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31.
Series of exactly solvable non-trivial complex potentials (possessing real spectra) are generated by applying the Darboux transformation to the excited eigenstates of a non-Hermitian potential V(x). This method yields an infinite number of non-trivial partner potentials, defined over the whole real line, whose spectra are nearly exactly identical to the original potential.  相似文献   
32.
Advances in Data Analysis and Classification - Interval data, a special case of symbolic data, are becoming more frequent in different fields of applications due to the uncertainty in the...  相似文献   
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34.
Summary The high sorption capacity of basic alumina for tetracycline hydrochloride is utilized for the separation of metal ions on the basis of ligand exchange. Tetracyclines are powerful chelating agents. Break-through capacity and rate of sorption have been studied. The distribution coefficients of 11 metal ions have been determined in demineralised water and in five different pH systems. On the basis of differences in Kd values some quantitative separations of metal ions have been achieved.  相似文献   
35.
New precursor chemistries for the atomic layer deposition (ALD) of aluminium oxide are reported as potential alternatives to the pyrophoric trimethylaluminium (TMA) which is to date a widely used Al precursor. Combining the high reactivity of aluminium alkyls employing the 3-(dimethylamino)propyl (DMP) ligand with thermally stable amide ligands yielded three new heteroleptic, non-pyrophoric compounds [Al(NMe2)2(DMP)] ( 2 ), [Al(NEt2)2(DMP)] ( 3 , BDEADA) and [Al(NiPr2)2(DMP)] ( 4 ), which combine the properties of both ligand systems. The compounds were synthesized and thoroughly chemically characterized, showing the intramolecular stabilization of the DMP ligand as well as only reactive Al−C and Al−N bonds, which are the key factors for the thermal stability accompanied by a sufficient reactivity, both being crucial for ALD precursors. Upon rational variation of the amide alkyl chains, tunable and high evaporation rates accompanied by thermal stability were found, as revealed by thermal evaluation. In addition, a new and promising plasma enhanced (PE)ALD process using BDEADA and oxygen plasma in a wide temperature range from 60 to 220 °C is reported and compared to that of a modified variation of the TMA, namely [AlMe2(DMP)] (DMAD). The resulting Al2O3 layers are of high density, smooth, uniform, and of high purity. The applicability of the Al2O3 films as effective gas barrier layers (GBLs) was successfully demonstrated, considering that coating on polyethylene terephthalate (PET) substrates yielded very good oxygen transmission rates (OTR) with an improvement factor of 86 for a 15 nm film by using DMAD and a factor of 25 for a film thickness of just 5 nm by using BDEDA compared to bare PET substrates. All these film attributes are of the same quality as those obtained for the industrial precursor TMA, rendering the new precursors safe and potential alternatives to TMA.  相似文献   
36.
Novel guanidinato complexes of hafnium [Hf{eta2-(iPrN)2CNR2}2(NR2)2] (R2 = Et2, 1; Et, Me, 2; Me2, 3), synthesized by insertion reactions of N,N'-diisopropylcarbodiimide into the M-N bonds of homologous hafnium amide complexes 1-3 and {[mu2-NC(NMe2)2][NC(NMe2)2]2HfCl}2 (4) using a salt metathesis reaction, are reported. Single-crystal X-ray diffraction analysis revealed that compounds 1-3 were monomers, while compound 4 was found to be a dimer. The observed fluxional behavior of compounds 1-3 was studied in detail using variable-temperature and two-dimensional NMR techniques. The thermal characteristics of compounds 1-3 seem promising for HfO2 thin films by vapor deposition techniques. Metal-organic chemical vapor deposition experiments with compound 2 as the precursor resulted in smooth, uniform, and stoichiometric HfO2 thin films at relatively low deposition temperatures. The basic properties of HfO2 thin films were characterized in some detail.  相似文献   
37.
A scheme for studyingq deformed quasi exactly solvable problem has been applied to the Schrödinger Hulthen problem (l=0). It is found that for the confined Hulthen problem, the confining parameter can be related to the deformation parameterq.  相似文献   
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We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf(O(i)Pr)2(tbaoac)2] and its application towards MOCVD of HfO2 thin films in a production tool CVD reactor.  相似文献   
39.
It is observed that the additive as well as multiplicative Jordan decompositions hold in alternative loop algebras of finiteRA loops and theRA loops for which the additive Jordan decomposition holds in the integral loop ring are characterized. Multiplicative Jordan decomposition (MJD) inZL, whereL is a finiteRA loop with cyclic centre is analysed, besides settling MJD for integral loop rings of allRA loops of order ≤32. It is also shown that for any finiteRA loopL,U (ZL) is an almost splittable Moufang loop. Research of the second author is supported by CSIR.  相似文献   
40.
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