直流电弧等离子体制备NiO纳米颗粒研究

采用直流电弧等离子体技术成功制备了NiO纳米颗粒,并利用X射线衍射(XRD)、透射电子显微镜(TEM)和相应选区电子衍射(SAED)、傅里叶变换红外光谱(FTIR)、BET氮吸附等测试方法对样品的成分、形貌、晶体结构、比表面积、粒度分布、红外吸收性能进行表征分析.实验结果表明:直流电弧等离子体制备的NiO纳米颗粒为fcc结构的晶态,形貌呈规则的球形,粒度均匀,分散性良好,粒径范围在15～45 nm,平均粒径为25 nm,比表面积为33 m2/g.与普通块体NiO相比,红外吸收峰发生了红移.     

论物理中的和谐统一性及对物理教学的启示

1　物理中和谐统一性在物理学习过程中,很多同学都认为物理学定律多、公式多、内容抽象,难以理解和掌握.因此,往往公式和定律死记硬背、应用起来生搬硬套,学习不灵活,不能举一反三,也就出现了死读书现象.然而,物理学作为一门严谨的自然科学,也与其它学科一样是科学系统的一个子     

Photoconductive multi-layer graphene photodetectors fabricated on etched silicon-on-insulator substrates

Recently, graphene-based photodetectors have been rapidly developed. However, their photoresponsivities are generally low due to the weak optical absorption strength of graphene. In this paper, we fabricate photoconductive multi-layer graphene(MLG) photodetectors on etched silicon-on-insulator substrates. A photoresponsivity exceeding 200 A·W-1is obtained, which enables most optoelectronic application. In addition, according to the analyses of the high photoresponsivity and long photoresponse time, we conclude that the working mechanism of the device is photoconductive effect. The process of photons conversion into conducting electrons is also described in detail. Finally, according to the distinct difference between the photoresponses at 1550 nm and 808 nm, we estimate that the position of the trapping energy is somewhere between 0.4 e V and 0.76 e V, higher than the Fermi energy of MLG. Our work paves a new way for fabricating the graphene photoconductive photodetectors.     

La掺杂对ZnO纳米薄膜微观结构与光学特性的影响

采用射频磁控溅射方法在Si衬底上制备了不同掺杂量的La掺杂ZnO(ZnO∶La)薄膜.用X射线衍射(XRD)、扫描电子显微镜(SEM)、紫外-可见分光光度计和光致荧光发光(PL)等表征技术,研究了不同掺杂量对ZnO∶ La薄膜的微观结构和光学特性的影响.结果表明,所有薄膜均只出现的(002)衍射峰,表明La3+可以替代ZB2或者进入ZnO晶格间隙,并未改变ZnO的六角纤锌矿结构.通过计算可知La掺杂可以抑制ZnO的晶粒增长.可见光范围的透过率超过80;,同时随着La掺杂量的增加,薄膜的光学带隙值逐渐增大.通过对光致发光谱的研究表明,La掺杂可以增强ZnO薄膜室温下的紫外光发光强度.     

第一性原理研究Cd掺杂对ZnO电子结构与光学性质的影响

采用第一性原理平面波超软赝势方法超软赝势方法,研究了Cd掺杂前后ZnO的电子结构以及光学性质.计算结果发现:Cd的掺入使得ZnO的电子结构发生了改变,晶胞变大,禁带宽度变窄.Cd掺杂使ZnO的光学性质也发生了变化,4.3 eV处的介电峰增强并发生红移,12.9 eV处的介电峰减弱,对紫外光吸收作用增强.     

六方氮化硼的结晶度对合成立方氮化硼的影响

 将3种不同初始结晶度的六方氮化硼（h-BN）分别与Li₃N按一定比例混合,在低于立方氮化硼（c-BN）的合成温度和压力条件下,采用高温、高压预处理方式,使3种h-BN的结晶度发生改变。对不同预处理条件下得到的h-BN进行X射线衍射分析,确定了结晶度的变化程度。用不同结晶度的h-BN作为初始原料合成c-BN,观察并分析了h-BN向c-BN转化时微观结构的变化以及h-BN的结晶度对合成c-BN的影响。实验结果表明,结晶度低的h-BN更容易合成c-BN。     

Metamorphic InGaAs p-i-n Photodetectors with 1.75 μm Cut-Off Wavelength Grown on GaAs

Top-illuminated metamorphic InGaAs p-i-n photodetectors （PDs） with 50% cut-off wavelength of 1.75 μm at room temperature are fabricated on GaAs substrates. The PDs are grown by a solid-source molecular beam epitaxy system. The large lattice mismatch strain is accommodated by growth of a linearly graded buffer layer to create a high quality virtual InP substrate indium content in the metamorphic buffer layer linearly changes from 2% to 60%. The dark current densities are typically 5 × 10^-6 A/cm^2 at 0 V bias and 2.24 × 10^-4 A/cm^2 at a reverse bias of 5 V. At a wavelength of 1.55 μm, the PDs have an optical responsivity of 0.48 A/W, a linear photoresponse up to 5 mW optical power at -4 V bias. The measured -3 dB bandwidth of a 32 μm diameter device is 7 GHz. This work proves that InGaAs buffer layers grown by solid source MBE are promising candidates for GaAs-based long wavelength devices.