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R. Serna C.N. Afonso C. Ricolleau Y. Wang Y. Zheng M. Gandais I. Vickridge 《Applied Physics A: Materials Science & Processing》2000,71(5):583-586
The processes leading to the formation of Cu:Al2O3 composite films on Si (001) with a well defined nanostructure by alternate pulsed laser deposition (a-PLD) in vacuum are
investigated. Alternately amorphous Al2O3 layers and Cu nanocrystals nucleated on the Al2O3 surface are formed, according to the PLD sequence. The Al2O3 deposited on the Cu nanocrystals fills in the space between them until they are completely buried, and subsequently, a continuous
dense layer with a very flat surface (within 1 nm) is developed. The nucleation process of the nanocrystals and their resulting
oblate ellipsoidal shape are discussed in terms of the role of the energetic species involved in the PLD process and the metal–oxide
interface energy.
Received: 4 July 2000 / Accepted: 5 July 2000 / Published online: 13 September 2000 相似文献