一类小缺陷码的链条件

利用射影几何方法在小缺陷码中,NMDS码是链条件码;给出k维NμMDS(0μk-2)码满足链条件的一个充要条件与一些易判断的充分条件.     

烟气中Hg的氧化机理的研究

本文对Ｈｇ与Ｃｌ２在烟气中的氧化反应进行了热力平衡计算和动力学计算。平衡计算的结果表明有ＣＩ元索存在时Ｈｇ的氧化率为１００％，而在相同的条件下动力学计算纺果为Ｈｇ的氧化率在２０％～８０％之间变化，与实验结果吻合。实际的氧化反应是一种超平衡状态，不能达到理想的平衡状态。因此应采用动力学与热力平衡分析相结合的方法研究Ｈｇ在烟气中的反应机理。同时，计算结果显示Ｃｌ含量对Ｈｇ的氧化率的影响很大．     

网络环境下的物理实验教学模式

目前网络环境下的物理实验教学新模式主要有物理实验专题网站、实验教学网络管理、实验类网络课程及远程控制物理实验.本文简要介绍了各个模式的特点及实施方法.     

Oxidation process of SiGe on SOI substrates

The oxidation of SiGe film epitaxial grown on top of SOI wafers has been studied. These SiGe/SOI samples were oxidized at 700, 900, 1100 °C. Germanium atoms were rejected from SiGe film to SOI layer. A new Si_1−xGe_x (x is minimal) layer formed at SiGe/Si interface. As the germanium atoms diffused, the new Si_1−xGe_x (x is minimal) layer moved to Si/SiO₂ interface. Propagation of threading dislocation in SiGe film to SOI substrate was hindered by the new SiGe/Si interface. Strain in SOI substrate transferred from SiGe film was released through dislocation nucleation and propagation inner. The relaxation of SiGe film could be described as: strain relaxed through strain equalization and transfer process between SiGe film and SOI substrates. Raman spectroscopy was used to characterize the strain of SiGe film. Microstructure of SiGe/SOI was observed by transmission electron microscope (TEM).     

NA列加权乘积和的完全收敛性

本文讨论了NA和几类加权部分和及加权乘积和的完全收敛性，其中部分结果要优于iid列的已知结论。     

高温水蓄冷空调的原理和理论分析

介绍了一种新型高温水蓄冷空调方案的原理井进行了理论分析。它可利用高至３８℃水的显热或其它材料的相变潜热来蓄冷空调．分析了完全不掺混系统的性能与过冷水流率的关系；给出了完全掺混系统非稳态循环的性能变化；数值计算并讨论了蓄冷水部分掺混系统的温度分层和动态特性、为高温水蓄冷空调系统的设计和运行提供了理论指导．     

熔融LiCl及其急冷非晶键取向序的分子动力学模拟研究

本文进一步讨论了我们新近提出的等近邻数键球谐函数方法,并通过分子动力学模拟研究了熔融LiCl及其急冷过程。对计算机模拟各时间步产生的瞬态构型进行平均,计算了不同温度下键序Q_l谱.将模拟Q_l谱与线性组合模型Q_l谱比较,观察到模拟Q_l谱与含90％局部正四面体结构的组合模型十分相似,表明熔融Licl及其急冷非晶中局部键取向序明显倾向于正四面体序。急冷过程中不同温度下局部键取向序可用同一线性组合模型描述,但模型方差随模拟温度明显变化。方差随温度而降低,且在发生玻璃态转变时有一显著下降。不同温度下的键角分布也作了计算,观察到键角分布在109°(正四面体局部结构键角)附近且分布峰随温度升高而展宽,与键序Q_l得到的结论一致。     

ZnSe及ZnSe/GaAs异质结构中压力导致的直接禁带向间接禁带的转变

用经验赝势方法计算了体ZnSe以及ZnSe/GaAs单异质结系统中ZnSe外延层г、X、L等特殊对称点导带底能量随压力的变化。结果表明，同Si、Ge、GaAs等半导体材料不同，ZnSe的X点导带底具有正的压力系数，但比г点的压力系数小，这是ZnSe材料以及ZnSe基异质结构材料发生直接禁带向间接禁带的转变时所需转变压力较大的根本原因。研究了ZnSe/GaAs异质结构中晶格失配造成的应变对外延层г、X、L对称点压力系数的影响，表明这种晶格失配造成的应变可以极大地减小ZnSe外延层材料由直接禁带向间接禁带的转变压力。     

A Promising MoO_x-based Catalyst for n-Heptane Isomerization

The increasing demand for higher-octane gasoline and the regulations limiting the amount of aromatics in the fuel motivate the interest in catalytic isomerization of n-alkanes. In the last ten years, transition metal oxides or oxycarbides based on molybdenum or tungstate have attracted much attention due to their high activity and isomerization selectivity compared to the conventional bifunctional supported platinum catalyst and high resistance to sulphur and nitrogen catalyst poisons1-5. Ma…     

Effect of ion impinging on the microstructure and field emission of carbon nanotubes

Effects of ion impinging on the microstructure and field electron emission properties of screen-printed carbon nanotube films were investigated. We observed that the plasma treatment modified the microstructure of CNTs along with the remarkable increase of emission site density. With the prolongation of ion impinging time, the emission current falls down first, and then rises up to higher than that of the untreated films. It is proposed that the change of emission characteristics is due to the different emission mechanisms. After the treatment, electrons are emitted predominantly from the nano-nodes on the tube wall instead from the nanotube tips.