离轴三反红外双波段景象模拟器光学系统设计

 针对红外双波段成像系统性能测试与评估的应用需求,设计了3 μm～5 μm和8 μm～12 μm红外双波段视景仿真用离轴三反光学系统。在共轴三反光学系统成像理论基础上,分析了孔径光栏远离主镜的离轴三反系统像差特性,研究了大出瞳距、大相对孔径条件下离轴三反光学系统的结构设计和像差平衡方法。系统焦距为330 mm,F#为3,视场为6°×4.5°,出瞳距为750 mm,在空间频率10 lp/mm 处,中波红外MTF>0.65,长波红外MTF>0.4,接近衍射极限。具有大视场、大出瞳距、高分辨率、结构紧凑等特点。     

激光诱导击穿光谱实验装置的参数优化研究

为了使激光诱导击穿光谱(LIBS)实验装置中的多个关键参数达到最优化设置,以便更好地服务于煤质分析,实验中对这些参数与煤粉等离子体中待测元素发射谱线信噪比间的关系进行了详细研究,并根据信噪比大小来进行最优化参数的选择.实验结果表明,对于本LIBS实验装置,其最优化参数设置是将激光脉冲能量设为120 mJ·Pulse-1...     

中波红外景象投影光学系统消热差设计

针对红外成像系统性能测试与评估的应用需求,设计了一套基于数字微镜器件的消热差的中波红外景象投影光学系统.探讨了红外视景仿真用投影光学系统的像差特性和设计方法,并对投影系统的无热化进行了分析.采用分光板和补偿板方案,解决了大相对孔径条件下投影系统的远心照明分光和像差平衡问题,提高了分辨率和均匀性,增大了视场.系统由远心投...     

The effects of sapphire nitridation on GaN growth by metalorganic chemical vapour deposition

In situ optical reflectivity measurements are employed to monitor the GaN epilayer growth process above a low-temperature GaN buffer layer on a c-plane sapphire substrate by metalorganic chemical vapour deposition. It is found that the lateral growth of the GaN islands and their coalescence are promoted in the initial growth stage if optimized nitridation time and temperature are selected when the substrate is pre-exposed to ammonia. As confirmed by atomic force microscopy observations, the quality of the GaN epilayers is closely dependent on the surface morphology of the nitridated buffer layer, especially grain size and nucleation density.     

不同功率下无工质微波推力器的推力预估

基于经典电动力学理论,从麦克斯韦方程组和麦克斯韦张量出发,推导出无工质微波推力器的推力计算方程. 应用有限元分析软件,计算了特定谐振模式下的特定圆台谐振腔在不同功率条件下的电磁场分布;根据推导出的理论计算公式,计算了不同功率条件下推力器的总推力. 计算结果表明:推力与功率成正比,而且磁场力决定着总推力的大小;圆台谐振腔消耗20–200 W电磁波功率时所产生的推力在20–250 mN范围内. 关键词： 电磁波 麦克斯韦张量     

Medical ultrasound imager based on time delay spectrometry

A reflection mode proof-of-concept medical ultrasound imager based on time delay spectrometry has been developed and tested. The system uses a broad band swept-frequency signal operating up to 10 MHz. Signal processing using a fast Fourier transform (FFT) permits extraction of range information. The imager has a higher signal-to-noise ratio than pulse-echo systems which allows high resolution at greater depths. The time delay spectrometry (TDS) spread spectrum operates at lower peak intensities than pulse-echo and permits more control of the spectral content and amplitude of the signal. At present, the system is non-real time which degrades in vivo imaging because of averaging over several cardiac cycles and tissue movement.     

Relaxation of photoexcited Na$_\mathsf{3}$F

This paper describes the spectroscopy of Na₃F both in the frequency and time domains. The photoionization efficiency curve shows two thresholds, associated to two isomers. The excited electronic states of the C_2v isomer have been probed by photodepletion spectroscopy, and the results are used to analyze a time-resolved study of photoexcited Na₃F, probed by photoionization. The pump-probe signal clearly shows damped oscillations, the period of which is fitted to fs, close to twice the previously measured bending mode of Na₂F [1], while the relaxation time is fs.Received: 31 October 2003, Published online: 6 January 2004PACS: 36.40.Qv Stability and fragmentation of clusters - 33.50.-j Fluorescence and phosphorescence; radiationless transitions, quenching (intersystem crossing, internal conversion)     

Hα Emission Imaging during Supersonic Molecular Beam Injection by CCD Photograph

There are several fuelling methods for tokamak plasma： pellet injection （PI）, gas puffing （GP）, neutral beam injection （NBI） and supersonic molecular beam injection （SMBI） .SMBI has been created in the Southwestern Institute of Physics, China.     

HL-2A装置等离子体可见光成像系统

在HL-2A装置上研制了等离子体可见光成像系统,用于孔栏、偏滤器位形放电的诊断。该成像系统由彩色摄像机、观察窗和转向镜、广角收集和准直透镜组、采集卡和计算机组成。本文描述了系统的布局和各部件参数的匹配,报道了观测到的实验结果。等离子体成像系统能监视放电的整个过程,实时显示可见光辐射图形,特别在识别孔栏与偏滤器位形放电的诊断中发挥了重要作用,成为HL-2A装置放电的重要诊断手段。     

高能X射线聚焦组合透镜的理论研究

X射线聚焦组合透镜是一种利用折射效应对X射线辐射聚焦的新型元件。针对X射线波段的特性,综合考虑折射和吸收效应得出组合透镜的衍射屏函数,并利用衍射理论推导出X射线组合透镜的设计理论。利用统计学理论中一阶、二阶原点矩表征像面处的光学性能,使设计更简洁。该理论方法可方便地推广到双凹折射单元情况。通过数值计算分析了像向处强度分布的二阶中心矩以及焦点处辐射强度随组合透镜结构参最的变化关系,给出了一种铝基X射线组合透镜的结构参量设计结果。对于设计的组合透镜结构参量,计算了当X射线辐射能量分别为0．93 keV．9．89 keV和29．78 keV时,X射线辐射经过组合透镜后的焦点强度分布。