Studies of gas-jet assisted RF-glow discharge atomic absorption spectrometry

The gas jet assisted glow discharge source has been employed for the RF-glow discharge atomic absorption spectrometry (RF-GDAAS). Data are described to illustrate the role of discharge power, pressure as well as gas flow rate on the sample loss rate, absorbance and self-bias potential. Results show that the optimum discharge conditions depend not only on the pressure and discharge power but also on the gas flow rate. The absorbance increases as much as 1 order of magnitude as the gas flow rate increases from 50 mL/min to 500 mL/min at a pressure of 3 mbar. The use of a gas-jet source allows the direct analysis of solids by RF-GDAAS.     

An ultraviolet-curable mold for sub-100-nm lithography

We describe a novel UV-curable mold that is stiff enough for replicating dense sub-100-nm features even with a high aspect ratio. It also allows for flexibility when the mold is prepared on a flexible support such that large area replication can be accomplished. The composite material of the mold is inert to chemicals and solvents. The surface energy is made low with a small amount of releasing agent such that the mold can be removed easily and cleanly after patterning. In addition, the material allows self-replication of the mold. These unique features of the mold material should make the mold quite useful for various patterning purposes.