基于无基底焦平面阵列红外热像仪的理论模型分析

基于双材料微悬臂梁热变形原理的光学读出非制冷红外探测阵列经历了从有基底结构向无基底结构的发展过渡,无基底阵列的红外成像结果和有限元模型分析均表明无基底阵列不满足恒温基底条件.本文结合电学比拟的方法,提出了一种新的基于无基底焦平面阵列(focal plane Array,FPA)的热传递分析的理论模型.分析采用整体考虑的思路,避开了无基底FPA阵列各单元热传递互相影响所产生的复杂热分布分析,并考虑了框架对热量的吸收与传递.理论模型采用外边框与环境等温的边界条件,虽不及有限元方法对边界条件的处理灵活,但也已取 关键词： 光学读出 无基底 非制冷红外成像 焦平面阵列     

Cluster synchronization in a network of non-identical dynamic systems

Cluster synchronization in a network of non-identical dynamic systems is studied in this paper, using two-cluster synchronization for detailed analysis and discussion. The results show that the common intercluster coupling condition is not always needed for the diffusively coupled network. Several sufficient conditions are obtained by using the Schur unitary triangularization theorem, which extends previous results. Some numerical examples are presented for illustration.     

Design of periodic metal-insulator-metal waveguide back structures for the enhancement of light absorption in thin-film solar cells

To increase the absorption in a thin layer of absorbing material (amorphous silicon, a-Si), a light trapping design is presented. The designed structure incorporates periodic metal-insulator-metal waveguides to enhance the optical path length of light within the solar cells. The new design can result in broadband optical absorption enhancement not only for transverse magnetic (TM)-polarized light, but also for transverse electric (TE)-polarized light. No plasmonic modes can be excited in TE-polarization, but because of the coupling into the a-Si planar waveguide guiding modes and the diffraction of light by the bottom periodic structures into higher diffraction orders, the total absorption in the active region is also increased. The results from rigorous coupled wave analysis show that the overall optical absorption in the active layer can be greatly enhanced by up to 40%. The designed structures presented in this paper can be integrated with back contact technology to potentially produce high-efficiency thin-film solar cell devices.     

Room temperature deposition of amorphous SiC thin films using low energy ion bombardment

Silicon carbide (SiC) films are prepared by single- and dual-ion beam sputtering deposition at room temperature, respectively. An assisting argon ion beam (ion energy Ei=150 eV) bombards directly the substrate surface to modify the SiC film surface. The thin films are characterized by the Fourier transform infrared spectroscopy (FTIR) and the Raman spectra. With assisting ion beam bombardment, the density of the Si–C bond in the film increases. Meanwhile, the excess carbon or the size of the sp² bonded clusters and the amorphous Si (a-Si) phase decrease. These results indicate that the composition of the films is mainly Si–C bond. UV-vis transmission shows that the E_opt increases steadily from 1.85 eV for the amorphous SiC (a-SiC) films without bombardment to about 2.29 eV for those with assisting ion beam bombardment.     

中子探测晶体Li6Gd(BO3)3:Ce的光谱特性研究

文章用提拉法生长出Li₆Gd(BO₃)₃:Ce晶体,并对其光谱性能与发光过程进行了探索. 借助于真空紫外-紫外透过光谱测试,发现晶体的透过光谱中存在Ce³⁺离子和Gd³⁺的特征吸收峰,同时还存在与Ce⁴⁺离子相关的电荷迁移带. 对晶体的真空紫外-紫外激发发射光谱进行研究发现,在晶体存在着Ce³⁺离子的5d→4f辐射跃迁发光与Gd³⁺离子的4f→4f辐射跃迁发光,而且存在着Gd³⁺→Ce³⁺之间的能量传递. 对Li₆Gd(BO₃)₃:Ce晶体的X射线与γ射线激发发射光谱研究可知,晶体在高能射线激发下的闪烁光主要是Ce³⁺离子的发光. 关键词： 6Gd(BO₃)₃:Ce晶体')" href="#">Li₆Gd(BO₃)₃:Ce晶体 真空紫外-紫外透过光谱 真空紫外-紫外激发发射光谱 能量传递     

强阻尼非线性热弹耦合杆系统的全局吸引子

本文主要以算子半群理论为依据,证明了一类强阻尼非线性热弹耦合杆方程组在初边值条件下,全局吸引子的存在性,并且对吸引子维数做了估计. 关键词： 热弹耦合杆系统 强阻尼 非线性 全局吸引子     

磁石的傅里叶变换红外光谱指纹图谱研究

对不同产地和批次的13个生磁石样品的红外光谱法进行分析,建立磁石的红外光谱指纹图谱,并将炮制品和生品进行分析比较.发现所有生磁石样品指纹图谱的相似度均大于0.97;磁石炮制后相似度和相关系数均降低.傅里叶变换红外光谱指纹图谱可用于商品磁石的分析与品质评价.     

[Cu(DPPZ)(L-Ser)]+与DNA的相互作用及其分析应用研究

研究了DNA与铜(Ⅱ)-L丝氨酸-二吡啶并[3,2-a:2',3'-c]吩嗪配合物[Cu(DPPZ)(L-Ser)-]+相互作用的共振光散射光谱和紫外可见吸收光谱,通过研究体系与溴化乙啶相互作用的荧光光谱特征,证明其作用方式为插入作用.在pH 7.2的缓冲溶液中,[Cu(DPPZ)(L-Ser)]+由于插入作用而在DNA表面聚集,使体系的共振光散射强度增强,最大敞射峰在400 nm处.在最佳实验条件下,共振光散射增强的强度与浓度在0.42～4.20 ng·mL1范围的DNA具有良好的线性关系.方法的检出限为0.29 ng·mL-1.该法用于DNA样品的测定,回收率在97.8%～106.0%之间.     

基于驻留时间补偿的抛光误差控制方法

 针对计算机控制光学表面成形中光学表面存在中高频误差的问题,提出了一种基于驻留时间补偿的有效控制方法。分析了抛光误差的形成机理和影响因素,对系统的误差影响因素进行分类和定量描述,构建了抛光过程中磨损影响因子、浓度变化影响因子和系统影响因子。基于各影响因素的影响因子对抛光驻留时间的求解函数进行了修正,提出采用离散最小二乘法对修正的函数求解驻留时间。研究表明：这种补偿方法能提高计算机控制光学表面成形技术中加工模型的精度,减小光学表面的残余误差。     

蒙特卡罗模拟光通过大气后的时间分布

采用蒙特卡罗方法模拟了光通过光学特性参数不同的大气后透射光时间分布.分析了大气的散射系数、吸收系数、不对称因子及折射率对透射光时间分布的影响.结果表明:透射光时间分布曲线存在两个峰,分别对应子弹光与漫射光.各光学参数界定了子弹光、蛇形光、漫射光的大小和时间范围,并从统计模拟的角度解释了折射率大的大气中难以成像的因为.