Local-density approximation for orbital densities applied to the self-interaction correction

A simple approximation to the functional derivative of Perdew-Zunger-type self-interaction-corrected local-spin density functional is suggested. In this approach, the orbital density |phi(isigma)(r)|(2) is regarded as a functional of the local electron density |phi(isigma)(r)|(2)=n(isigma)(n(sigma)(r)) so as to enable a functional derivative of n(isigma)(n(sigma)(r)) with respect to n(sigma)(r). Our computational results show that this approximation gives fairly good estimates of the total energy, the ionization potential, and the electron affinity for atoms. Comparative studies of this method with the averaged-density approximation and the global averaging method for the self-interaction correction are made.     

Study of polymer-stabilised blue phase liquid crystal on a single substrate

One outstanding feature of the polymer-stabilised blue phase (PSBP) is that it is unnecessary to form an alignment film, which requires a high-temperature baking process. Therefore, PSBPs may enable flexible liquid crystal displays (LCDs) on plastic substrates. In this study, polymer stabilisation of a blue phase (BP) on a single substrate was performed without using a conventional sandwich-type cell, and the electro-optical properties are demonstrated to be similar to those of a sandwich-type PSBP LCD cell. It was experimentally shown that the oxygen which inhibits radical polymerisation is required to be excluded in order to complete the polymer stabilisation in blue phase.     

Synthesis, structure, and properties of benzoquinone dimer and trimers bearing t-Bu substituents

Highly soluble and stable quinone dimer and trimers were successfully yielded by introduction of t-Bu substituents. In X-ray structure analysis, the dimer quinone moiety was distorted into the boat shape, which was clarified by MO calculations. X-ray and UV/vis studies indicated that the covalently linked quinone moieties bear a large torsional angle. Nevertheless, the reduction potentials rose significantly with the order of monomer < dimer < trimer, indicating that the negative charge was efficiently delocalized within the radical anions.     

Brønsted acid catalyzed formal insertion of isocyanides into a C-O bond of acetals

The Br?nsted acid catalyzed formal insertion of an isocyanide into a C-O bond of an acetal is described. A diverse array of acyclic and cyclic acetals can be applied to the catalytic insertion to form alpha-alkoxy imidates. Functional groups, such as nitro, cyano, halogen, ester, and alkoxy groups, are tolerant to the reaction conditions employed. The course of the reaction is highly dependent on the structure of the isocyanide. The use of an electron-deficient aryl isocyanide, such as 2c and 2d, is required to selectively obtain the monoinsertion product. When aryl isocyanides containing alkyl substituents, such as 2a and 2b, are employed, two molecules of the isocyanide are incorporated, and the double-insertion product is obtained. The reaction of tert-octyl isocyanide also induces a double incorporation, but the subsequent acid-mediated fragmentation leads to the 2-alkoxy imidoyl cyanide. The monoinsertion products, alpha-alkoxy imidates, can readily be hydrolyzed to alpha-alkoxy esters, realizing the formal carbonylation of an acetal.     

1,3,5-trinitro-1,3,5-triazine decomposition and chemisorption on Al(111) surface: first-principles molecular dynamics study

We have investigated the decomposition and chemisorption of a 1,3,5-trinitro-1,3,5-triazine (RDX) molecule on Al(111) surface using molecular dynamics simulations, in which interatomic forces are computed quantum mechanically in the framework of the density functional theory (DFT). The real-space DFT calculations are based on higher-order finite difference and norm-conserving pseudopotential methods. Strong attractive forces between oxygen and aluminum atoms break N-O and N-N bonds in the RDX and, subsequently, the dissociated oxygen atoms and NO molecules oxidize the Al surface. In addition to these Al surface-assisted decompositions, ring cleavage of the RDX molecule is also observed. These reactions occur spontaneously without potential barriers and result in the attachment of the rest of the RDX molecule to the surface. This opens up the possibility of coating Al nanoparticles with RDX molecules to avoid the detrimental effect of oxidation in high energy density material applications.     

Surface design for precise control of spatial growth of a mesostructured inorganic/organic film on a large-scale area

A microfabrication technique is presented to fabricate a mesostructured inorganic/organic composite film, i.e., silica/cetyltrimethylammonium chloride (CTAC) film, with near-perfect site-selectivity on a large surface area based on a spatially regulated growth method. To precisely regulate the site-selective growth of this mesocomposite film at the solid/liquid interface, we designed a novel microtemplate consisting of a "dual-component" self-assembled monolayer (SAM) with alternating hydrophobic trifluorocarbon (CF3) and cationic amino (NH2) groups. First, (heptadecafluoro-1,1,2,2-tetrahydrodecyl)trimethoxysilane (FAS)-SAM was formed onto Si substrate covered with native oxide (SiO2/Si) from vapor phase. The substrate was then photolithographically micropatterned using 172 nm vacuum UV light. Finally, the micropatterned FAS-SAM was immersed in a solution of 1 vol % (aminoethylaminomethyl)phenethyltrimethoxysilane (AEAMPS) in absolute toluene. Due to these treatments, a dual-SAM microtemplate with CF3- and NH2-terminated surfaces was fabricated, as evidenced by lateral force microscopy, ellipsometry, and X-ray photoelectron spectroscopy. Using this template, the microfabrication of a mesocomposite film was demonstrated. As a control, the micropatterned hydrophobic FAS-SAM template (composed of CF3- and OH-terminated surfaces) was also treated under the same conditions. Optical microscopy and atomic force microscopy confirmed that the formation of the continuous mesocomposite film proceeded only on the FAS-SAM-covered regions, while the AEAMPS-SAM-covered regions remained free of deposits. This shielding effect also remained constant regardless of the pattern's geometry, i.e., the interval distance between the FAS-SAM-covered areas in the pattern. Through this approach, we were able to obtain well-defined 5-, 10-, and 20-mum wide mesocomposite microlines over the entire 10 x 10 mm2 area with high area-selectivity. On the other hand, when the SiO2 regions were not terminated with the cationic NH2 groups, cluster formation proceeded not only on the hydrophobic CF3 regions but also on the SiO2 regions, particularly with an increase in the pattern interval distance, resulting in lower final pattern resolution.     

Molecular motion and relaxation studies of aliphatic polyureas by thermal windowing thermally stimulated depolarization current technique

Molecular motion and relaxation studies using a thermal windowing thermally stimulated depolarization current (TW‐TSDC) were performed for aliphatic polyureas 7 and 9. Global thermally stimulated depolarization current gave three characteristic major peaks corresponding to the α, β, and γ relaxation modes at 78.5, −44, and −136°C for polyurea 7 and at 80, −50, and −134°C for polyurea 9, respectively. The α relaxation is related to the large‐scale molecular motion due to micro‐Brownian motion of long‐range segments. This relaxation is significantly related to the glass‐transition temperature. The β relaxation is caused by the local thermal motion of long‐chain segments. The γ relaxation is caused by the limited local motion of hydrocarbon sections. Temperature dependence of relaxation times was expressed well using Vogel–Tammann–Fulcher (VTF) expression. 3‐D simulation of dielectric constants of dielectric strength and loss factor were performed in the frequency range from 10⁻⁶ to 10⁴ Hz and temperature range from −150 to 250°C, using the relaxation parameters obtained from the TW‐TSDC method. © 2000 John Wiley & Sons, Inc. J Polym Sci B: Polym Phys 38: 88–94, 2000