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An alternative approach to loading metal organic frameworks with gas molecules at high (kbar) pressures is reported. The technique, which uses liquefied gases as pressure transmitting media within a diamond anvil cell along with a single‐crystal of a porous metal–organic framework, is demonstrated to have considerable advantages over other gas‐loading methods when investigating host–guest interactions. Specifically, loading the metal–organic framework Sc2BDC3 with liquefied CO2 at 2 kbar reveals the presence of three adsorption sites, one previously unreported, and resolves previous inconsistencies between structural data and adsorption isotherms. A further study with supercritical CH4 at 3–25 kbar demonstrates hyperfilling of the Sc2BDC3 and two high‐pressure displacive and reversible phase transitions are induced as the filled MOF adapts to reduce the volume of the system.  相似文献   
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A simple and cost-effective methodology for large-area micrometer-scale patterning of a wide range of metallic and oxidic functional materials is presented. Self-assembled monolayers (SAM) of alkyl thiols on Au were micropatterned by channel-diffused oxygen plasma etching, a method in which selected areas of SAM were protected from plasma oxidation via a soft lithographic stamp. The patterned SAMs were used as templates for site-selective electrodeposition, electroless deposition and solution-phase deposition of functional materials such as ZnO, Ni, Ag thin films, and ZnO nanowires. The patterned SAMs and functional materials were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), atomic force microscopy (AFM), and tunneling AFM (TUNA).  相似文献   
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We present a general methodology to pattern functional materials on the nanometer scale using self-assembled molecular templates on conducting substrates. A soft lithographic gas phase edge patterning process using poly(dimethylsiloxane) molds was employed to form electrically isolating organosilane patterns of a few nanometer thickness and a line width that could be tuned by varying the time of deposition. Electrodeposition was employed to deposit patterns of Ni and ZnO on these prepatterned substrates. Deposition occurred only on patches of the substrate where no organosilane monolayer was present. The process is simple, inexpensive, and scalable to large areas. We achieved formation of metallic and oxide material patterns with a lateral resolution of 80 nm.  相似文献   
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The structure and thermal stability of self-assembled monolayers (SAMs) of benzenethiolate (BT) on Cu(100) have been studied by means of thermal desorption spectroscopy (TDS), scanning tunneling microscopy (STM), low-energy electron diffraction (LEED), UV photoelectron spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS), and near-edge X-ray adsorption fine structure spectroscopy (NEXAFS). Vapor deposition at room temperature yields a well-ordered, densely packed c(6 × 2) saturation structure. At room temperature, this film is, however, metastable and transforms via partial decomposition by cleavage of the S-C bond into a less densely packed layer that reveals a coexisting p(2 × 2) phase. Such a transition occurs on a time scale of several days and is accompanied by a reduction of the work function change with respect to the bare Cu(100) surface from Δ? = -0.9 eV for a freshly prepared saturated layer to -0.5 eV for an aged film. TDS experiments exhibit the presence of two distinct desorption channels (dissociative and intact desorption) occurring at different temperatures that reflects a variation of the local Cu-S interaction strength of BT at differently coordinated adsorption sites. Heating to above room temperature causes a rapid degradation and continuous thinning of BT films whereas above 500 K all thiolate species have desorbed or dissociated, leaving a sulfide overlayer behind that is accompanied by a substrate reconstruction. Interestingly, the upright orientation of BT adopted in the saturated monolayer remains almost identical upon heating and demonstrates the absence of downward tilting upon thermally induced thinning of the film.  相似文献   
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