-dimensional conduction. In the one-dimensional hopping conduction regime, the resistivity of carbynes depends on temperature as ρ=ρ₀exp[(T ₀/T)^1/2], whereas Coulomb correlations are insignificant. The Hunt model of one-dimensional A.C. conductivity is experimentally confirmed.     

Pyroelectric and piezoelectric properties of thin PZT films at the morphotropic phase boundary

It has been shown that, in polycrystalline thin PZT films with the Zr/Ti = 0.535/0.465 ratio of ions in octahedral positions of the perovskite structure, the permittivity and the pyroelectric and piezoelectric responses increase with increasing linear sizes of growth blocks to reach anomalously large values. It has been assumed that the observed effects originate from a combination of two factors, namely, the possible presence of the monoclinic phase and a well-developed domain structure in the films.     

Formation of interfacial iron silicides on the oxidized silicon surface during solid-phase epitaxy

The early stages of iron silicide formation in the Fe/SiO _x /Si(100) ternary system during solid-phase epitaxy are studied by high-resolution (～100 meV) photoelectron spectroscopy using synchrotron radiation. The spectra of core and valence electrons taken after a number of isochronous heat treatments of the samples at 750°C are analyzed. It is found that the solid-phase reaction between Fe and Si atoms proceeds in the vicinity of the SiO _x /Si interface, which metal atoms reach when deposited on the sample surface at room temperature. Iron silicide starts forming at 60°C. Solid-phase synthesis is shown to proceed in two stages: the formation of the metastable FeSi interfacial phase with a CsCl-like structure and the formation of the stable β-FeSi₂ phase. During annealing, structural modification of the silicon oxide occurs, which shows up in the growth of the Si⁺⁴ peaks and attenuation of the Si⁺² peaks.     

Interaction of iron atoms with the Si(100)-2 × 1 surface

Interaction of iron atoms with the Si(100)-2 × 1 surface at room temperature is studied by core-level photoelectron spectroscopy using synchrotron radiation for Fe coverages ranging from a fraction of a monolayer to six monolayers. It is shown that the Fe/Si(100)-2 × 1 interface is chemically active: the Fe-Si solid solution forms early in deposition of iron on silicon. When the Fe coverage reaches four to five monolayers, the state of the system is changed and Fe₃Si silicide arises.     

Reactive epitaxy of cobalt disilicide on Si(111)

A study of the mechanism governing the initial stages in silicide formation under deposition of 1–10 monolayers of cobalt on a heated Si(111) 7×7 crystal is reported. The structural data were obtained by an original method of diffraction of inelastically scattered medium-energy electrons, which maps the atomic structure of surface layers in real space. The elemental composition of the near-surface region to be analyzed was investigated by Auger electron spectroscopy. Reactive epitaxy is shown to stimulate epitaxial growth of a B-oriented CoSi₂(111) film on Si(111). In the initial stages of cobalt deposition (1–3 monolayers), the growth proceeds through island formation. The near-surface layer of a CoSi₂(111) film about 30 Å thick does not differ in elemental composition from the bulk cobalt disilicide, and the film terminates in a Si-Co-Si monolayer triad.     

Pyroelectric and piezoelectric responses of thin AlN films epitaxy-grown on a SiC/Si substrate

This paper presents the results of pyroelectric and piezoelectric studies of AlN films formed by chloride–hydride epitaxy (CHE) and molecular beam epitaxy (MBE) on epitaxial SiC nanolayers grown on Si by the atom substitution method. The surface topography and piezoelectric and pyroelecrtric responses of AlN films have been analyzed. The results of the study have shown that the vertical component of the piezoresponse in CHE-grown AlN films is more homogeneous over the film area than that in MBE-grown AlN films. However, the signal from the MBE-synthesized AlN films proved to be stronger. The inversion of the polar axis (polarization vector) on passage from MBE-grown AlN films to CHE-grown AlN films has been found experimentally. It has been shown that the polar axis in MBE-grown films is directed from the free surface of the film toward the Si substrate while, in CHE-grown films, the polarization vector is directed toward the free surface.     

Processes of silicide formation in the Fe/Si(111)7 × 7 system

The initial stages of the formation of iron silicides in the Fe/Si(111)7 × 7 system in the course of solid-phase epitaxy are investigated using high-resolution photoelectron spectroscopy (～100 meV) with synchrotron radiation. The spectra of the Si 2p core and valence-band electrons obtained after deposition of iron coverages of up to 28 monolayers on the surface of the sample and subsequent isochronous annealings at 650°C are measured and analyzed. It is shown that the first to form under Fe deposition is an ultrathin film of the metastable silicide FeSi with a CsCl-type structure, on which a layer of the Fe-Si solid solution with segregated silicon grows. At coverages in excess of 10 monolayers, an iron film grows on the surface of the sample. Annealing of a silicon crystal coated with a Fe layer leads to the sequential formation of two stable silicide phases, namely, the ?-FeSi and β-FeSi₂ phases, in the near-surface region of the sample. It is found that the process of solid-phase synthesis of the ?-FeSi phase passes through the stage of transformation of the iron film into the Fe-Si solid solution.