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A method using a sulfur chemiluminescence detector (SCD) has been developed for the qualitative and quantitative determination of sulfur components in stabilized gasoline-range process streams, including blended gasolines containing between 1 and > 4000 ppm total sulfur. The detection limit per sulfur component was approximately 50 ppb. On-column injection was employed for optimum precision and accuracy. A new probe material was found which did not soften under FID operating conditions. A new method, using a hydrogen sulfide permeation tube, was developed for rapid alignment of the probe in the FID. 相似文献
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The intramolecular and long-range ferromagnetic coupling between p-phenylenediamine radical cations in head-to-tail coupled oligo(1, 4-phenyleneethynylene)s and oligo(1,4-phenylenvinylene)s between neighbors and next-nearest neighbors is described. UV/vis/near-IR experiments show that the radical cations are localized in the pendant p-phenylenediamine units of the conjugated oligomers. The ESR spectra of these oligo(1,4-phenyleneethynylene) and oligo(1, 4-phenylenvinylene) di(radical cation)s are consistent with those of a triplet state. A linear behavior is observed for the doubly integrated ESR intensity of the DeltaM(s) = +/-1 and DeltaM(s) = +/-2 signals with the inverse temperature (I approximately 1/T), consistent with Curie's law. This behavior indicates a triplet ground-state diradical with a large triplet-singlet energy gap or possibly a degeneracy of singlet and triplet states. 相似文献
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The novolac-based resins used as positive-tone photoresists are frequently etched in an oxygen plasma. It is desirable to have a predictive model of the photoresist etch rate but, for process improvement, control, and analysis, the development of a rigorous mechanistic model is impractical. Instead, a simplified mechanistic model is derived, here, according to the method proposed by Hougen and Watson for the study of fluid–solid interactions. This model derivation method is employed in order to arrive at a functional form that represents chemical etching of the resist by oxygen radicals, assisted by the plasma ion flux. Values for model parameters are determined from process data by nonlinear regression. The quality of the model fit to the data is tested statistically. 相似文献
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