PINNING EFFECT OF LEAD LANTHANUM TITANATE THIN FILMS DEPOSITED ON DIFFERENT SUBSTRATES

Pinning effect of lead lanthanum titanate (PLT) ferroelectric thin films with excess PbO of 20 mol% has been studied for deposition on diffe rent substrates. Silicon, sapphire and quartz were used as substrates on which P t/Ti or LaNiO₃ thin films were deposited as bottom electrodes. Electron probe analysis results showed that there was still a certain amount of excess Pb in PLT films after annealing at 550 ℃ for 1 h, and the amount of it was dependent on the substrate used. The distribution of excess Pb in the films was investig ated by Auger electron spectroscopy depth profile. It was shown that the substrates and the bottom electrodes had significant effects on the content and distrib ution of excess Pb in PLT films. The excess Pb and its accumulation at the inter face between the film and bottom electrode may act as pinning centers and have a pinning effect on domains, which can be observed by abnormal P-E hysteresis loops and abnormal C-V curves. The excess Pb content in the films and the accumulation of Pb at the interface were high in PLT films deposited on Pt/Ti/S i, and considerable pinning effect was observed. As LaNiO₃ would absorb most part of the excess Pb in PLT films, the content of excess Pb in the films deposited on LaNiO₃/Si was very low and the pinning effect was hardly observed.     

p-τ值对COIL的影响的实验研究

 实验研究了单重态氧发生器（SOG）的p-τ值，即初始氯气分压与停留时间的乘积，对化学氧碘激光器（COIL）的影响，并分析了诸多实验因素对SOG的p-τ值的影响。对于提高COIL的化学效率具有很重要的实际意义。     

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The main circuit topology, control hardware and control sequence of the cathode filament power supply for the HL-2A neutral beam heating system was introduced. Feedback control simulation of main circuit of filament power supply is carried out through MATLAB simulation software. It is found that the ripple factor is about 1%when the current is about 1000A, and the ripple coefficient increases to 3% when the current drops to 200A. Without the AC filter reactor in series L₁ and parallel harmonic filter LC in the low level control cabinet, the output current ripple coefficient becomes larger obviously. It shows that L₁ and LC not only absorb harmonic current, but also filter the chopper waveform after AC voltage regulation to make the output waveform smoother.     

ZI纵向计数数据模型的影响分析

基于EM算法和Laplace逼近, 本文给出了研究ZI (即含0较多的)纵向计数数据模型的影响分析方法. 为了识别含0较多的分组计数数据中的强影响点, 本文将ZI纵向数据模型中取值为0的数据赋予一定的权重; 而把随机效应看作缺失数据; 在此基础上引入EM算法, 从而应用完全数据对数似然函数的条件期望以及相应的$Q$距离函数进行影响分析; 并进一步应用Laplace逼近方法简化EM算法中的积分计算. 在此基础上, 基于数据删除模型和局部影响分析方法导出了适用于ZI纵向计数数据模型的诊断统计量. 本文也通过实际计数数据的例子验证了诊断统计量的有效性.     

The ALTO project at IPN-Orsay

The availability of both a tandem deuteron beam and a linac electron beam, the latter converted into Bremsstrahlung, at the new ALTO facility at IPN-Orsay offers a unique opportunity to compare the performance of a laser ion guide under different regimes. The ALTO accelerator has delivered its first electron beam at the end of 2005 and a design for a gas-cell prototype is being studied.     

金属氧化物薄膜的多离子束反应共溅射模型(Ⅱ)——数值计算与结果讨论

结合实验中的工艺技术参数,以Pb,Ti两金属靶的反应共溅射为例,对我们提出的金属氧化物薄膜的多离子束反应共溅射模型进行数值计算,分别得出了各靶的溅射速率R,反应腔中反应气体分压p以及衬底Pb,Ti的金属单质和氧化物所占的有效面积百分比与反应共溅射中直接可调的物理量,即反应气体总量Q和溅射离子束流J的关系.计算结果表明,该模型揭示了反应溅射具有滞回效应的本质特征,反映了反应共溅射中相关参数的相互影响与相互耦合的特点,给出了薄膜中组分原子百分比及其氧化物的形态与溅射工艺的关系,指出了多离子束反应共溅射中稳恒溅 关键词：     

Optimization technique based on learning automata

Optimization techniques are finding increasingly numerous applications in process design, in parallel to the increase of computer sophistication. The process synthesis problem can be stated as a largescale constrained optimization problem involving numerous local optima and presenting a nonlinear and nonconvex character. To solve this kind of problem, the classical optimization methods can lead to analytical and numerical difficulties. This paper describes the feasibility of an optimization technique based on learning systems which can take into consideration all the prior information concerning the process to be optimized and improve their behavior with time. This information generally occurs in a very complex analytical, empirical, or know-how form. Computer simulations related to chemical engineering problems (benzene chlorination, distillation sequence) and numerical examples are presented. The results illustrate both the performance and the implementation simplicity of this method.Nomenclature c _i penalty probability - cp precision parameter on constraints - D variation domain of the variablex - f(·) objective function - g(·) constraints - i,j indexes - k iteration number - N number of actions - P probability distribution vector - p _i ith component of the vectorP as iterationk - r number of reactors in the flowsheet - u(k) discrete value or action chosen by the algorithm at iterationk - u _i discrete value of the optimization variable in [u _min,u _max] - u _min lowest value of the optimization variable - u _max largest value of the optimization variable - Z random number - x variable for the criterion function - xp precision parameter on criterion function - W(k) performance index unit output at iterationk - ₀, ₁ reinforcement scheme parameters - _p sum of the probability distribution vector components