I2-mediated α-selective Ferrier glycosylation approach to synthesis of O-glycosyl amino acids

I₂ is an effective promoter for the synthesis of 2,3-unsaturated glycosides via Ferrier glycosylation. This reaction was used in the present work for the synthesis of O-glycosylated Fmoc amino acid building blocks. This metal-free reaction afforded the desired products with good to excellent yields with good α-selectivity.     

苯—长链烯烃烷基化催化剂的稳定性和再生性能

对中孔分子筛负载杂多酸催化剂在苯与十二烯烷基化反应中的失活行为及再生方法进行了研究。研究发现:负载型催化剂的活性、稳定性和产物分布均优于HY分子筛催化剂,在烷基化反应过程中,由烯烃聚合物衍生的焦质沉积在催化剂表面上,导致催化剂失活,并且反应温度越高,催化剂粒径越大,催化剂活性稳定性越差;随着催化剂生焦量增加,烯烃转化率递减,线性烷基苯选择性仅在970～998%之间变化,苯基十二烷中2-位异构体的含量提高,6-位异构体的含量降低。对失活催化剂进行烧焦再生或在反应温度以上用苯抽提再生,其活性得到部分恢复。     

Preparation and Characterization of Nanoscopic Organic Semiconductor of Oxovanadium Phthalocyanine

Nanoscopic particles of oxovanadium phthalocyanine (VOPc, phase-II) with different particle sizes are prepared by aggregation of VOPc molecules in the presence of surfactants for the first time. A size effect in the region of nanoscale was observed in the UV-visible spectra. The photoconductivity of the nanoscopic VOPc is much higher than that of bulk VOPc. Copyright 1999 Academic Press.     

分子力场进展

分子力学（简称ＭＭ）是近年来化学家常用的一种计算方法。与量子力学从头计算和半经验方法相比，用分子力学处理大分子可以大大节省计算时间，而且，在大多数情况下，用分子力学方法计算得到的分子几何构型参数与实验值之间的差值可在实验误差范围之内。所以，分子力学是研究生物化学体系的有效和可行的手段。分子力学的核心是分子力场。本文介绍了分子力场的量子力学背景、分子力场和光谱力场之间的关系。分子力场的一般形式、分力     

四（对三甲铵苯基）卟啉分光光度法测定稻米中的微量锌

四（对三甲铵苯基）卟啉，在乙二胺存在下与Ｚｎ（Ⅱ）形成络合物。据此提出了用分光光度法测定微量锌的方法，该络合物最大吸收波长为４２５ｎｍ表观摩尔吸光系数为３．４２×１０＾５，锌量在０～４．５μｇ／２５ｍＬ范围内符合比尔定律，本法可用于稻米中微量锌的测定。     

116例冠心病患者血清中钙镁钡铝锶含量的研究

测定１１６例冠心病患者血清中钙，镁，钡，铝和锶的含量并与正常值比较，常量元素钙，镁和微量元素锶降低，而微量元素钡和铝升高，它们之间的差异都有显著或高度显著性。Ｐ〈０．０５或Ｐ〈０．０１。     

用MES及XRD研究FT合成催化剂的活性结构

采用穆斯堡尔谱及Ｘ光衍射法研究了共沉淀法制备的不同Ｆｅ／Ｍｎ比催化剂在焙烧、合成气还原及ＦＴ反应后体系相结构的变化。结果表明：锰助剂的加入使催化本相由铁磁性逐渐转化为超顺磁性，相应使催化剂还原逐渐难，Ｍｎ助剂促进了ＦＴ合成反应进行。反应性能与Ｆｅ／Ｍｎ尖晶石（Ｆｅ１－ｙＭｎｙ）３Ｏ４组成含量及式中ｙ大小密切相关，与ＭｎＣｏ３及ＭｎＯ的存在也有一定关系。富铁催化剂中Ｍｎ主要起电子助剂作用，而富锰催化     

Dry etching of InGaP and AlInP in CH4/H2/Ar

Electron cyclotron resonance (ECR) plasma etching with additional rf-biasing produces etch rates 2,500 A/min for InGaP and AlInP in CH₄/H₂/Ar. These rates are an order of magnitude or much higher than for reactive ion etching conditions (RIE) carried out in the same reactor. N₂ addition to CH₄/H₂/Ar can enhance the InGaP etch rates at low flow rates, while at higher concentrations it provides an etch-stop reaction. The InGaP and AlInP etched under ECR conditions have somewhat rougher morphologies and different stoichiometries up to 200 Å from the sur face relative to the RIE samples.     

不同形态阴离子的高效毛细管电泳的间接紫外检测

本文研究了用毛细管电泳紫外间接检测法对几种阴离子不同形态进行分析。