Molecular dynamics simulation of processing using AFM pin tool

A three-dimensional molecular dynamics (MD) model is utilized to investigate the effect of tool geometry on the deformation process of the workpiece and the nature of deformation process at the atomic-scale. Results show that different states exist between the atomic force microscope (AFM) pin tool and the workpiece surface, i.e. the non-wear state, the ploughing state, the state in which ploughing is dominant and the state in which cutting plays a key role. A relationship between the deformation process of the workpiece and the potential energy variation is presented. The potential energy variation of atoms in different deformed regions in the workpiece such as plastically deformed region, elastically deformed region and the mixed deformation region is different. The features of variations of potential energy are discussed.     

Surface free energy of CrNx films deposited using closed field unbalanced magnetron sputtering

CrN_x thin films have attracted much attention for semiconductor IC packaging molding dies and forming tools due to their excellent hardness, thermal stability and non-sticking properties (low surface free energy). However, few data has been published on the surface free energy (SFE) of CrN_x films at temperatures in the range 20-170 °C. In this study CrN_x thin films with CrN, Cr(N), Cr₂N (and mixture of these phases) were prepared using closed field unbalanced magnetron sputtering at a wide range of Cr⁺² emission intensity. The contact angles of water, di-iodomethane and ethylene glycol on the coated surfaces were measured at temperatures in the range 20-170 °C using a Dataphysics OCA-20 contact angle analyzer. The surface free energy of the CrN_x films and their components (e.g., dispersion, polar) were calculated using the Owens-Wendt geometric mean approach. The influences of CrN_x film surface roughness and microstructure on the surface free energy were investigated by atomic force microscopy (AFM) and X-ray diffraction (XRD), respectively. The experimental results showed that the lowest total SFE was obtained corresponding to CrN at temperature in 20 °C. This is lower than that of Cr(N), Cr₂N (and mixture of these phases). The total SFE, dispersive SFE and polar SFE of CrN_x films decreased with increasing surface temperature. The film roughness has an obvious effect on the SFE and there is tendency for the SFE to increase with increasing film surface roughness.     

Preparing polymer brushes on polytetrafluoroethylene films by free radical polymerization

Films of polytetrafluoroethylene (PTFE) were exposed to sodium naphthalenide (Na/naphtha) etchant so as to defluorinate the surface for obtaining hydroxyl functionality. Surface-initiators were immobilized on the PTFE films by esterification of 4,4′-azobis(4-cyanopentanoic acid) (ACP) and the hydroxyl groups covalently linked to the surface. Grafting of polymer brushes on the PTFE films was carried out by the surface-initiated free radical polymerization. Homopolymers brushes of methyl methacrylate (MMA) were prepared by free radical polymerization from the azo-functionalized PTFE surface. The chemical composition and topography of the graft-functionalized PTFE surfaces were characterized by X-ray photoelectron spectroscopy (XPS), attenuated total reflectance (ATR) FT-IR spectroscopy and atomic force microscopy (AFM). Water contact angles on PTFE films were reduced by surface grafting of MMA.     

聚集态和陷阱对交联聚乙烯真空沿面闪络特性的影响

研究了半结晶聚合物交联聚乙烯的聚集态和陷阱等对真空沿面闪络特性的影响.交联聚乙烯(XLPE)在135℃下恒温10min后,分别经过-56℃,-25℃淬火处理,自然降温,或1℃/min,0.5℃/min慢速降温等热处理过程,测量了热处理后试样的电气性能、显微结构、陷阱分布和真空中的沿面闪络特性.实验结果表明,与未热处理试样相比,热处理试样的直流闪络电压最高提高了76%,脉冲闪络电压最高提高了19%.认为热处理改变了XLPE试样的聚集态和陷阱,从而提高了XLPE试样的真空沿面闪络性能,提出了可以通过控制半结晶聚合物的聚集态和缺陷结构提高其真空沿面闪络性能.     

B-N共掺杂改善p型ZnO的理论分析

采用基于密度泛函理论的第一性原理赝势法对B缺陷在ZnO中的存在形式进行了理论分析,对B-N共掺杂ZnO体系的晶格结构、杂质形成能、杂质态密度及电子结构进行了系统的研究.研究表明,B缺陷在掺杂体系中主要以BZn的形式存在,这种结构会引起相应的晶格收缩;研究发现与以往的N掺杂相比,共掺结构具有更低的杂质形成能和更高的化学稳定性,因此更加适合掺杂.此外,共掺能够形成更低的受主能级,因而减小了受主的杂质电离能,提高了受主态密度;研究显示共掺结构下的杂质N原子与体相Zn原子之间的键合能力提高,受主原子得电子的能力增强,因此B-N共掺有望成为一种更为有效的p型掺杂手段.     

Holographic property of photopolymers with different amine photoinitiators

Holographic parameters and photobleaching kinetics of the photopolymers with five different amine photoinitiators are studied. The maximum values of diffraction efficiency, photobleaching coefficient and quantum yield follow the sequence: Triethanolamine (TEA)> Diethanolamine (DEA)> Ethanolamine (EA)> Triethylamine (TETN)> Diethylamine (DETN). The holographic capabilities of photopolymer performances are determined by the number of functional groups in the amine molecular structure. There is an optimum proportion of the photoinitiator, the photosensitizer and the monomer in the test of holographic parameters with different amine concentrations. The maximum diffraction efficiency is 59.26\%, sensitivity is 1.72\times 10^{ - 3}~cm^{2}/mJ, and the maximum refractive modulation index is 4.64\times 10^{ - 4}.     

Al2O3薄膜/纳米Ag颗粒复合结构的光吸收谱及增强Raman散射光谱研究

Al₂O₃介质薄膜与纳米Ag颗粒构成的复合结构,被应用于表面增强Raman散射探测实验中,其中Al₂O₃介质薄膜对纳米Ag颗粒的吸收谱及增强Raman散射光谱的影响被特别关注.该复合结构的光学特性表征出纳米Ag颗粒的偶极振荡特性.从光吸收谱中可以看到,其共振吸收谱随Al₂O₃介质薄膜厚度增加而在整个谱域上发生红移,表明纳米Ag颗粒的周围介电常数随Al₂O₃介质薄膜厚度的增加而增大.采用罗丹明6G作为探针原子,6个Raman特征峰的平均增益值作为表征表面增强Raman散射衬底增益程度的量度.实验结果表明,Al₂O₃介质薄膜层的引入提高了纳米Ag颗粒的衬底介电常数,并引起了散射共振的增强,从而使表面增强Raman散射强度提高.     

Control and synchronization of second Julia sets

A visualization of Julia sets of the complex Henon map system with two complex variables is introduced in this paper.With this method,the optimal control function method is introduced to this system and the control and synchronization of its Julia sets are achieved.Control and synchronization of generalized Julia sets are also achieved with this optimal control method.The simulations illustrate the efficacy of this method.     

应用于碱卤化物固体的通用状态方程

提出一种能精确考虑固体结合能的通用状态方程,并且在高压和膨胀区域都具有正确的行为,不会出现物理上不正确的振荡现象.将新方程与文献中的典型方程应用于15种碱金属卤化物和一种碱土金属氧化物,结果表明新方程在给出正确结合能数据的同时,能够很好地拟合实验压缩数据.由Vinet方程和Morse方程定出的参数随数据范围变化很明显,新方程定出的参数随数据范围变化不明显.新方程的通用性优于Vinet方程和Morse方程. 关键词： 固体 通用状态方程 结合能 碱金属卤化物     

电场调谐InAs单量子点的发光光谱

采用稳态和时间分辨发光光谱,研究了生长在p-i-n二极管结构内的InAs单量子点发光光谱的电场调谐特性.随着电场强度的增加,观察到量子点中激子发光的Stark 效应.通过选择不同波长的激光线激发量子点样品,发现随着电场强度的增加导致量子点发光强度的减弱,这是由于量子点俘获载流子概率的减小所致,而激子寿命的增加源于电场导致激子的Stark效应. 关键词： InAs单量子点 Stark效应 电子-空穴分离