CO-S-闭拓扑(英)

本文证明，当空间赋予CO-s-闭拓扑s（τ）时，s-连续函数概念与连续函数概念一致，研究了s-闭空间；s-闭空间的某些基本性质，且用其刻画几类CO-s闭拓扑．     

其它——DⅢ-D装置高约束等离子体大幅度ELM抑制的模拟研究

高的边缘压强梯度的H模放电可提高将来聚变反应堆的经济可行性，然而高的边缘压强梯度容易产生ELM不稳定性，它通常能把大的粒子和热负荷排到偏滤器靶板，这些ELM模限制了芯部等离子体性能和降低了偏滤器靶板的寿命。为了维持稳态的高性能等离子体，横越等离子体边界的粒子和热输运能用于粒子和杂质分布控制，因此，任何消除或者缓解大而快的ELM脉冲技术必须用另一个慢的输运过程来代替瞬时的粒子和热输运，这种技术在ITER这样的燃烧等离子体装置中是高度优先的。     

教育评价和认知的基本模式（中）

此介绍了对学生学习情况量化方法的研究。原刊登于美国对研究型大学丛书之一《The Scholarship of Teaching and Learning in Higher Education））。本接第35期[编按]     

特殊坐标系中特殊非牛顿流边界层方程的相似解

给出了在一个特殊坐标系中三阶流体的二维定常运动方程组．该坐标系中由无粘流体的势流确定，即以环绕任意物体的非粘性流动的流线为Ф-坐标，速度势线为ψ-坐标，构成正交曲线坐标系．结果表明，边界层方程与浸没在流体中的物体的形状无关．第一次近似假定第二梯度项与粘性项和第三梯度项相比，可以忽略不计．第二梯度项的存在，将防碍第三梯度流相似解的比例变换的导出．利用李群方法计算了边界层方程的无穷小生成元．将边界层方程组变换为常微分方程组．利用Runge-Kutta法结合打靶技术求解了该非线性微分方程组的数值解．     

The Dφ Data Handling System

In this paper we highlight strategies and choices that make the Dφ Data Handling system markedly different from many other experiments‘ systems,We emphasize how far the Dφ system has come in innovating and implementing a Dφ-specific Data Grid system.We discuss experiences during the first months of detector commissioning and give some future plans for the system.     

教育评价和认知的基本模式（下）

此文介绍了对学生学习情况量化方法的研究，原文刊登于美国对研究型大学丛书之——《The Schlorship or Teaching and Learning in Higher Education》。本文接第36期。[编者按]     

Diffractive-optical processing of temporal signals, part I: basic principles

The topic of this paper is the utilization of time for optical information processing. As clock rates in computing and communication systems increase and reach the THz border, optical techniques for signal filtering, shaping and clock distribution become attractive. We discuss the use of optics in temporal processing and consider in particular diffractive solutions. In part one of this paper, we discuss the basic concepts of temporal optics.     

脉冲激光微扰增强双共振光谱对钠分子4~3∑_g~ 态的新实验观测(英文)

用微扰增强双共振对钠分子4~3∑_g~ 态33900～35200 cm~(-1)的65个振转能级进行了实验观测。以往用连续激光双共振方法只看到低振动能级,用脉冲激光双共振和检测解离产物的方法只观测到高振动能级。获得的新数据填补了以往数据的空缺。综合v=0～31能级所有数据,拟合出一套分子常数,计算出RKR势能曲线。主要分子常数为：T_e=32127.090 cm~(-1),ω_e=121.1099(0.20720)cm~(-1),B_e=0.116287(0.0002300)cm~(-1),Re=3.551 (?)。还对J. Chem. Phys.108,7707 (1998)中RKR势能曲线的一个错误进行了纠正。     

Probing Cu Diffusion Barrier Layers on Porous Low-Dielectric-Constant Films by Posireonium Annihilation Lifetime Spectroscopy

Two kinds of Cu diffusion barrier layers, sealed films and capped films, on nanoporous low-dielectric-constant films are investigated by positronium annihilation lifetime spectroscopy （PALS）. We have found that the minimum thickness of Ta to form an effective diffusion barrier is affected by the pore size. The films with large pores require thick barrier layers to form effective diffusion barriers. In addition, a possible ultra-thin diffusion barrier, i.e. a plasma-induced densification layer, has also been investigated. The PALS data confirm that a porous low-dielectric-constant thin film can be shrunk by exposure to plasma. This shrinkage is confined to a surface layer of collapsed pores and forms a dense layer. The dense layer tends to behave as Ps （positronium） diffusion barriers. Indeed, the controlled thin “skin” layer could prevent Cu diffusion into the underlying dielectrics.