We study the evolutionary Prisoner's dilemma game on scale-free networks, focusing on the influence of different initial distributions for cooperators and defectors on the evolution of cooperation. To address this issue, we consider three types of initial distributions for defectors: uniform distribution at random, occupying the most connected nodes, and occupying the lowest-degree nodes, respectively. It is shown that initial configurations for defectors can crucially influence the cooperation level and the evolution speed of cooperation. Interestingly, the situation where defectors initially occupy the lowest-degree vertices can exhibit the most robust cooperation, compared with two other distributions. That is, the cooperation level is least affected by the initial percentage of defectors. Moreover, in this situation, the whole system evolves fastest to the prevalent cooperation. Besides, we obtain the critical values of initial frequency of defectors above which the extinction of cooperators occurs for the respective initial distributions. Our results might be helpful in explaining the maintenance of high cooperation in scale-free networks. 相似文献
Click‐active surfaces patterned at 200 nm resolution are demonstrated using the dual functional polymeric film, poly(propargyl methacrylate) (PPMA). The commercially available monomer of propargyl methacrylate (PMA) is polymerized in a single step by initiated chemical vapor deposition (iCVD). FT‐IR and X‐ray photoelectron spectroscopy confirm retention of the click‐active acetylene functional group in the bulk and surface of the iCVD film, respectively. Treating substrates with silane coupling agents prior to deposition results in grafting of iCVD PPMA polymers onto various inorganic surfaces. This grafting technique provides the chemical and mechanical stability required for the PPMA layer to survive the subsequent wet chemical steps used for click functionalization. Successful attachment of an azido‐functionalized coumarin dye is demonstrated. Moreover, the PPMA film displays direct positive‐tone sensitivity to e‐beam irradiation, which enables e‐beam patterning without the use of a resist layer. Direct e‐beam exposure of the multifunctional PPMA iCVD layer results in a 200 nm pattern to which quantum dot nanoparticles are selectively conjugated on the substrates by click chemistry.
