Propane formation by aqueous-phase reforming of glycerol over Pt/H-ZSM5 catalysts

Solid acid supports such as H-ZSM5, H-Mordenite, γ-Al₂O₃, USY and Beta catalysts were modified with Pt. These Pt/oxide catalysts were found to be active for propane formation through aqueous reforming of glycerol in the presence of hydrogen. The reforming reactions, possibly, proceeded through reaction cycles of dehydration on acid sites and hydrogenation on Pt sites over the catalysts.     

Negative‐working photoresist of methacrylate polymers based on the transesterification of the 2‐hydroxyethyl group in the presence of an acid

This article reports a novel crosslinking functionality of the 2‐hydroxyethyl methacrylate unit (HEMA) in the presence of an acid. The polymeric compositions, consisting of a polymer containing the HEMA unit and a photoacid generator, were insolubilized in an aqueous base developer on exposure to UV light and a successive baking process to provide a negative‐working photoresist. A series of poly(benzyl methacrylate‐co‐methacrylic acid‐co‐2‐hydroxyethyl methacrylate) terpolymers with various contents of HEMA were prepared to elucidate the photopolymeric characteristics. The polymer behavior in films was examined by a comparison of the photosensitivity and IR spectroscopic method. Experiments with a model compound were also carried out. On the basis of the results, we found that the resist was insolubilized by crosslinking through the transesterification of HEMA segments due to acid generated from the photoacid generator and subsequent heating. The advantage of using the 2‐hydroxyethyl group is that in the terpolymer, the HEMA unit is transparent at a short‐wavelength region and is a promising crosslinking unit for ArF lithographic photoresists. © 2002 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 40: 1858–1867, 2002     

Formation and dichroism of poly(vinyl alcohol)–iodine complex in photocurable film

The formation of polyiodine complexes was investigated in a photocurable poly(vinyl alcohol) modified N‐methyl‐4(4′‐formylstyryl)pyridinium methosulfate acetal (PVA‐SbQ), which is a photofunctional group that causes photodimerization. PVA‐SbQ films with polyiodine complexes were prepared to be photocured, iodinated and soaked in a boric acid solution. The formation of PVA–polyiodine complexes was studied during iodinating and while in the boric acid treatment through UV–vis absorption spectrometry, resonance Raman spectrometry and IR absorption spectrometry. As a result, polyiodines were formed in the photocurable PVA‐SbQ films, and the formation of PVA–polyiodine complexes was enhanced by boric acid treatment. It was found that the SbQ‐ratio of PVA‐SbQ affects the formation of PVA–polyiodine complexes. The photocrosslinking by the dimerization of SbQ groups helps to form the PVA–I₅⁻ complex during the boric acid treatment. Based on this effect, we demonstrated a unique recording method by the PVA–polyiodine complex formation. The PVA‐SbQ film cured by the irradiation of the liner polarized light showed that dichroism of the PVA–polyiodine complexes formed after iodination. Copyright © 2015 John Wiley & Sons, Ltd.     

Surface patterned graft copolymerization of hydrophilic monomers onto hydrophobic polymer film upon UV irradiation

A random copolymer [p(MMA/DMAB)] composed of methyl methacrylate (MMA) and 2,2‐dimethoxy‐1,2‐di(4‐methacryloyloxy)phenylethane‐1‐one (DMAB), which can simultaneously act as a photoradical initiator and crosslinkable monomer, was prepared by free radical random copolymerization. A hydrophobic film on quartz glass was prepared using p(MMA/DMAB) by a spin‐coating technique. Hydrophilic methacrylic acid (MA) and 2‐methacryloyloxyethyl phosphorylcholine (MPC) were graft‐copolymerized from the hydrophobic p(MMA/DMAB) film in water by photo‐cleavage of the DMAB unit. The graft copolymer of MA and MPC was characterized by infrared and X‐ray photoelectron spectroscopies and contact angle measurements. To confirm that MPC can be grafted onto the surface of the film selectively at only UV‐irradiated sites, photoinduced graft copolymerization of MPC using a photomask was performed to prepare a pMPC patterned p(MMA/DMAB) film. The film was stained using a rhodamine 6G dye that can absorb specifically to pMPC to confirm the pMPC pattern. The p(MMA/DMAB) film can be applied to various fields including photolithography and biomedical applications, because the film surface properties can be controlled using various vinyl monomers selectively on UV‐irradiated sites. © 2014 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2014 , 52, 2822–2829     

Fischer-Tropsch synthesis over Ru/Al2O3 catalysts

Fischer-Tropsch syntheses (FTS) were carried out in a slurry phase over Ru/Al₂O₃ catalysts using hexadecane as a solvent. The outcome of the FTS was dependent on the oxide support, calcination temperature, synthesis gas composition and sulfur content. The addition of Mn/Na to Ru/Al₂O₃ was effective in raising the initial activity and C5+ selectivity, but after 20 hours, the performance of the modified catalyst was similar to that of the unmodified catalyst. An additional investigation involving the use of fresh vs used catalysts demonstrated that an agglomeration of the metallic Ru, at least in part, does occur during the reaction.     

Super-liquid-repellent surfaces prepared by colloidal silica nanoparticles covered with fluoroalkyl groups

A simple and easy method to prepare super-liquid-repellent surfaces is proposed. Sol-gel films were prepared by hydrolysis and condensation of alkoxysilane compounds. Both surface energy and roughness were controlled using colloidal silica particles and fluoroalkylsilane. When the fractional amounts of both colloidal silica and fluoroalkylsilane were optimized in the films, the film surface exhibited repellency to both water and oil. Finally, it was shown that the method proposed here would be applied to a simple one-pot coating for a uniform large area, and be useful for practical use.     

Extended Hartree-Fock (EHF) theory of chemical reactions

The triplet-instability analysis of the closed-shell RHF solutions has been carried out in relation to the orbital and spin correlation effects for various transition structures (TS) and reaction intermediates. It is found that the RHF solutions even for cyclic transition states of the Woodward-Hoffmann symmetry-allowed reactions often involve the triplet instability, indicating the crucial role of correlation corrections. The di- and tetra-radical characters for the transition structures are calculated by the projected UHF (PUHF) solutions resulting from the instability. The spin projection is also crucial for the UHF Møller-Plesset (UMP) correlated wavefunctions obtained for the transition structures of 1,3-dipolar, Diels-Alder, ene and related reactions. The relative stability between cyclic and acyclic TS for these reactions is examined at the approximately projected UHF MP2 (APU MP2) level. The former is found to be more favorable than the latter if the correlation correction is taken into account for TS in a well-balanced manner.Dedicated to Professor J. Koutecký on the occassion of his 65th birthday     

Surface and interfacial segregation in blends of polystyrene with functional end groups and deuterated polystyrene

The effect of chain-end chemistry on surface and interfacial segregation in symmetric blends of polystyrene (hPS)/deuterated polystyrene (dPS) has been investigated by X-ray photoelectron and secondary ion mass spectroscopy in conjunction with neutron reflectivity measurements. Alpha,omega-fluoroalkyl- and alpha,omega-carboxy-terminated polystyrenes (alpha,omega-hPS(Rf)2 and alpha,omega-hPS(COOH)2) were used as end-functionalized polymers; the former possesses chain ends with lower surface energies, and the latter possesses higher surface energies compared with that of the main chain. In the case of an alpha,omega-hPS(Rf)2/dPS blend film, alpha,omega-hPS(Rf)2 was enriched at the surface owing to the surface localization of the Rf groups, although the surface energy of the hPS segments was slightly higher than that of the dPS ones. On the contrary, in the case of an alpha,omega-hPS(COOH)2/dPS blend film, dPS was preferentially segregated at the surface. This may be due to a surface depletion of COOH ends and an apparent molecular weight increase of alpha,omega-hPS(COOH)2 produced by a hydrogen-bonded intermolecular association of COOH ends in addition to the surface energy difference between hPS and dPS segments. Interestingly, both Rf and COOH chain ends were partitioned to the substrate interface for the alpha,omega-hPS(Rf)2/dPS and alpha,omega-hPS(COOH)2/dPS blend films, resulting in the segregation of the hPS component at the substrate interface for both blends. The results presented imply that surface and interfacial segregation in polymer blends could be regulated by incorporating functional groups into the end portions of one component.     

Conversion of poly(ethylene‐alt‐tetrafluoroethylene) copolymers into polytetrafluoroethylene by direct fluorination: A convenient approach to access new properties at the ETFE surface

Direct fluorination of poly(ethylene‐alt‐tetrafluoroethylene) copolymer (ETFE) was carried out on commercially available ETFE films with pure fluorine gas at ambient atmosphere. Reaction temperature was either 95 °C or 150 °C and exposure time was 20 hours. Analysis of the fluorinated samples was performed by attenuated total reflection Fourier transform Infrared, confocal micro‐Raman and ¹H and ¹⁹F magic angle spinning nuclear magnetic resonance spectroscopies, scanning electron microscopy, electron diffraction and X‐Ray photoelectron spectroscopies, contact angle determination, atomic force microscopy and nanoindentation measurements, and compared to those of the virgin ETFE copolymer. Integrity of the bulk materials was verified by investigating the thermal behavior of the polymers by thermogravimetric analysis and differential scanning calorimetry. Evidence for the formation of a homogeneous layer of polytetrafluoroethylene with a thickness of several microns at the surface of the copolymers with no degradation of the materials was observed. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011