Highly refractive polymer resin derived from sulfur‐containing aromatic acrylate

New sulfur‐containing polymers with high‐refractive indices and low birefringences have been developed as UV‐curable high‐refractive polymer resins. The polymers derived from 2,7‐bis[(2‐acryloylethyl)sulfanyl]thianthrene (2,7‐BAST) and 4,4′‐bis[(acryloyloxyethylthio)diphenylsulfide (4,4′‐BADS) were prepared by photopolymerization under UV irradiation. Transparent UV‐cured films were obtained in both cases. Both polymers showed good thermal stability, such as a 5% weight‐loss temperature at 355 °C under nitrogen and glass transition temperatures (T_g) in the range of 94–143 °C. They also showed high‐refractive indices of 1.6531 and 1.6645 at 632.8 nm and low birefringences of 0.0039 and 0.0069 in addition to high transparency in the visible region. © 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 48: 2604–2609, 2010     

Direct patterning of poly(amic acid) and low‐temperature imidization using a crosslinker,a photoacid generator,and a thermobase generator

A positive‐type photosensitive polyimide (PSPI) based on poly(amic acid) (PAA), a crosslinker 1,1,1‐tris{4‐[2‐(vinyloxy)ethoxy]phenyl}ethane (TVPE), a photoacid generator (PAG) (5‐propylsulfonyloxyimino‐5H‐thiophen‐2‐ylidene)‐2‐(methylphenyl)acetonitrile (PTMA), and a thermobase generator (TBG) t‐butyl 2,6‐dimethylpiperidine‐1‐carboxylate (BDPC) has been developed as a promising material in microelectronics. The PAA was prepared from 3,3′,4,4′‐biphenyltetracarboxylic dianhydride (BPDA) and 4,4′‐oxydianiline (ODA) in dimethyl sulfoxide (DMSO). The PSPI, consisting of PAA (69 wt %), TPVE (21 wt %), PTMA (3 wt %), and BDPC (7 wt %), showed high sensitivity of 21 mJ/cm² and a high contrast of 6.8 when it was exposed to a 436‐nm line (g‐line), postbaked at 90 °C for 5 min, and developed with 1.69 wt % TMAHaq. A clear positive image of 8 μm line and space pattern was printed on film, which was exposed to 50 mJ/cm² of g‐line by a contact printing mode and fully converted to the corresponding polyimide (PI) pattern on heating at 200 °C, confirmed by FTIR spectroscopy. Thus, this system will be a good candidate for next generation PSPIs. © 2009 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 47: 3362–3369, 2009     

An Enhanced Arimoto Theorem on Threshold Transformations

It is proved that there exists a threshold transformation of {0,1} ⁿ such that for any 1≤k≤2 ⁿ , its graph has a k-cycle that is the only cycle or loop. Implications on dynamical systems of neural networks are also discussed. Received: September 24, 1997 Final version received: September 21, 1998     

Absolutely continuous invariant measures for expanding piecewise linear maps

We prove the existence of absolutely continuous invariant measures for arbitrary expanding piecewise linear maps on bounded polyhedral domains in Euclidean spaces ℝ ^d . Oblatum 6-V-1999 & 8-VI-2000?Published online: 11 October 2000     

Binary 1,4-asymmetric induction from a single allyltin reagent with a chiral nitrogen functional group toward aldehydes

Using a single allyltin reagent with a chiral nitrogen functionality, binary and remote asymmetric induction was realized toward various aldehydes. Either syn- or anti-1,4-amino-alcohols were selectively obtained with the use of Yb(OTf)₃ or SnCl₄, respectively. The structures of both diastereomers were identified by means of X-ray analysis.