Analysis on Shack–Hartmann wave-front sensor with Fourier optics

In Shack–Hartmann wavefront sensor (SHWS), the behavior of the irradiance pattern produced by the micro-lens array is important for an accurate centroid estimation. In this paper, the behavior of a micro-lens array in SHWS is analyzed using Fourier optics, and reveals that in addition to the main, expected spots, secondary spots with smaller intensities also appeared as a result of diffraction by the small dimensions of the micro-lens and interference from the different micro-lenses. This result is confirmed by comparing with a irradiance pattern taken from an actual SHWS. The additional error in centroid estimation caused by these secondary spots is discussed and relationship to the parameters of the micro-lens of SHWS is analyzed.     

Nuclear clusters and covalently bound nuclear molecules

Nuclear clustering in N = Z nuclei has been studied for many decades. Of particular relevance are states close to the decay thresholds, as described by the Ikeda diagram. Recent interest has focused on loosely bound systems as observed with exotic nuclei. Extreme deformations are simultaneously observed. In the deformed shell model these are referred to as super- and hyper-deformation. Another feature related to clustering is the development of octupole deformations. A possible approach to describe these states is to use explicitly molecular concepts, with neutrons in covalent binding orbits. Examples for molecular structure in beryllium isotopes and in other neutron-rich light nuclei (carbon and neon) are now well established. The predicted chain states in the carbon isotopes are the first example of structures with an axis ratio of 3:1. A threshold diagram for molecular configurations in nuclei with clusters and covalent neutrons can be established.     

A fast method to measure the thickness of removed layer from etching of SSNTD based on EDXRF

Solid state nuclear track detectors are commonly used for measurements of concentrations of radon gas and/or radon progeny. All these measurements depend critically on the thickness of the removed layer during etching. However, the thickness of removed layer calculated using the etching period does not necessarily provide a sufficiently accurate measure of the thickness. For example, the bulk etch rate depends on the strength of stirring during etching for the LR 115 detector. We propose here to measure the thickness of the removed layer by using energy-dispersive X-ray fluorescence spectrometry. In the present work, a reference silver nitrate pellet is placed beneath the LR 115 detector, and the fluorescence X-ray intensity for silver is then measured. We have found a linear relationship between the X-ray intensity and the thickness of the removed layer for LR 115 detector. This provides a fast method to measure the thickness of removed layer from etching of LR 115 detector. However, this method was found to be inapplicable for the CR-39 detector. Therefore, alternative methods have yet to be explored for the CR-39 detector.     

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