等离子体隐身技术

等离子体隐身技术的核心是电磁波与等离子体的相互作用。本论述了等离子体隐身技术的基本原理，发展现状与应用前景，并讨论了实现等离子体隐身的关键技术和目前存在的问题。     

反馈控制双车道跟驰模型研究

通过引入合理的换道规则，将单车道反馈控制模型扩展成双车道交通流模型.数值仿真表明，与经典的优化速度双车道模型相比，由于引入适当的反馈控制信息，车辆速度波动变小或消失，系统不会出现严重的堵塞现象.这说明该双车道反馈控制模型能有效地抑制或缓解交通流堵塞. 关键词： 跟驰模型 双车道模型 反馈控制 堵塞抑制     

与794nm飞秒激光精确同步的无直流背底的1064nm脉冲光的产生

基于非共线光参量放大(NOPA)，以宽带794nm飞秒激光的倍频光为抽运光，以连续的He-Ne激光为信号光，产生了与宽带794nm飞秒激光精确同步的无直流背底的1064nm的脉冲光.实验结果显示该1064nm的光脉冲可作为光参量啁啾脉冲放大系统的抽运激光链的种子光，从而实现用全光学方法实现OPCPA系统抽运光和信号光的精确同步.还将非共线光参量放大器置于经特殊设计的He-Ne激光腔内，也同样成功得到了无直流背底的1064nm的光脉冲.经一次光参量放大后所得到的1064nm光的光谱和空间啁啾特性与非共线光参量放大器置于He-Ne激光腔外时得到的1064nm的光脉冲相同，而其单脉冲能量约为腔外NOPA的10倍. 关键词： 非线性光参量放大 光参量啁啾脉冲放大 时间同步     

基于丙烯酸酯的全息聚合物分散液晶光栅的动力学理论研究

采用一维无限长模型分析法对全息聚合物分散液晶(HPDLC)做了动力学方面的研究，给出了相关的扩散动力学方程和聚合动力学方程,并与折射率调制度Δn相结合获得了光栅衍射效率的表达式，对HPDLC光栅性能的改善提供了理论上的指导.     

Propagation of hollow Gaussian beam through a misaligned first-order optical system and its propagation properties

Propagation properties of hollow Gaussian beam through a misaligned first-order ABCD system is studied using the generalized Huygens-Fresnel diffraction integral, augmented matrix. It is shown that, as a hollow Gaussian beam passes through the misaligned first-order ABCD system, the beam shape is not preserved, the out-put beams have differences when passing different misaligned optical systems. We can adjust the size of dark region through adjusting the misaligned transverse vector E.     

Quantum phase transition and von Neumann entropy of quasiperiodic Hubbard chains

The half-filled Hubbard chains with the Fibonacci and Harper modulating site potentials are studied in a selfconsistent mean-field approximation. A new order parameter is introduced to describe a charge density order. We also calculate the von Neumann entropy of the ground state. The results show that the von Neumann entropy can identify a CDW/SDW （charge density wave/spin density wave） transition for quasiperiodic models.     

Novel optical lithography using silver superlens

This work has demonstrated that with silver superlens,the resolution of conventional optical lithography can be improved significantly.Experimental and simulative results are given to verify the facts that the resolution and the pattern fidelity are sensitive to the contact tightness between layers.     

Image quality assessment metrics by using directional projection

Objective image quality mcasure, which is a fundamental and challenging job in image processing, evaluates the image quality consistently with human perception automatically. On the assumption that any image distortion could be modeled as the difference between the directional projection-based maps of reference and distortion images, wc propose a new objective quality assessment method based on directional projection for full reference model. Experimental results show that the proposed metrics are well consistent with the subjective quality score.