Application of a novel photopolymer to a holographic head‐up display

A novel photopolymer for fabrication of high‐resolution volume holograms, which primarily are used on holographic optical elements such as head‐up display (HUD), is reported. This photopolymer consists of bisphenol‐type epoxy resin and radically polymerizable aliphatic monomer with diaryliodonium salt and 3‐ketocoumarin (KCD) as a complex initiator. The chemistry of imaging formation is based on the radical polymerization of the monomer initiated by a holographic exposure, following by the cationic polymerization of epoxy resin by UV‐exposure after post‐exposure baking. The yellowish color of hologram derived from KCD, the shape of peak of reconstructed light and the blue shift of wavelength of reconstructed light, were improved in order to satisfy the specifications for the combiner of HUD. A stand type holographic HUD system as an example of automotive display attached on the dashboard of an automobile is demonstrated. The display gives a high contrast image, and the combiner has good durability. Copyright © 1999 John Wiley & Sons, Ltd.     

Excitation and emission spectra of polyethylene terephthalate and polyethylene 2,6‐naphthalate films

With excitation by the light of the wavelengths longer than 320 nm, fluorescence spectra of polyethylene terephthalate (PET) films had somewhat different shapes from those excited below 300 nm through the intrinsic absorption of PET molecules. Also, in the measurements taken with a polarizer in front of the receiving monochoromator but none before the sample, the intensity ratio of parallel (to the draw axis of the film) and perpendicular components of the emission spectra was different if excited above 320 nm or below 300 nm. Discussion was made about the first step of pumping photon energy at the wavelengths above 320 nm. Fluorescence spectra of polyethylene 2,6‐naphthalate films showed a mirror image of their absorption spectra, consisting of one broad band having the same polarization as their absorption spectra. Their fluorescence occurred from the lowest excited level, conforming to the Kasha law. Copyright © 1999 John Wiley & Sons, Ltd.     

Development of a wide range-operable,rich-lean low-NOx combustor for NH3 fuel gas-turbine power generation

Low-NOx NH₃-air combustion power generation technology was developed by using a 50-kWe class micro gas-turbine system at the National Institute of Advanced Industrial Science and Technology (AIST), Japan, for the first time. Based on the global demand for carbon-free power generation as well as recent advances involving gas-turbine technologies, such as heat-regenerative cycles, rapid fuel mixing using strong swirling flows, and two-stage combustion with equivalence ratio control, we developed a low-NOx NH₃-air non-premixed combustor for the gas-turbine system. Considering a previously performed numerical analysis, which proved that the NO reduction level depends on the equivalence ratio of the primary combustion zone in a NH₃-air swirl burner, an experimental study using a combustor test rig was carried out. Results showed that eliminating air flow through primary dilution holes moves the point of the lowest NO emissions to the lesser fuel flow rate. Based on findings derived by using a test rig, a rich-lean low NOx combustor was newly manufactured for actual gas-turbine operations. As a result, the NH₃ single fueled low-NOx combustion gas-turbine power generation using the rich-lean combustion concept succeeded over a wide range of power and rotational speeds, i.e., below 10–40 kWe and 75,000–80,000?rpm, respectively. The NO emissions were reduced to 337?ppm (16% O₂), which was about one-third of that of the base system. Simultaneously, unburnt NH₃ was reduced significantly, especially at the low electrical power output, which was indicative of the wider operating range with high combustion efficiency. In addition, N₂O emissions, which have a large Global Warming Potential (GWP) of 298, were reduced significantly, thus demonstrating the potential of NH₃ gas-turbine power generation with low environmental impacts.     

Fabrication of Compositional‐Gradient Biodegradable Polymeric Films Showing Self‐Bending Deformation

A compositional graded film of poly(ε‐caprolactone) (PCL) with 4,4′‐thiodiphenol (TDP), in the film thickness direction, was fabricated by self‐diffusing of TDP in the PCL melt. We found out the self‐bending deformation of the gradient film, which bent into a rolled‐up shape by itself. The initial shape of the film was flat when the sample was quenched from the melt. Upon the fast crystallization of PCL, the gradient film bent to the side with low TDP content. Then, after PCL crystallized the film bent to the opposite direction, that is, to the side with high TDP content. This bending to the TDP rich region was induced by not only the crystallization of PCL but also mass transfer due to the diffusion of TDP from TDP rich region to poor region.

     

Preparation of Monodisperse Polylactide Microspheres by Dispersion Polymerization Using a Polymeric Stabilizer with Hydroxy Groups

Monodisperse poly(D ,L ‐lactide) (PDLLA) microspheres have been prepared by dispersion polymerization of D ,L ‐lactide with a synthetic polymeric stabilizer. The polymerization is carried out in xylene/heptane (1:2, v/v) at 368 K for 3 h with poly[(dodecyl methacrylate)‐co‐(2‐hydroxyethyl methacrylate)] (P(DMA‐co‐HEMA)). P(DMA‐co‐HEMA) has hydroxy groups as an initiation group for pseudoanionic dispersion polymerization. The particle diameter and the coefficient of variation concerning the diameter distribution of the obtained PDLLA microspheres are 3.9 µm and 4.3%, respectively. In addition, from the results of dynamic light scattering measurements, it is found that P(DMA‐co‐HEMA) and the PDLLA‐grafted copolymer form a micellar structure in solution.

     

Influence of Cu electroplating solutions on boron carbon nitride (BCN) film

Cu electroplating is required for the fabrication of Cu/low-k interconnections. The permeation of a plating solution into low-k films during Cu electroplating is a serious challenge for 45-nm nodes and more complex devices. We investigated the influence of Cu electroplating solutions on boron carbon nitride (BCN) as a low-k film. After dipping it into a Cu electroplating solution that contained additives, the BCN film's hydrophilic surface changed to a hydrophobic surface, and the incorporation of water into the BCN film was suppressed by surfactant adsorption. Sulfuric residue was detected on the BCN sample by thermal desorption spectroscopy after treatment in the Cu electroplating solution with additives; however, it was found through electrical measurements that this solution did not affect the leakage current or the dielectric constant of the BCN film. We successfully fabricated an electroplating Cu layer on a BCN film with good adhesion, and we believe that this BCN film is a sufficiently useful material for Cu/BCN integration in LSI.     

Interaction of a practical fluoran-based black color former with possible color developers, various acids and magnesium ions, in acetonitrile

For the purpose of improving the visible method of γ-rays detection, detailed conditions with various acids have been examined for the color development of a fluoran-based black color former in acetonitrile. It is suggested that the protons (H⁺), which may be produced from acid generators by γ-ray radiation, can be properly detected by the color development of the black color former containing proper kinds and concentrations of bases. Reversible decolorization through the interaction between Mg²⁺ and polyamines (acyclic and macrocyclic) has been examined in order to reconfirm that the colored zwitterion is produced by the direct chemical interaction with Mg (ClO₄)₂ in the fluoran dye–acetonitrile solution.     

F2 laser induced oxidation of inorganic material

Transparent SiO₂ thin films were selectively fabricated on Si wafer by 157 nm F₂ laser in N₂/O₂ gas atmosphere. The F₂ laser photochemically produced active O(¹D) atoms from O₂ molecules in the gas atmosphere; strong oxidation reaction could be induced to fabricate SiO₂ thin films only on the irradiated areas of Si wafer. The oxidation reaction was sensitive to the single pulse fluence of F₂ laser. The irradiated areas were swelled and the height was approximately 500-1000 nm at the 205-mJ/cm² single pulse fluence for 60 min laser irradiation. The fabricated thin films were analytically identified to be SiO₂ by the Fourier-transform IR spectroscopy. The SiO₂ thin films could be also removed by subsequent chemical etching to fabricate micro-holes 50 nm in depth on Si wafer for microfabrication.