The Constrained Solutions of Two Matrix Equations

We study the symmetric positive semidefinite solution of the matrix equation AX ₁ A ^T + BX ₂ B ^T = C, where A is a given real m×n matrix, B is a given real m×p matrix, and C is a given real m×m matric, with m, n, p positive integers; and the bisymmetric positive semidefinite solution of the matrix equation D ^T XD = C, where D is a given real n×m matrix, C is a given real m×m matrix, with m, n positive integers. By making use of the generalized singular value decomposition, we derive general analytic formulae, and present necessary and sufficient conditions for guaranteeing the existence of these solutions. Received December 17, 1999, Revised January 10, 2001, Accepted March 5, 2001     

On pointwise estimate for Gamma operators

For linear combinations of Gamma operators, if 0＜a＜2r, 1/2-1/2r≤λ≤l, or 0≤λ＜1/2-1/2r(r≥2),0＜a＜r+10＜a<(r+1)/1-λ, we obtain an equivalent theorem with ωuλρ(f ,t) instead of ωrλφ(f,t), where ωuφ(f,t) is theDitzian-Totik moduli of smoothness.     

壁面材质和温度场对熔融硅润湿角的影响

本文建立了毛细模型, 采用微流动两相流水平集法计算了熔融态硅液与壁面的润湿角, 以人造金刚石作为壁面材料的计算结果与实验结果进行比较, 验证了该模型和计算方法的正确性. 在此基础上, 分别选用碳化硅、石墨和人造金刚石作为壁面材料, 探讨了不同壁面材料表面张力和壁面黏附力对润湿角的影响规律. 结果发现, 相同温度下的毛细力作用使得熔融硅液出现起伏上升现象; 润湿角均有不同程度的减小然后增大, 最终趋于稳定; 初始阶段, 由于气/熔融硅液表面张力与气/壁面表面张力之差变化较大, 液面起伏波动较大; 随后趋于稳定上升. 同时发现石墨作为壁面材料时, 以上变化更易趋于稳定. 该研究为熔体中生长晶体硅获得更稳定的生长环境提供了理论依据.     

MEMS仿生矢量水听器微结构的有限元分析（英文）

结合压电原理和仿生学理论,利用MEMS工艺制作的仿生矢量水听器,具有高灵敏度、宽频带、矢量性及高信噪比等特点。为了进一步提高水听器预测水下环境中声学特性的准确性并提高其固有频率,利用有限元方法对MEMS水听器仿生微结构进行优化分析。首先,对仿生微结构固有频率和灵敏度与其结构尺寸关系作了理论分析并画出不同微结构尺寸下的固有频率和最大应力曲线。其次,运用ANSYS软件对仿生微结构进行有限元仿真并画出固有频率和最大应力响应曲线。对比分析理论与仿真结果,得出当悬臂梁长、宽、厚及仿生纤毛的高度和半径分别为400,80,50,1000和80μm时,MEMS矢量水听器的性能得到最优化,同时对理论与仿真结果的差异进行了分析。     

The Convexity Number of a Graph

 For two vertices u and v of a connected graph G, the set I[u,v] consists of all those vertices lying on a u−v shortest path in G, while for a set S of vertices of G, the set I[S] is the union of all sets I[u,v] for u,v∈S. A set S is convex if I[S]=S. The convexity number con(G) of G is the maximum cardinality of a proper convex set of G. The clique number ω(G) is the maximum cardinality of a clique in G. If G is a connected graph of order n that is not complete, then n≥3 and 2≤ω(G)≤con(G)≤n−1. It is shown that for every triple l,k,n of integers with n≥3 and 2≤l≤k≤n−1, there exists a noncomplete connected graph G of order n with ω(G)=l and con(G)=k. Other results on convex numbers are also presented. Received: August 19, 1998 Final version received: May 17, 2000     

混响室频率搅拌方式及其场环境特性分析

从本征模的角度阐明了频率搅拌技术的混响原理,并根据激励信号的频域特征,系统研究了频率搅拌方式下获取实时均匀场与统计均匀场的三种有效实现途径。选取线性扫频这一搅拌方式为主要研究对象,检验了混响室频率搅拌下的最低可用频率、场均匀性与统计特性三项主要技术指标。试验结果表明：线性扫频搅拌方式下,混响室的最低可用频域与机械搅拌方式基本一致;场均匀性满足IEC 61000-4-21标准规定的容差要求;场值波动规律符合理论分布模型。     

中子单粒子效应研究现状及进展

回顾了中子单粒子研究的国内外发展情况,介绍了近几年西北核技术研究所在西安脉冲堆开展的低能中子单粒子效应研究进展。比较了稳态与脉冲工况下中子单粒子效应的异同性;分析了含有SRAM结构器件随着特征尺寸的减小,中子单粒子效应敏感性加剧的物理机制。分析认为目前中子单粒子效应已成为小尺寸大规模互补金属氧化物半导体器件的主要中子效应表现;中子辐射效应研究中,除了位移损伤效应以外还必需重视由中子电离造成的中子单粒子效应。     

磁约束聚变堆次临界包层概念设计研究进展

为使磁约束聚变堆实现能量放大与氚自持,在其等离子体区周围设置次临界包层和产氚包层。采用天然铀合金燃料、轻水作冷却剂兼慢化剂,内嵌压力管式的次临界包层设计方案,通过对包层物理性能、结构概念设计、热工水力性能和安全分析,表明该方案可将聚变能量放大10倍以上,氚增殖比大于1.15,具有天然的临界安全性和良好余热安全性能。立足于近中期可利用的聚变技术,力争实现聚变能源的提前商用,为我国能源可持续发展提供一种有竞争力的技术选项。     

Upgrade of beamline BL08B at Taiwan Light Source from a photon‐BPM to a double‐grating SGM beamline

During the last 20 years, beamline BL08B has been upgraded step by step from a photon beam‐position monitor (BPM) to a testing beamline and a single‐grating beamline that enables experiments to record X‐ray photo‐emission spectra (XPS) and X‐ray absorption spectra (XAS) for research in solar physics, organic semiconductor materials and spinel oxides, with soft X‐ray photon energies in the range 300–1000 eV. Demands for photon energy to extend to the extreme ultraviolet region for applications in nano‐fabrication and topological thin films are increasing. The basic spherical‐grating monochromator beamline was again upgraded by adding a second grating that delivers photons of energy from 80 to 420 eV. Four end‐stations were designed for experiments with XPS, XAS, interstellar photoprocess systems (IPS) and extreme‐ultraviolet lithography (EUVL) in the scheduled beam time. The data from these experiments show a large count rate in core levels probed and excellent statistics on background normalization in the L‐edge adsorption spectrum.