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Thermal stability of Mg2Si epitaxial film formed on Si(111) substrate by solid phase reaction 下载免费PDF全文
A single crystalline Mg2 Si film was formed by solid phase reaction(SPR) of a Si(111) substrate with an Mg overlayer capped with an oxide layer(s),which was enhanced by post annealing from room temperature to 100 ℃in a molecular beam epitaxy(MBE) system.The thermal stability of the Mg2 Si film was then systematically investigated by post annealing in an oxygen-radical ambient at 300℃,450℃ and 650 ℃,respectively.The Mg2 Si film stayed stable until the annealing temperature reached 450 ℃ then it transformed into amorphous MgO x attributed to the decomposition of Mg2 Si and the oxidization of dissociated Mg. 相似文献