Enhanced hardness in B-doped ZnO thin films on fused quartz substrates by pulsed-laser deposition

B-doped ZnO thin films have been fabricated on fused quartz substrates using boron-ZnO mosaic target by pulsed-laser deposition technique, and the mechanical properties have been studied by nanoindentation continuous stiffness measurement technique and transmission electron microscope (TEM). Nanoindentation measurement revealed that the hardness of B-doped ZnO films, 9.32 ± 0.90 to 12.10 ± 1.00 GPa, is much greater than that of undoped ZnO films and very close to that of traditional semiconductor Si. The mean transmittance (%) is larger than 81% in the visible range (380-780 nm) for all the films, and the Hall effect measurement showed that the carrier density is around 2 × 10²⁰ cm⁻³ and the resistivity lower than 3 × 10⁻³ Ω cm. TEM characteristics show undoped thin films have more amorphous area between grains while the B-doped ZnO films have thin grain boundaries. We suggest that the grain boundaries act as the strain compensation sites and the decrease in thickness of grain boundaries enhances the hardness of the B-doped ZnO films.     

Diffusion study of multi-organic layers in OLEDs by ToF-SIMS

A model organic light-emitting diodes (OLEDs) with structure of tris(8-hydroxyquinoline) aluminum (Alq₃)/N,N′-diphenyl-N,N′-bis[1-naphthy-(1,1′-diphenyl)]-4,4′-diamine (NPB)/indium tin oxide (ITO)-coated glass was fabricated for diffusion study by ToF-SIMS. The results demonstrate that ToF-SIMS is capable of delineating the structure of multi-organic layers in OLEDs and providing specific molecular information to aid deciphering the diffusion phenomena. Upon heat treatment, the solidity or hardness of the device was reduced. Complicated chemical reaction might occur at the NPB/ITO interface and results in the formation of a buffer layer, which terminates the upper diffusion of ions from underlying ITO.     

ZnO-Bi2O3系压敏陶瓷的导电过程与等效势垒高度

研究了ZnO-Bi2O3系压敏陶瓷等效势垒高度φeff随着归一化电压的变化规律,发现等效势垒高度φeff随着归一化电压的增加先逐渐增大,达到最大值后持续下降.由于在外加电压作用下反偏势垒高度高于正偏势垒高度,等效势垒高度φeff主要取决于反偏势垒.因此,这种变化规律说明了ZnO压敏陶瓷晶界的导电过程可能存在三个阶段.在低归一化电压区,晶界区域中的电子从正偏势垒区注入到晶界无序层的速率低于电子从晶界无序层抽出到反偏势垒区的速率,从而导致等效势垒高度随着归一化电压的增加逐渐增大.在中等归一化电压区,电子从正偏势垒区注入到晶界无序层的速率和电子从晶界无序层抽出到反偏势垒区的速率相平衡,等效势垒高度达到最大值.在高归一化电压区,电子从正偏势垒区注入到晶界无序层的速率高于电子从晶界无序层抽出到反偏势垒区的速率,等效势垒高度随着归一化电压的增加逐渐下降,直至晶界击穿.同时分析了等效势垒高度φeff对泄漏电流IL的影响,发现泄漏电流与等效势垒高度差Δφ呈指数关系.     

辐照电子在光纤芯处能量沉积的计算

为了用尽可能低的辐照电子能量在光纤芯处形成大的性质改变,模拟了0.1～1 MeV能量的电子辐照二氧化硅.发现每一特定能量的电子辐照二氧化硅时,在其中有个能量沉积最快的位置.计算得到0.447 4 MeV能量的电子在单模光纤中心能量沉积最快,分析发现对于这个能量的电子多数可以穿透到光纤芯处,电子能量在光纤芯处的沉积主要是由于电子能量的减小造成的.这些结果可为用电子辐照光纤制作光器件时的初始电子能量选择提供参考.     

空间雷电探测实时采集定位系统

星载雷电探测定位系统是利用光学探测器探测闪电事件的地理位置和光脉冲波形,系统采用CPLD+DSP的数字图像处理方案,利用了CPLD复杂逻辑可编程特性将系统的部分或全部功能集成在一片CPLD上,减小了系统硬件复杂程度,节省了印制版空间.利用DSP高速数字信号处理特性完成实时处理图像数据的功能.系统用CPLD完成图像信号的采集、编码和存储控制,缩小了星载设备体积,简化了电路结构;用DSP完成大量图像数据处理工作,提高了系统工作的实时性.     

New 3-mode bosonic operator realization of SU（2） Lie algebra： From the point of view of squeezing

We consider the quantum mechanical SU(2) transformation e2λ JzJ± e-2λJz= e±2λJ± as if the meaning of squeezing with e±2λbeing squeezing parameter. By studying SU(2) operators(J±,Jz) from the point of view of squeezing we find that(J±,Jz) can also be realized in terms of 3-mode bosonic operators. Employing this realization, we find the natural representation(the eigenvectors of J+ or J-) of the 3-mode squeezing operator e2λ Jz. The idea of considering quantum SU(2) transformation as if squeezing is liable for us to obtain the new bosonic operator realization of SU(2) and new squeezing operators.     

Study of HfSiO film prepared by electron beam evaporation for high-k gate dielectric applications

The purpose of this paper is to report some experimental results with HfSiO films formed on silicon substrates by electron beam evaporation (EB-PVD) and annealed at different temperatures. The images of atomic force microscope (AFM) indicated that HfSiO film annealed at 900 °C was still amorphous, with a surface roughness of 0.173 nm. X-ray photoelectron spectroscopy (XPS) analysis revealed that the chemical composition of the film was (HfO₂)₃(SiO₂) and Hf-Si-O bonds existed in the annealed film. Electrical measurements showed that the equivalent oxide thickness (EOT) was 4 nm, the dielectric constant was around 6, the breakdown voltage was 10 MV/cm, the fixed charge density was −1.2 × 10¹² cm⁻², and the leakage current was 0.4 μA/cm² at the gate bias of 2 V for 6 nm HfSiO film. The annealing after deposition effectively reduced trapping density and the leakage current, and eliminated hysteresis in the C-V curves. Annealing also induced SiO₂ growth at the interface.     

高Verdet常数的Tb3+铝硼硅酸盐玻璃

本文研究了一种铝硼硅酸盐基质玻璃,通过加大单位体积的稀土离子浓度,并选择P值大的顺磁性Tb³⁺作为弗尔德常数贡献的主要离子,经反复试验研究,制定合理的熔制工艺,得到性能稳定的透明顺磁旋光玻璃。弗尔德常数V=-0.375/Oe·cm。是目前世界上弗尔德常数较高的磁旋光玻璃。