Homoclinic and Periodic Orbits Arising Near the Heteroclinic Cycle Connecting Saddle-focus and Saddle Under Reversible Condition

In this paper, we study the dynamical behavior for a 4-dimensional reversible system near its heteroclinic loop connecting a saddle-focus and a saddle. The existence of infinitely many reversible 1-homoclinic orbits to the saddle and 2-homoclinic orbits to the saddle-focus is shown. And it is also proved that, corresponding to each 1-homoclinic （resp. 2-homoclinic） orbit F, there is a spiral segment such that the associated orbits starting from the segment are all reversible 1-periodic （resp. 2-periodic） and accumulate onto F. Moreover, each 2-homoclinic orbit may be also accumulated by a sequence of reversible 4-homoclinic orbits.     

Eu3+离子在微晶玻璃研究中的探针作用

制备出单掺Eu3+离子的氟氧化物玻璃陶瓷系列样品,利用Eu3+离子作为荧光探针,通过热处理前后Eu3+离子发射光谱中电偶极子跃迁与磁偶极子跃迁强度比值的变化表征在玻璃材料中微晶是否形成,分析了Eu3+离子荧光发射谱中电偶极子跃迁与晶体场对称性的关系,进一步表征了稀土离子所处微晶晶格场的变化.     

由大学多媒体教学实践所引发的深入思考

多媒体技术是物理教学良好的辅助工具，多媒体技术的应用为大学物理教学开辟了一片广阔天地。它能大大增加物理教学的信息量，图形形象直观、生动活泼，有着传统教学无法比拟的优势，但是，多媒体技术使用不当也会给物理教学带来一些负面影响。     

High longitudinal selectivity of shifting multiplexing in volume holograms

High longitudinal selectivity of the shifting multiplexing with spherical reference wave is proposed and demonstrated. A simplified method based on wave optics is used for calculating the selectivity, and the result fits well the experimental measurement. Under the paraxial condition, a simple formula for the longitudinal selectivity is introduced. With use of an object lens with effective NA=0.817, we obtain that an FWHM of selectivity is as small as 1 μm.     

最有效的相容剂是两嵌段还是多嵌段聚合物？

采用Monte Carlo模拟方法研究了多嵌段聚合物在A／B／嵌段聚合物三组份体系作为相容剂使用的有效性．占总体积19％的A组份在体系中为分散相．模拟结果显示了两嵌段和多嵌段聚合物在界面上的聚集行为,以及如何影响这个不相容体系的相形为．两嵌段聚合物趋于直立在相界面上,而多嵌段聚合物更容易横跨在相界面上并占据较大的界面积．从而导致多嵌段聚合物更有效的阻止体系相分离的发生．     

A Lower Bound for {a+b:aA, bB, and P(a,b)≠0}

Let A and B be two finite subsets of a field . In this paper, we provide a non-trivial lower bound for {a+b:aA, bB, and P(a,b)≠0} where P(x,y) [x,y].     

掺杂Er^3＋的TiO2的发射光谱研究

用无水乙醇、冰醋酸、钛酸丁酯凝胶法制备了掺杂Er^3＋的TiO2粉末，测量了其在488m激发下的Stokes发射光谱和980nm激发下的上转换发光光谱。在可见光范围内，观察到了绿光和红光，绿光从500-570nm，对应Er^3＋的^2H11/2,^4S3／2→^4I15/2，红光从650～690m，对应Er^3＋的^4F9／2→^4I15／2的跃迁。由ln Ivis-In Iin曲线可知，绿光和红光均为双光子过程，光强正比于泵浦功率的二次方，即Iout ∝Iin。初步研究了此材料的上转换过程。     

水雾化制备Fe74Al4Sn2P10C2B4Si4非晶合金粉末及其磁粉芯性能研究

采用水雾化方法制备Fe7Al4Sn2P10C2B4Si4合金粉末,研究发现该合金具有强的非晶形成能力和高热稳定性,在粉末粒度小于400目时可以形成非晶态合金.采用该非晶粉末制备的磁粉芯在高频下品质因数显著高于MPP粉芯,说明该磁粉芯高频损耗较低.分析表明,非晶合金磁粉芯高频下损耗低的主要原因是电阻率较高.     

Surface free energy of CrNx films deposited using closed field unbalanced magnetron sputtering

CrN_x thin films have attracted much attention for semiconductor IC packaging molding dies and forming tools due to their excellent hardness, thermal stability and non-sticking properties (low surface free energy). However, few data has been published on the surface free energy (SFE) of CrN_x films at temperatures in the range 20-170 °C. In this study CrN_x thin films with CrN, Cr(N), Cr₂N (and mixture of these phases) were prepared using closed field unbalanced magnetron sputtering at a wide range of Cr⁺² emission intensity. The contact angles of water, di-iodomethane and ethylene glycol on the coated surfaces were measured at temperatures in the range 20-170 °C using a Dataphysics OCA-20 contact angle analyzer. The surface free energy of the CrN_x films and their components (e.g., dispersion, polar) were calculated using the Owens-Wendt geometric mean approach. The influences of CrN_x film surface roughness and microstructure on the surface free energy were investigated by atomic force microscopy (AFM) and X-ray diffraction (XRD), respectively. The experimental results showed that the lowest total SFE was obtained corresponding to CrN at temperature in 20 °C. This is lower than that of Cr(N), Cr₂N (and mixture of these phases). The total SFE, dispersive SFE and polar SFE of CrN_x films decreased with increasing surface temperature. The film roughness has an obvious effect on the SFE and there is tendency for the SFE to increase with increasing film surface roughness.