Nanosecond and picosecond laser flash photolysis studies of 2,2′-dinitrodiphenylmethanes

The transient absorption spectra of the 2,2′-dinitrodiphenylmethanes 1a–1c in solution were examined in the picosecond and nanosecond time ranges. The absorption bands, observed at 420–450 nm on 355 nm (18 ps) excitation of these compounds, were attributed to the nitronic acids 2a–2c, formed through the singlet-state- mediated intramolecular hydrogen abstraction and the triplet states of 1a–1c. Biradical intermediates, formed through the intramolecular abstraction of the benzylic hydrogen by the triplet excited state, were detected for 1a and 1b. Transient species produced following 355 nm (approximately 6 ns) pulse excitation of 1a–1c result in the formation of the corresponding nitronic acids 2a–2c, with absorption maxima around 415–430 nm. These nitronic acids are the precursors of the various products formed in the steady state irradiation of 1a–1c     

Trans --> cis isomerization of trans-[(dppm)2Ru(H)(L)][BF4] (L = P(OR)3) complexes: preparation of cis-[(dppm)2Ru(eta2-H2)(L)][BF4]2

A series of new dicationic dihydrogen complexes of ruthenium of the type cis-[(dppm)(2)Ru(eta(2)-H(2))(L)][BF(4)](2) (dppm = Ph(2)PCH(2)PPh(2); L = P(OMe)(3), P(OEt)(3), PF(O(i)Pr)(2)) have been prepared by protonating the precursor hydride complexes cis-[(dppm)(2)Ru(H)(L)][BF(4)] (L = P(OMe)(3), P(OEt)(3), P(O(i)Pr)(3)) using HBF(4).Et(2)O. The cis-[(dppm)(2)Ru(H)(L)][BF(4)] complexes were obtained from the trans hydrides via an isomerization reaction that is acid-accelerated. This isomerization reaction gives mixtures of cis and trans hydride complexes, the ratios of which depend on the cone angles of the phosphite ligands: the greater the cone angle, the greater is the amount of the cis isomer. The eta(2)-H(2) ligand in the dihydrogen complexes is labile, and the loss of H(2) was found to be reversible. The protonation reactions of the starting hydrides with trans PMe(3) or PMe(2)Ph yield mixtures of the cis and the trans hydride complexes; further addition of the acid, however, give trans-[(dppm)(2)Ru(BF(4))Cl]. The roles of the bite angles of the dppm ligand as well as the steric and the electronic properties of the monodentate phosphorus ligands in this series of complexes are discussed. X-ray crystal structures of trans-[(dppm)(2)Ru(H)(P(OMe)(3))][BF(4)], cis-[(dppm)(2)Ru(H)(P(OMe)(3))][BF(4)], and cis-[(dppm)(2)Ru(H)(P(O(i)Pr)(3))][BF(4)] complexes have been determined.     

Simple methods for the direct assembly, functionalization, and patterning of acid-terminated monolayers on Si111

This article describes mild methods to directly assemble, functionalize, and pattern monolayers of undecylenic acid on hydrogen-terminated Si(111). These monolayers were assembled under very mild conditions from a neat solution of undecylenic acid containing 0.1 mol % 4-(decanoate)-2,2,6,6-tetramethylpiperidinooxy at room temperature without the need for UV light. Because of these mild conditions, monolayers exposing carboxylic acids could be assembled in one step without the need to protect the acid prior to its assembly. The monolayers were extensively characterized by horizontal attenuated total reflection infrared spectroscopy, X-ray photoelectron spectroscopy (XPS), and contact angle goniometry. The monolayers bonded to the silicon surface preferentially through the olefin with no detectable bonds between the carboxylic acids and silicon. The crystallinity of the monolayer was studied by infrared spectroscopy through the antisymmetric--v(a)(CH(2))--and symmetric--v(s)(CH(2))--stretches for methylene. Because it is important for future applications to assemble functional surfaces, methods to react the acid-terminated monolayers with trifluoroacetic anhydride and triethylamine to yield a symmetric anhydride on the monolayer were studied. These anhydrides were reacted with a variety of milligram-quantity amines to yield amide-terminated surfaces. This method was general, and a variety of amines could be bonded to the monolayer. The stabilities of these monolayers upon exposure to ambient conditions and under a variety of solvents were described. Because patterned monolayers have found wide applications, we have developed methods to pattern 1-octadecylamine and poly(ethylenimine) on the micrometer scale using soft lithography. In addition, polymer brushes of polynorbornene with thicknesses from 32 to 150 nm were grown from monolayers patterned with the Grubbs' catalyst. The patterned surfaces were imaged by scanning electron microscopy, scanning probe microscopy, and ellipsometry to determine the thicknesses of the patterns and the fidelity of the method.     

Redox polymerization of 2-hydroxyethyl methacrylate (HEMA). I. Influence of surfactants on polymerization kinetics

Oxidation of ferrous orthophenanthroline (FeP) by peroxydiphosphate (PP) in aqueous medium at pH 1 was followed spectrophotometrically. Kinetic analysis has shown that oxidation occurs via the formation of an intermediate complex between FeP and PP. Equi-librium and rate constants were calculated. Influence of surfactants on the oxidation of FeP by PP was also Investigated. The equilibrium constant for complex formation was found to be higher in the presence of surfactants. The enhanced complex formation has been attributed to the ionic interactions between the charged surfactant and the ionic species in the reaction medium. Polymerization of HEMA initiated by the redox system,FeP/PP, was carried out in aqueous medium, under the conditions of excess reductant over oxidant and excess oxidant over reductant. The polymerization followed different mech-anisms under these conditions; with excess oxidant, the growing polymer radicals underwent oxidative termination, while with excess reductant, primary radical termination was pre-ferred. The effect of surfactants on the aqueous polymerization of HEMA using the redox system FeP/PP was also investigated. In addition to the decrease in rate, the polymerization followed a different mechanism in the presence of surfactants, the growing radicals ter-minated by mutual interaction. © 1995 John Wiley & Sons, Inc.     

DNA ligand Hoechst-33342 enhances UV induced cytotoxicity in human glioma cell lines

The effects of minor groove binding ligand bisbenzimidazole derivative Hoechst-33342 on the cellular response to UV damage have been studied in two human glioma cell lines BMG-1 and U-87 grown as monolayer cultures. Treatment induced cell death (macro-colony assay) and growth inhibition, potential lethal damage recovery, cytogenetic damage (micronuclei formation) and proliferation kinetics were studied as parameters for cellular response. Pre and post-irradiation treatment with Hoechst-33342 (1-20 microM) enhanced the UV-induced growth inhibition and cell death in a concentration dependent manner in both cell lines. At higher Hoechst-33342 concentrations (>5 microM), the cytotoxic effects of the combination (Hoechst-33342+UV) were highly synergistic and mainly mediated through apoptosis implying the possible interactions of lesions caused by both the agents. The enhanced cell death due to Hoechst-33342 was accompanied by a significant increase (2-3 folds at 5 microM) in UV-induced micronuclei formation in BMG-1 cells. Under these conditions, Hoechst-33342 also enhanced the UV-induced cell cycle delay, mainly due to S and G(2) blocks. The increase in UV-induced micronuclei formation observed after treatment with Hoechst-33342 indicates that the DNA bound Hoechst-33342 may interfere with the rejoining of DNA strand breaks. Since the treatment of cells with the replication inhibitor aphidicolin reduced the enhancement of UV induced cytotoxicity by Hoechst-33342, ongoing DNA replication appears to stimulate Hoechst-33342 and UV-induced cytotoxicity.     

Substitution in barium-fluoride apatite: The crystal structures of Ba10(PO4)6F2, Ba6La2Na2(PO4)6F2 and Ba4Nd3Na3(PO4)6F2

The crystal structures of the apatites Ba₁₀(PO₄)₆F₂(I), Ba₆La₂Na₂(PO₄)₆F₂(II) and Ba₄Nd₃Na₃(PO₄)₆F₂ (III) have been determined by single-crystal X-ray diffraction. All three compounds crystallize in a hexagonal apatite-like structure. The unit cells and space groups are: I, a = 10.153(2), c = 7.733(1)Å, $\text{P6}{}_3\text{m}\text{; a = 9.9392(4), c = 7.4419(5)}$Å, $\text{P}\text{6}$; III, a = 9.786(2), c = 7.281(1)Å, $\text{P}\text{3}$. The structures were refined by normal full-matrix crystallographic least squares techniques. The final values of the refinement indicators R_w and R are: I, R_w = 0.026, R = 0.027, 613 observed reflections; II, R_w = 0.081, R = 0.074, 579 observed reflections; III, R_w = 0.062, R = 0.044, 1262 observed reflections.In I, the Ba(1) atoms located in columns on threefold axes, are coordinated to nine oxygen atoms; the Ba(2) sites form triangles about the F site and are coordinated to six oxygen atoms and one fluoride ion. The fluoride ions are statistically displaced ～0.25 Å from the Ba(2) triangles. This displacement of the F ions is analogous to the displacement of OH ion in Ca₁₀(PO₄)₆(OH)₂.The structures of II and III contain disordered cations. In II there is disorder between La and Na in the column cation sites as well as triangle sites. In III, Nd and Na ions are ordered in the column sites, but there is disorder among Ba and the remaining Nd and Na ions in the triangle sites to give an average site population of $\text{2}\text{3}\text{Ba}\text{,}\text{1}\text{6}\text{Nd}\text{,}\text{1}\text{6}\text{Na}$. The coordination of the rare earth ions and Na ions in the ordered column sites are nine and six oxygens, respectively, in accord with the greater charge of the rare earth ions as compared with Na. The F ions in both II and III suffer from considerable disorder in position, and their locations are not precisely known.     

Studies on accelerated sulphur vulcanization of natural rubber using 1-phenyl-2, 4-dithiobiuret/tertiary butyl benzothiazole sulphenamide

The use of binary accelerators has gained tremendous importance since it increases the production rate of the article made of that elastomer. The authors have analyzed the performance of a novel binary accelerator system in the sulphur vulcanization of natural rubber (NR). The vulcanizates resulting from the binary accelerated process obtained good mechanical properties, ageing and swelling resistance. Network characterization of the mixes was done using swelling measurements, stress-strain analysis etc. The chain entanglement density was measured using dynamic mechanical analysis. However the performance is found to be dependent on the relative proportion of mono, di and polysulphidic linkages in the material. The result of the study points out that the proposed system can be active in NR regardless of the vulcanization recipe and temperature. The performance of the new binary system in filled vulcanizates is also studied. Based on the processing, mechanical and chemical characterization an optimum concentration is suggested for the new system.     

Complexometric determination of thallium(III) in pure solution,alloys, and complexes using semicarbazide hydrochloride as a releasing agent

A simple and accurate complexometric method is proposed for the determination of Tl(III) using semicarbazide hydrochloride as a releasing agent. In the presence of diverse metal ions, thallium is complexed first with a known excess of EDTA, and the surplus EDTA is then titrated with standard zinc sulfate at pH 5.0–6.0 (hexamine) using xylenol orange indicator. An excess of 5% aqueous neutral solution of semicarbazide hydrochloride is then added and the released EDTA is titrated against standard zinc sulfate solution. The method works well in the range 2–50 mg of Tl(III) with relative errors < 0.5%, standard deviations 0.05mg and coefficient of variation 0.4%. The method is applied for the determination of thallium content in complexes and alloy compositions     

Hafnium oxide and zirconium oxide atomic layer deposition: initial precursor and potential side-reaction product pathways with H/Si(100)-2 x 1

Hybrid density functional calculations have been carried out using cluster models of the H/Si(100)-2 x 1 surface to investigate the mechanistic details of the initial surface reactions occurring in the atomic layer deposition of hafnium and zirconium oxides (HfO2 and ZrO2). Reaction pathways involving the metal precursors ZrCl4, Zr(CH3)4, HfCl4, and Hf(CH3)4 have been examined. Pathways leading to the formation of a Zr-Si or Hf-Si linkage show a significant sensitivity to the identity of the leaving group, with chloride loss reactions being both kinetically and thermodynamically less favorable than reactions leading to the loss of a methyl group. The energetics of the Zr(CH3)4 and Hf(CH3)4 reactions are similar with an overall exothermicity of 0.3-0.4 eV and a classical barrier height of 1.1-1.2 eV. For the reaction between H2O and the H/Si(100)-2 x 1 surface, the activation energy and overall reaction enthalpy are 1.6 and -0.8 eV, respectively. Due to contamination, trace amounts of H2O may be encountered by metal precursors, leading to the formation of minor species that can lead to unanticipated side-reaction pathways. Such gas-phase reactions between the halogenated and alkylated metal precursors and H2O are exothermic with small or no reaction barriers, allowing for the possibility of metal precursor hydroxylation before the H/Si surface is encountered. Of the contaminant surface reaction pathways, the most kinetically favorable corresponds to the surface -OH deposition. Interestingly, for the hydroxylated metal precursors, a unique reaction pathway resulting in the direct formation of Si-O-Zr and Si-O-Hf linkages has been identified and found to be the most thermodynamically stable pathway available, being exothermic by approximately 1.0 eV.