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991.
992.
993.
The results of Monte Carlo simulations of the beta dose rate to enamel are presented. The dose rates are the most comprehensive to date, incorporating the beta spectrum from 21 different radionuclides, all internal conversion and Auger electrons, the majority of the bremsstrahlung radiation, effects due to radon loss in the uranium series, and variations in the moisture content of the sediment. Applications to a new dating technique in archaeology using electron spin resonance and beta-gradient isochrons are discussed. 相似文献
994.
B. MacMillan M. Halse M. Schneider L. Fardy Y. H. Chui B. J. Balcom 《Applied magnetic resonance》2002,22(2):247-256
Magnetic resonance imaging has rarely been applied to rigid polymeric materials, due primarily to the strong dipolar coupling and short signal lifetimes inherent in these materials. SPRITE (single point ramped imaging withT 1 enhancement) (B. J. Balcom, R. P. MacGregor, S. D. Beyea, D. P. Green, R. L. Armstrong, T. W. Bremner: J. Magn. Reson. A123, 131–134, 1996) is particularly well suited to imaging solid materials. With SPRITE, the only requirement is thatT 2* be long enough so that the signal can be phase-encoded. The minimum phase encoding time is limited by the maximum gradient strength available and by the instrument deadtime. At present this is usually tens of microseconds and will only improve with refinements in technology. We have used the SPRITE sequence in conjunction with raising the sample temperature to obtain images of rigid polymers that have largely frustrated conventional imaging methods. This approach provides a straightforward and reliable method for imaging a class of samples that, up until now, have been very difficult to image. 相似文献
995.
K. Venkatakrishnan B.K.A. Ngoi P. Stanley L.E.N. Lim B. Tan N.R. Sivakumar 《Applied Physics A: Materials Science & Processing》2002,75(4):493-496
Photomasks are the backbone of microfabrication industries. Currently they are fabricated by a lithographic process, which
is very expensive and time consuming since it is a multi-step process. These issues can be addressed by fabricating photomasks
by direct femtosecond laser writing, which is a single-step process and comparatively cheaper and faster than lithography.
In this paper we discuss our investigations on the effect of two types of laser writing techniques, namely front- and rear-side
laser writing, with regard to the feature size and the edge quality of a feature. It is proved conclusively that for the patterning
of masks, front-side laser writing is a better technique than rear-side laser writing with regard to smaller feature size
and better edge quality. Moreover the energy required for front-side laser writing is considerably lower than that for rear-side
laser writing.
Received: 22 May 2001 / Accepted: 14 September 2001 / Published online: 17 October 2001 相似文献
996.
997.
S. Kwieciński M. Weychert A. Jasiński P. Kulinowski I. Wawer E. Sieradzki 《Applied magnetic resonance》2002,22(1):23-29
The disintegration of bromhexin tablets was monitored by magnetic resonance imaging. The fast imaging method FLASH with spoiling
gradients was used to obtain images of the tablets in short time intervals. The rate of the disintegration depends on the
preparation method, kind and percentage of the carrier (polyethylene glycol, lactose). Solid dispersion with slow evaporation
of solvent yields materials with decreased dissolution rate. Increasing molecular mass of polyethylene glycol and its percentage
content also hampers disintegration. 相似文献
998.
B. Pignataro L. Chi S. Gao B. Anczykowski C. Niemeyer M. Adler H. Fuchs 《Applied Physics A: Materials Science & Processing》2002,74(3):447-452
Self-assembled oligomeric nanostructures consisting of bisbiotinylated DNA fragments connected by the protein streptavidin
(STV) are studied by dynamic scanning force microscopy (SFM) operating in air. A comparison of the images taken in repulsive
and attractive regimes is systematically made on DNA and STV structures. Stable and reproducible SFM images are obtained in
the attractive regime by using a special feedback circuit, called Q-control. On the other hand, when SFM is operating in the
repulsive regime, deformation of the structures that reduce the resolution and the image quality are clearly observable. The
heights of both DNA and STV have been measured as a function of the tip/molecule interaction forces. This study offers the
possibility to suggest a different mechanical behavior of DNA with respect to STV.
Received: 24 July 2001 / Accepted: 3 December 2001 / Published online: 4 March 2002 相似文献
999.
P. Kratzer E. Penev M. Scheffler 《Applied Physics A: Materials Science & Processing》2002,75(1):79-88
We demonstrate how first-principles calculations using density-functional theory (DFT) can be applied to gain insight into
the molecular processes that rule the physics of materials processing. Specifically, we study the molecular beam epitaxy (MBE)
of arsenic compound semiconductors. For homoepitaxy of GaAs on GaAs (001), a growth model is presented that builds on results
of DFT calculations for molecular processes on the β2-reconstructed GaAs (001) surface, including adsorption, desorption,
surface diffusion, and nucleation. Kinetic Monte Carlo simulations on the basis of the calculated energetics enable us to
model MBE growth of GaAs from beams of Ga and As2 in atomistic detail. The simulations show that island nucleation is controlled by the reaction of As2 molecules with Ga adatoms on the surface. The analysis reveals that the scaling laws of standard nucleation theory for the
island density as a function of growth temperature are not applicable to GaAs epitaxy. We also discuss heteroepitaxy of InAs
on GaAs (001), and report first-principles DFT calculations for In diffusion on the strained GaAs substrate. In particular,
we address the effect of heteroepitaxial strain on the growth kinetics of coherently strained InAs islands. The strain field
around an island is found to cause a slowing down of material transport from the substrate towards the island, and thus helps
to achieve more homogeneous island sizes.
Received: 2 May 2001 / Accepted: 23 July 2001 / Published online: 3 April 2002 相似文献
1000.