Evaluation of both composition and strain distributions in InGaN epitaxial film using x-ray diffraction techniques

The composition and stain distributions in the InGaN epitaxial films are jointly measured by employing various x-ray diffraction (XRD) techniques, including out-of-plane XRD at special planes, in-plane grazing incidence XRD, and reciprocal space mapping (RSM). It is confirmed that the measurement of (204) reflection allows a rapid access to estimate the composition without considering the influence of biaxial strain. The two-dimensional RSM checks composition and degree of strain relaxation jointly, revealing an inhomogeneous strain distribution profile along the growth direction. As the film thickness increases from 100 nm to 450 nm, the strain status of InGaN films gradually transfers from almost fully strained to fully relaxed state and then more In atoms incorporate into the film, while the near-interface region of InGaN films remains pseudomorphic to GaN.     

InGaN/GaN量子阱垒层和阱层厚度对GaN基激光器性能的影响及机理

采用LASTIP软件研究了InGaN/GaN(In组分为15%)量子阱垒层和阱层厚度对GaN基蓝紫光激光器性能的影响及机理. 模拟计算结果表明, 当阱层太薄或太厚时, GaN基激光器的阈值电流增加、输出功率下降, 最优的阱层厚度为4.0 nm左右; 当阱层厚度太薄时, 载流子很容易泄漏, 而当阱层厚度太厚时, 极化效应导致发光效率降低, 研究还发现, 与垒层厚度为7 nm 相比, 垒层厚度为15 nm时激光器的阈值电流更低、输出功率更高, 因此适当地增加垒层厚度能显著抑制载流子泄漏, 从而改善激光器性能.     

高阻氮化镓外延层的异常光吸收

通过光伏谱(PV)的测量发现,采用MOCVD方法生长的非故意掺杂GaN外延膜,电阻较大的样品在带隙内有明显的异常光吸收.吸收峰的能量位置表明这种异常吸收可能与激子有关.在这些高阻样品上制作的MSM型探测器,当入射光照射不同位置,其光谱响应显示了区域不一致性.20 V偏压下反向偏置结处的光谱响应比正向偏置结处的光谱响应大一个数量级左右,峰值响应的位置也发生明显红移现象,红移的能量约为28 meV,并且几乎不随环境温度变化.根据MSM结构的电场分布不均以及带边和激子响应对电场的依赖性不同,MSM型探测器的这种 关键词： GaN 激子 光伏谱 光谱响应     

器件参数对GaN基n~+-GaN/i-Al_x Ga_(1-x)N/n~+-GaN结构紫外和红外双色探测器中紫外响应的影响

研究了AlGaN层参数对GaN基n+-GaN/i-AlxGa1-xN/n+-GaN结构紫外和红外双色探测器中紫外响应的影响规律及物理机制.模拟计算发现:降低AlGaN层本底载流子浓度会增加器件的量子效率,当本底载流子浓度不能进一步降低时,可以通过减小AlGaN层的厚度以保证器件的量子效率.在材料生长和器件工艺过程中都应减少界面态.外加较小的反向偏压能大幅度提高紫外量子效率,分析表明,GaN/AlGaN/GaN形成的两个背靠背、方向相反的异质结电场是出现这些现象的根本原因.在实际器件设计中,应该根据需要调节各结构参数,以保证器件的量子效率.     

p-InGaN层厚度对p-i-n结构InGaN太阳电池性能的影响及机理

研究了p-lnGaN层厚度对p-i-n结构InGaN太阳电池性能的影响.模拟计算发现,随着p-InGaN层厚度的增加,InGaN太阳电池效率降低.较差的p-InGaN欧姆接触特性会破坏InGaN太阳电池性能.计算结果还表明,无论欧姆接触特性好坏,随着p-InGaN层厚度的增加,短路电流下降是导致InGaN电池效率降低的主要原因.选择较薄的p-InGaN层有利于提高p-i-n结构InGaN太阳电池的效率.     

一种测量p-GaN载流子浓度的方法

提出了一种测量p-GaN载流子浓度的方法,其主要思想是利用p-n⁺结构GaN探测器长波和短波量子效率的差值随反向偏压的变化关系,找到p-GaN层刚好完全耗尽时的偏压,从而求出p-GaN层载流子浓度.模拟计算表明,该方法能够准确测量出p-GaN层的载流子浓度,而且受表面复合、欧姆接触影响很小.进一步研究了实际测量中如何选择p-GaN层厚度,计算结果表明,p-GaN层的优化厚度值随着p-GaN层的浓度增加而减小. 关键词： p-GaN 载流子浓度测量 紫外探测器     

Evaluation of polarization field in InGaN/GaN multiple quantum well structures by using electroluminescence spectra shift

In order to investigate the inherent polarization intensity in InGaN/GaN multiple quantum well(MQW) structures,the electroluminescence(EL) spectra of three samples with different GaN barrier thicknesses of 21.3 nm, 11.4 nm, and 6.5 nm are experimentally studied. All of the EL spectra present a similar blue-shift under the low-level current injection,and then turns to a red-shift tendency when the current increases to a specific value, which is defined as the turning point.The value of this turning point differs from one another for the three InGaN/GaN MQW samples. Sample A, which has the GaN barrier thickness of 21.3 nm, shows the highest current injection level at the turning point as well as the largest value of blue-shift. It indicates that sample A has the maximum intensity of the polarization field. The red-shift of the EL spectra results from the vertical electron leakage in InGaN/GaN MQWs and the corresponding self-heating effect under the high-level current injection. As a result, it is an effective approach to evaluate the polarization field in the InGaN/GaN MQW structures by using the injection current level at the turning point and the blue-shift of the EL spectra profiles.     

Observation of positive and small electron affinity of Si-doped AlN films grown by metalorganic chemical vapor deposition on n-type 6H–SiC

We have investigated the electron affinity of Si-doped AlN films(N_(Si)= 1.0 × 10~(18)–1.0 × 10_(19)cm~(-3)) with thicknesses of 50, 200, and 400 nm, synthesized by metalorganic chemical vapor deposition(MOCVD) under low pressure on the ntype(001)6H–SiC substrates. The positive and small electron affinity of AlN films was observed through the ultraviolet photoelectron spectroscopy(UPS) analysis, where an increase in electron affinity appears with the thickness of AlN films increasing, i.e., 0.36 eV for the 50-nm-thick one, 0.58 eV for the 200-nm-thick one, and 0.97 e V for the 400-nm-thick one.Accompanying the x-ray photoelectron spectroscopy(XPS) analysis on the surface contaminations, it suggests that the difference of electron affinity between our three samples may result from the discrepancy of surface impurity contaminations.     

GaN基p-i-n和肖特基紫外探测器的响应光谱及暗电流特性

研究了p-i-n型和肖特基型Ga N基紫外探测器的响应光谱和暗电流特性。实验发现,随着p-Ga N层厚度的增加,p-i-n型紫外探测器的响应度下降,并且在短波处下降更加明显。肖特基探测器的响应度明显比pi-n结构高,主要是由于p-Ga N层吸收了大量的入射光所致。肖特基型紫外探测器的暗电流远远大于p-i-n型紫外探测器的暗电流,和模拟结果基本一致,主要是肖特基型探测器是多子器件,而p-i-n型探测器是少子器件。要制备响应度大、暗电流小的高性能Ga N紫外探测器,最好采用p-Ga N层较薄的p-i-n结构。     

Physical implications of activation energy derived from temperature dependent photoluminescence of InGaN-based materials

Physical implications of the activation energy derived from temperature dependent photoluminescence(PL) of In Ga Nbased materials are investigated, finding that the activation energy is determined by the thermal decay processes involved.If the carrier escaping from localization states is responsible for the thermal quenching of PL intensity, as often occurs in In Ga N materials, the activation energy is related to the energy barrier height of localization states. An alternative possibility for the thermal decay of the PL intensity is the activation of nonradiative recombination processes, in which case thermal activation energy would be determined by the carrier capture process of the nonradiative recombination centers rather than by the ionization energy of the defects themselves.