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Electroluminescence enhancement in ultraviolet organic light‐emitting diode with graded hole‐injection and ‐transporting structure 下载免费PDF全文
Xiaowen Zhang Bingjie Mo Fengjiao You Xiujuan Zhou Liming Liu Honghang Wang Bin Wei 《固体物理学:研究快报》2015,9(6):353-357
Electroluminescent intensity and external quantum efficiency (EQE) in ultraviolet organic light‐emitting diodes (UV OLEDs) have been remarkably enhanced by using a graded hole‐injection and ‐transporting (HIT) structure of MoO3/N,N ′‐bis(naphthalen‐1‐yl)‐N,N ′‐bis(phenyl)‐benzidine/MoO3/4,4′‐bis(carbazol‐9‐yl)biphenyl (CBP). The graded‐HIT based UV OLED shows superior short‐wavelength emis‐ sion with spectral peak of ~410 nm, maximum electroluminescent intensity of 2.2 mW/cm2 at 215 mA/cm2 and an EQE of 0.72% at 5.5 mA/cm2. Impedance spectroscopy is employed to clarify the enhanced hole‐injection and ‐transporting capacity of the graded‐HIT structure. Our results provide a simple and effective approach for constructing efficient UV OLEDs. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim) 相似文献
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Yuanting Su Xingyong Wang Xin Zheng Zaichao Zhang You Song Yunxia Sui Yizhi Li Xinping Wang 《Angewandte Chemie (Weinheim an der Bergstrasse, Germany)》2014,126(11):2901-2905
Three bis(triarylamine) dications were isolated by using weakly coordinating anions. Their electronic structures in the ground state were investigated by various experiments in conjunction with theoretical calculations. The ground‐state electronic structures of these species were tunable by substituent effects, with two of them as closed‐shell singlets and one of them as an open‐shell singlet in the solid state. The excited state of the latter is thermally accessible, indicated by EPR and SQUID measurements. The work provides a new and stable diradicaloid structure motif with an excited triplet sate. 相似文献
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Ju‐You Lu Hong Wan Jianwei Zhang Zhixuan Wang Yang Li Yongmei Du Chunying Li Prof. Zhao‐Tie Liu Prof. Zhong‐Wen Liu Prof. Jian Lu 《Chemistry (Weinheim an der Bergstrasse, Germany)》2016,22(49):17542-17546
A palladium‐catalyzed direct C‐arylation reaction of readily available cage carboranyllithium reagents with aryl halides has been developed for the first time. This method is applicable to a wide range of aryl halide substrates including aryl iodides, aryl bromides, and heteroaromatic halides. 相似文献
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We consider the augmented Lagrangian method (ALM) as a solver for the fused lasso signal approximator (FLSA) problem. The ALM is a dual method in which squares of the constraint functions are added as penalties to the Lagrangian. In order to apply this method to FLSA, two types of auxiliary variables are introduced to transform the original unconstrained minimization problem into a linearly constrained minimization problem. Each updating in this iterative algorithm consists of just a simple one-dimensional convex programming problem, with closed form solution in many cases. While the existing literature mostly focused on the quadratic loss function, our algorithm can be easily implemented for general convex loss. We also provide some convergence analysis of the algorithm. Finally, the method is illustrated with some simulation datasets. 相似文献
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Soo Ouk Jang Hyun Jong You Young-Woo Kim Yong Ho Jung In Uk Hwang Jae Yang Park Heon Lee 《Plasma Chemistry and Plasma Processing》2014,34(1):229-237
To deposit copper seed layer on ultra large scale integration devices, a large-area (Ø 378 mm) electron cyclotron resonance plasma has been generated by using permanent magnets-embedded Lisitano antenna. The plasma source operates in the pressure range of 0.2–1.5 mTorr with microwave power range of 500–2,000 W. By using a Langmuir probe, the electron density and temperature have been measured near the DC sputter target position. Measurements indicate argon plasmas having electron densities of ~5 × 1010/cm and electron temperatures of 5 eV with 750 W microwave power at gas pressures of 0.5 mTorr. Using this plasma source and a DC sputter, we obtained excellent conformal copper seed layer with high aspect ratios of 12:1. This is in contrast with conventional methods using magnetron sputter, which has aspect ratios of 2–3:1. Also, improvements are observed in the smoothness (root mean square roughness of 1.345 nm), uniformity (2.5 % at 300 mm wafer), and sidewall symmetricity (more than 95 %) of the copper seed layer. 相似文献