载流子选择性接触:高效硅太阳电池的选择

太阳电池可看成由光子吸收层和接触层两个基本单元组成,接触层是高复合活性金属界面和光子吸收层之间的区域.为了进一步提高硅太阳电池的转换效率,关键是降低光子吸收层和接触之间的复合损失.近年来,载流子选择性接触引起了光伏界的研究兴趣,其被认为是接近硅太阳电池效率理论极限的最后的障碍之一.本文分析了三种类型的载流子选择性接触:在光子吸收层与金属界面之间引入薄的重掺杂层,即所谓的发射极或背面场;利用两种材料之间的导带或价带对齐;利用高功函数的金属氧化物与晶硅接触从而在晶硅中感应能带弯曲.基于一维太阳电池模拟软件wx AMPS,模拟了扩散同质结硅太阳电池[结构为(p~+)c-Si/(n)c-Si/(n~+)c-Si]、非晶硅薄膜硅异质结太阳电池[结构为(p~+)a-Si/(i)a-Si/(n)c-Si/(i)a-Si/(n~+)a-Si]和氧化物薄膜硅异质结太阳电池[结构为(n)MoO_x/(n)c-Si/(n)TiO_x]暗态下的能带结构和载流子浓度的空间分布,其中c-Si为晶硅;a-Si为非晶硅;(i),(n)和(p)分别表示本征、n型掺杂和p型掺杂.模拟结果表明:载流子选择性接触的核心是在接触处晶硅表面附近形成载流子浓度空间分布的不对称进而使得电导率的不对称,形成了对电子的高阻和空穴的低阻或者对空穴的高阻和电子的低阻,从而让空穴轻松通过同时阻挡电子,或者让电子轻松通过同时阻挡空穴,形成空穴选择性接触或者电子选择性接触.     

金属衬底上高质量大面积石墨烯的插层及其机制

石墨烯作为一种新型二维材料,因其优异的性质,在科学和应用领域具有非常重要的意义.而其超高的载流子迁移率、室温量子霍尔效应等,使其在信息器件领域备受关注.如何获得高质量并且与当代硅基工艺兼容的石墨烯功能器件,是未来将石墨烯应用于电子学领域的关键.近年来,研究人员发展了一种在外延石墨烯和金属衬底之间实现硅插层的技术,将金属表面外延石墨烯高质量、大面积的特点与当代硅基工艺结合起来,实现了无需转移且无损地将高质量石墨烯置于半导体之上.通过系统的实验研究并结合理论计算,揭示了插层过程包含四个主要阶段:诱导产生缺陷、异质原子插层、石墨烯自我修复和异质原子扩散成膜,并证实了这一插层机制的普适性.拉曼和角分辨光电子能谱实验结果表明,插层后的石墨烯恢复了本征特性,接近自由状态.此外,还实现了多种单质元素的插层.不同种类的原子形成不同的插层结构,从而构成了多种石墨烯/插层异质结.这为调控石墨烯的性质提供了实验基础,也展现了该插层技术的普适性.     

Almost mobility edges and the existence of critical regions in one-dimensional quasiperiodic lattices

We study a one-dimensional quasiperiodic system described by the Aubry–André model in the small wave vector limit and demonstrate the existence of almost mobility edges and critical regions in the system. It is well known that the eigenstates of the Aubry–André model are either extended or localized depending on the strength of incommensurate potential V being less or bigger than a critical value V _c , and thus no mobility edge exists. However, it was shown in a recent work that for the system with V < V _c and the wave vector α of the incommensurate potential is small, there exist almost mobility edges at the energy E _c±, which separate the robustly delocalized states from “almost localized” states. We find that, besides E _c±, there exist additionally another energy edges E _c′±, at which abrupt change of inverse participation ratio (IPR) occurs. By using the IPR and carrying out multifractal analyses, we identify the existence of critical regions among |E _c±|?≤?|E|?≤?|E _c′±| with the mobility edges E _c± and E _c′± separating the critical region from the extended and localized regions, respectively. We also study the system with V > V _c , for which all eigenstates are localized states, but can be divided into extended, critical and localized states in their dual space by utilizing the self-duality property of the Aubry–André model.     

Development of picosecond time‐resolved X‐ray absorption spectroscopy by high‐repetition‐rate laser pump/X‐ray probe at Beijing Synchrotron Radiation Facility

A new setup and commissioning of transient X‐ray absorption spectroscopy are described, based on the high‐repetition‐rate laser pump/X‐ray probe method, at the 1W2B wiggler beamline at the Beijing Synchrotron Radiation Facility. A high‐repetition‐rate and high‐power laser is incorporated into the setup with in‐house‐built avalanche photodiodes as detectors. A simple acquisition scheme was applied to obtain laser‐on and laser‐off signals simultaneously. The capability of picosecond transient X‐ray absorption spectroscopy measurement was demonstrated for a photo‐induced spin‐crossover iron complex in 6 mM solution with 155 kHz repetition rate.     

氮化铝双端固支音叉谐振器的结构设计

基于氮化铝双端固支音叉（AlN DETF）的谐振式传感器具有尺寸小、稳定性和可靠性好、时间响应快等特点。为了提高灵敏度和分辨率,需要分析AlN DETF谐振器的振梁结构参数对灵敏度和信号功率的影响。在有限元仿真软件中建立AlN谐振器的多物理场模型,进行预应力特征频率分析,仿真验证单个振梁结构参数对灵敏度的影响。在振梁厚度保持恒定的情况下,对仿真结果的数据进行后处理,得到信号功率与振梁长度、宽度的关系。结果表明,相对灵敏度、信号功率随振梁长度、宽度的变化趋势相反。因此,需要根据工艺水平和结构强度等因素,综合考虑AlN谐振器的信号功率和相对灵敏度,对两者进行权衡。仿真分析了优化后AlN DETF谐振器的性能,10 N范围内的灵敏度为56 Hz/N,信号功率为6.810-4 nW,Q值为958。     

三维射频加速腔程序包MAFIA的开发和应用

介绍了三维射频加速器计算机辅助设计(CAD)程序包MAFIA的特点、功能及其应用。用CAD的方法实现了射频加速器特别是非轴对称带耦合腔的加速器的三维腔形设计。同时介绍了节省内存、节约机时的模型方法,使得在中小型机器上运行大程序(八万条)成为可能。文章主要对L波段的加速腔进行了数值模拟,并和实验进行了比较,结果符合较好;通过三维数值模拟及图形模拟的方法比较了各种形状谐振腔的性能;计算分析了输入耦合腔及高阶模耦合器对加速腔电磁场分布等参量的影响;提出了加耦合器后谐振频率改变的补偿方法。     

一种多通道纳秒分幅相机

相机采用棱镜分光,薄片管增强象,电选通分幅。由四个薄片管组成四个通道,每一个通道代表一个单幅相机,分幅时序由专门电控电路进行控制,接触相机记录图象,最短曝光时间3ns,动态空间分辩率5～81lp/mm,最高分幅速率2×10⁸幅/秒,动态范围50°,在爆炸、激光、放电,光谱学等方面有广泛的应用。