表面分子印迹技术在分析化学中的应用研究进展

表面分子印迹聚合物因其高效的靶向识别能力、丰富的活性结合位点和优越的吸附/解吸附动力学性能,日益受到分离和分析化学领域研究者的广泛关注。本文系统介绍表面印迹技术的概况,如机理、分类、特点等,重点综述了表面印迹技术在环境分析、食品分析、生物分析和医药分析等领域的研究运用现状,并对表面印迹技术潜在的研究方向和应用前景进行了展望。     

等示值法在RLC串联谐振电路实验中的应用

研究结果表明采用等示值法在品质因数Q1的情况下,可以精确确定谐振频率,从而实现对电容的精确测定。     

第二个重要极限存在性证明的新方法

本文通过分析第二个重要极限现存的两类典型证明方法,进而提出一种借助本文中证明的一个不等式,得到第二个重要极限存在性证明的新方法.     

High performance of N,P co-doped metal-free carbon catalyst derived from ionic liquid for oxygen reduction reaction

Journal of Solid State Electrochemistry - One-pot strategy to fabricate N, P co-doping carbon was developed based on the functional ionic liquid (IL) as the N, P, and C precursors. The IL featuring...     

基于核酸适体修饰的纳米通道分离β-雌二醇和雌酮的研究

建立了修饰金纳米通道分离β-雌二醇和雌酮的新方法。以聚碳酸酯膜为模板,基于模板合成-化学沉积原理,在其表面及膜孔内壁均匀沉积纳米金层,得到一定孔径的金纳米通道,利用扫描电镜(SEM)、透射电镜(TEM)等对其进行研究表征,制备得到均一、可靠的金纳米通道膜。在制备好的金纳米通道表面,通过分子自组装的方式将β-雌二醇核酸适体修饰在金纳米通道内,得到对β-雌二醇具有选择性的纳米通道。β-雌二醇较容易通过修饰后的纳米通道,而雌酮不易通过。考察了β-雌二醇和雌酮在β-雌二醇核酸适体修饰的金纳米通道的迁移特性,以此实现二者的分离。利用50 nm聚碳酸酯膜沉积金3 h,得到孔径约20 nm金纳米通道膜,在0.5 mmol/L Tris-HCl缓冲溶液(pH 7.4)中,进样池浓度为1.76×10!5mol/L的β-雌二醇和雌酮,分离度达到1.76。     

Heterostructured MoS2/GPC anode: the synergistic lithium storage performance and lithiation kinetics

Journal of Solid State Electrochemistry - Grapefruit peel carbon (GPC) is prepared from waste grapefruit peel and further used as substrate for in situ construction of MoS2 arrays, forming MoS2/GPC...     

How Strain Affects the Reactivity of Surface Metal Oxide Catalysts

Highly dispersed molybdenum oxide supported on mesoporous silica SBA‐15 has been prepared by anion exchange resulting in a series of catalysts with changing Mo densities (0.2–2.5 Mo atoms nm^?2). X‐ray absorption, UV/Vis, Raman, and IR spectroscopy indicate that doubly anchored tetrahedral dioxo MoO₄ units are the major surface species at all loadings. Higher reducibility at loadings close to the monolayer measured by temperature‐programmed reduction and a steep increase in the catalytic activity observed in metathesis of propene and oxidative dehydrogenation of propane at 8 % of Mo loading are attributed to frustration of Mo oxide surface species and lateral interactions. Based on DFT calculations, NEXAFS spectra at the O‐K‐edge at high Mo loadings are explained by distorted MoO₄ complexes. Limited availability of anchor silanol groups at high loadings forces the MoO₄ groups to form more strained configurations. The occurrence of strain is linked to the increase in reactivity.