Structural and band tail state photoluminescence properties of amorphous SiC films with different amounts of carbon

Amorphous silicon carbide films are deposited by the plasma enhanced chemical vapour deposition technique,and optical emissions from the near-infrared to the visible are obtained.The optical band gap of the films increases from 1.91 eV to 2.92 eV by increasing the carbon content,and the photoluminescence(PL) peak shifts from 1.51 eV to 2.16 eV.The band tail state PL mechanism is confirmed by analysing the optical band gap,PL intensity,the Stocks shift of the PL,and the Urbach energy of the film.The PL decay times of the samples are in the nanosecond scale,and the dependence of the PL lifetime on the emission energy also supports that the optical emission is related to the radiative recombination in the band tail state.     

Eu、Mg共掺ZnO薄膜的微观结构与光致发光性能研究

采用射频磁控溅射技术,以不同Eu、Mg掺杂比的ZnO/MgO/Eu2O3陶瓷靶材,制备了Eu、Mg共掺的ZnO薄膜(ZMEO).通过X射线衍射(XRD)、Raman散射及光致发光(PL)技术研究了Eu、Mg掺杂比对ZMEO薄膜微观结构和光致发光性能的影响.结果表明:所制备的ZMEO薄膜皆为六角纤锌矿型结构.适当的Eu、Mg掺杂比不但有利于ZnO晶粒的生长,而且可以引入缺陷俘获导带电子,促进ZnO和Eu3+之间的能量传递,使Eu3+的红光发射强度获得提升.     

Mg1-xNaxB2的结构和超导特性研究

在Ar气保护条件下,采用烧结扩散反应法制备了不同钠含量的Mg1-xNaxB2块状样品.用X射线衍射及SQUID磁强计对样品进行了分析.X射线衍射检测结果表明样品中除了MgO杂相之外,主要为晶态MgB2物相.SQUID测量结果表明:钠的掺入仅使MgB2超导转变温度稍有降低.同时发现在样品的烧制过程中,多于化学计量比的Mg粉并没有影响到超导的转变温度及转变温度的宽度.     

不同衬底温度下ZnO外延薄膜的结构及光学特性分析

采用螺旋波等离子体辅助射频溅射沉积技术在Al2O3(0001)衬底上沉积ZnO外延薄膜,通过对其结构及光学性质的分析,探讨了衬底温度对薄膜生长特性的影响.实验结果表明,由于等离子体对反应气体的活化及载能粒子对表面反应的辅助作用,采用该等离子体辅助溅射技术能够在较低的衬底温度下实现较高质量的ZnO薄膜外延生长,然而,较高的衬底温度所引起的表面反应不利于薄膜中的氧空位及锌填隙等缺陷的减少,这将限制薄膜的外延质量及光学特性的进一步提高.     

脉冲激光退火纳米碳化硅的光致发光

采用XeCl准分子脉冲激光退火技术制备了纳米晶态碳化硅薄膜(nc-SiC),并对薄膜的光致发光(PL)特性进行了分析。结果表明,纳米SiC薄膜的光致发光表现为300～600 nm范围内的较宽发光谱带,随退火激光能量密度的增加,nc-SiC薄膜398 nm附近的发光峰相对强度增加,而470 nm附近发光峰相对减小。根据nc-SiC薄膜的结构特性变化, 认为这两个发光峰分别来源于6H-SiC导带到价带间的复合发光和缺陷态发光,并且这两种发光过程存在竞争。     

Laser-induced voltage effects in Ca3Co4O9 thin films on tilted LaAlO3（001） substrates grown by chemical solution deposition

Laser-induced voltage effects in c-axis oriented Ca3Co4O9 thin films have been studied with samples fabricated on 10 tilted LaAlO3(001) substrates by a simple chemical solution deposition method. An open-circuit voltage with a rise time of about 10 ns and full width at half maximum of about 28 ns is detected when the film surface is irradiated by a 308-nm laser pulse with a duration of 25 ns. Besides, open-circuit voltage signals are also observed when the film surface is irradiated separately by the laser pulses of 532 nm and 1064 nm. The results indicate that Ca3Co4O9 thin films have a great potential application in the wide range photodetctor from the ultraviolet to near infrared regions.     

等离子体增强化学气相沉积氮化碳薄膜过程中的光学发射谱研究

利用光学发射谱技术对直流辉光放电等离子体增强的化学气相沉积氮化碳薄膜过程中的等离子体进行了原位诊断，结果表明主要的辐射有N2的第二正系跃迁、N2^ 的第一负系跃迁、CN和NH的紫外跃迁。研究了气源中氢气含量、放电电流及沉积气压的变化对N2（337.1nm)，N2^ (391.4nm)和CN(388.3nm)辐射强度的影响，并在此基础上探讨了这几种跃迁的激发机制，其结果为氮化碳合成中优化沉积参数、控制实验过程提供了依据。     

镶嵌有纳米硅的SiN_x薄膜光致发光的温度依赖特性研究

采用对靶磁控溅射法在单晶硅衬底上沉积镶嵌有纳米硅的氮化硅薄膜,然后在形成气体FG(10%H2,90%N2)气氛中进行450℃常规热退火50min。通过荧光光谱仪测得的稳态/瞬态光致发光(PL)谱研究了镶嵌有纳米硅的氮化硅(SiNx)薄膜样品光致发光特性。结果表明,样品的发光过程可以归因于纳米硅的量子限制效应发光和与缺陷相关的发光。随着激发光能量的增加,PL谱峰位发生蓝移,表明较小粒度的纳米硅发光比例增加;温度的降低会抑制非辐射复合过程,提高辐射复合几率,因此发光寿命延长,发光强度呈指数增加;随着探测波长的减小,样品的发光寿命则明显缩短,表明纳米硅的量子限制效应发光对温度有很强的依赖性。     

螺旋波等离子体化学气相沉积纳米硅薄膜的光学发射谱研究

利用光学发射谱技术对螺旋波等离子体化学气相沉积纳米硅薄膜的等离子体内活性粒子的光发射特征进行了原位测量.研究了薄膜沉积过程中各实验参量对活性基团SiH^*， H^β以及H^α的发射谱强度的影响.实验结果表明，静态磁场的加入可显著提高反应气体 的解离效率 ；适当的氢稀释可以提高氢活性粒子的浓度，而过高的氢稀释比将使含硅活性基团浓度显著 减小；提高射频馈入功率整体上可以使各活性粒子的浓度增加，并有利于提高到达衬底表面 氢活性粒子的相对比例.结合螺旋波等离子体色散关系和等离子体特点对以上结果进行了分 析.该结果为螺旋波等离子体沉积纳米硅薄膜过程的理解及制备工艺参数的调整提供了基础 数据. 关键词： 光学发射谱 螺旋波等离子体化学气相沉积 纳米硅薄膜     

Low-temperature phase transformation of CZTS thin films

The low temperature phase transformation in the Cu_2ZnSnS_4(CZTS) films was investigated by laser annealing and low temperature thermal annealing.The Raman measurements show that a-high-power laser annealing could cause a red shift of the Raman scattering peaks of the kesterite(KS) structure and promotes the formation of the partially disordered kesterite(PD-KS) structure in the CZTS films,and the low-temperature thermal annealing only shifts the Raman scattering peak of KS phase by several wavenumber to low frequency and the broads Raman peaks in the low frequency region.Moreover,the above two processes were reversible.The Raman analyses of the CZTS samples prepared under different process show that the PD-KS structure tends to be found at low temperatures and low sulfur vapor pressures.Our results reveal that the control of the phase structure in CZTS films is feasible by adjusting the preparation process of the films.