首页 | 本学科首页   官方微博 | 高级检索  
文章检索
  按 检索   检索词:      
出版年份:   被引次数:   他引次数: 提示:输入*表示无穷大
  收费全文   333篇
  免费   12篇
化学   220篇
力学   10篇
数学   31篇
物理学   84篇
  2022年   3篇
  2021年   5篇
  2020年   4篇
  2018年   8篇
  2017年   5篇
  2016年   9篇
  2015年   5篇
  2014年   16篇
  2013年   20篇
  2012年   9篇
  2011年   8篇
  2010年   11篇
  2009年   3篇
  2008年   5篇
  2007年   6篇
  2006年   7篇
  2005年   7篇
  2003年   9篇
  2002年   5篇
  2001年   9篇
  2000年   8篇
  1999年   9篇
  1998年   4篇
  1997年   4篇
  1996年   9篇
  1995年   8篇
  1994年   6篇
  1993年   4篇
  1992年   4篇
  1991年   4篇
  1990年   5篇
  1989年   4篇
  1987年   3篇
  1985年   7篇
  1984年   3篇
  1983年   6篇
  1982年   3篇
  1981年   3篇
  1980年   5篇
  1979年   6篇
  1977年   4篇
  1976年   4篇
  1973年   5篇
  1957年   3篇
  1942年   3篇
  1941年   3篇
  1939年   3篇
  1938年   8篇
  1934年   4篇
  1927年   2篇
排序方式: 共有345条查询结果,搜索用时 343 毫秒
301.
302.
303.
Diselenadiphosphetane Diselenides and Triselenadiphospholane Diselenides – Synthesis and Characterization by 31P and 77Se Solid‐State NMR Spectroscopy 1,3‐Diselena‐2,4‐diphosphetane‐2,4‐diselenides (RPSe2)2 with R = Me, Et, t‐Bu, Ph, 4‐Me2NC6H4, 4‐MeOC6H4 have been synthesized by different methods. The insoluble compounds were investigated by 31P and 77Se solid‐state NMR and the purity of the compounds has been checked by their CP MAS sideband NMR spectra. The structure of the investigated compounds has been confirmed by the isotropic and anisotropic values of the chemical shifts and the 1JP–Se coupling constants. In addition, two new 1,2,4‐triselena‐3,5‐diphospholane‐3,5‐diselenides, (RPSe2)2Se (R = Me, Et), formed under similar synthesis conditions, were investigated. Their structure was derived from the 77Se satellites of 31P solution spectra and from solid‐state spectra. For (t‐BuPSe2)2 the experimentally obtained principal values of phosphorus and selenium shielding tensors are compared with values from IGLO calculations (HF und SOS DFPT). The calculated orientations of the principal axes are discussed.  相似文献   
304.
The structure, bonding, and reactivity of small, highly unsaturated ring systems is of fundamental interest for inorganic and organic chemistry. Four-membered metallacyclobuta-2,3-dienes, also referred to as metallacycloallenes, are among the most exotic examples for ring systems as these represent organometallic analogs of 1,2-cyclobutadiene, the smallest cyclic allene. Herein, the synthesis of the first examples of 1-zirconacyclobuta-2,3-dienes of the type [Cp′2Zr(Me3SiC3SiMe3)] (Cp′2 = rac-(ebthi), (ebthi = 1,2-ethylene-1,1′-bis(η5-tetrahydroindenyl)) (2a); rac-Me2Si(thi)2, thi = (η5-tetrahydroindenyl), (2b)) is presented. Both complexes undergo selective thermal C–H activation at the 7-position of the ansa-cyclopentadienyl ligand to produce a new type of “tucked-in” zirconocene system, 3a and 3b, that possesses a η3-propargyl/allenyl ligand. Both types of complexes react with carbonyl compounds, producing enynes in the case of 2a and 2b, as well as η1-allenyl complexes for 3a and 3b. Computational analysis of the structure and bonding of 2a and 3a reveals significant differences to a previously described related Ti complex. All complexes were fully characterised, including X-ray crystallography and experimental results were supported by DFT analysis.

A detailed study of structure, bonding and reactivity of new 1-zirconacyclobuta-2,3-dienes is presented in comparison to a lighter Ti analog. We found a unique C–H activation at the widely used rac-(ebthi) ligand for that only occurs for Zr.  相似文献   
305.
Several series of poly(arylene ether)s with trifluoromethyl substituents were prepared and characterized. These materials are potential candidates for the use as low dielectric constant insulators (intermetal dielectrics, IMD, and interlayer dielectrics, ILD) on microchips. Thermal stability up to 450 °C and a dielectric constant below 3 preferably below 2.5) is required for this application. The thermal stability of the poly(arylene ether)s was increased from 320°C to more than 500 °C by optimization of the structure of the repeating unit. The dielectric constant of one of the most promising structures was determined to be 2.8. In addition, plasma polymerized thin films from hexafluorobenzene, tetrafluorobenzene, perfluorotoluene and perfluorodecaline were prepared and characterized with respect to solubility, dielectric constant, adhesion, and thermal stability.  相似文献   
306.
The intermetallic compounds CaCuGe, CaAuIn, and CaAuSn can be prepared from the elements in sealed tantalum tubes or in glassy carbon crucibles in a high-frequency furnace. Their crystal structures were determined from single crystal X-ray data. The three compounds crystallize with the same subcell structure (KHg2), however, they form three clearly perceptible superstructures with different unit cells, but all in space groups Pnma: a = 2124.9(6) pm, b = 436.0(2) pm, c = 749.4(5) pm, Z = 12, wR2 = 0.0789, 1303 F2 values, 56 variables for CaCuGe (own structure type), a = 738.2(1) pm, b = 459.4(1) pm, c = 839.4(2) pm, Z = 4, wR2 = 0.0651, 656 F2 values, 20 variables for CaAuIn (TiNiSi type), a = 3690.3(3) pm, b = 470.5(1) pm, c = 813.6(2) pm, Z = 20, wR2 = 0.1294, 1730 F2 values, 92 variables for CaAuSn (new structure type). The three structures may be considered as superstructures of the KHg2 type with an ordered arrangement of the transition metal and germanium (indium, tin) atoms on the mercury position. Each calcium atom in the structures of CaCuGe, CaAuIn, and CaAuSn has an distinctly ordered near-neighbor environment of six transition metal (T) and six p element (X) atoms in the form of two counter-tilted T3X3 hexagons. All known superstructures of the KHg2 type are described in terms of a group-subgroup scheme.  相似文献   
307.
Monocrystalline semiconductor wafers made of silicon represent the base material for microelectronic devices. The transfer of the precursor material quartz into a 300 mm wafer deposited with an epitaxial layer requires a multitude of process steps, part of which are determined by chemical reactions. This article has introduced into the manufacturing of semiconductor silicon and the processes etching, polishing, cleaning and epitaxy. This technology branch, though, is distinguished by extreme requirements regarding surface perfection and cleanliness, which may be expressed in atomic layers (surface roughness of the wafers) and ppt (contamination of chemicals)  相似文献   
308.
309.
310.
A method of nondestructive depth profiling in near surface regions of solids is described. Models have been discussed from which algorithms for evaluation of measured data are obtained. The algorithms, based on standard profiles with free parameters, have been adjusted to the data resulting from angle resolved XPS (ARXPS) by means of least squares fits. Depth profile analyses and segregation studies were performed on Pt–Ni and Fe–S specimens.  相似文献   
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号