Decreased Resting-State Functional Complexity in Elderly with Subjective Cognitive Decline

Individuals with subjective cognitive decline (SCD) are at high risk of developing preclinical or clinical state of Alzheimer’s disease (AD). Resting state functional magnetic resonance imaging, which can indirectly reflect neuron activities by measuring the blood-oxygen-level-dependent (BOLD) signals, is promising in the early detection of SCD. This study aimed to explore whether the nonlinear complexity of BOLD signals can describe the subtle differences between SCD and normal aging, and uncover the underlying neuropsychological implications of these differences. In particular, we introduce amplitude-aware permutation entropy (AAPE) as the novel measure of brain entropy to characterize the complexity in BOLD signals in each brain region of the Brainnetome atlas. Our results demonstrate that AAPE can reflect the subtle differences between both groups, and the SCD group presented significantly decreased complexities in subregions of the superior temporal gyrus, the inferior parietal lobule, the postcentral gyrus, and the insular gyrus. Moreover, the results further reveal that lower complexity in SCD may correspond to poorer cognitive performance or even subtle cognitive impairment. Our findings demonstrated the effectiveness and sensitiveness of the novel brain entropy measured by AAPE, which may serve as the potential neuroimaging marker for exploring the subtle changes in SCD.     

稳恒磁场对Fe-Fe50 wt.%Si扩散偶中间相生长的影响

本文考察了Fe-Fe50 wt.%Si扩散偶在1200℃ 无磁场以及稳恒磁场下扩散层生长规律. 利用真空浇注强制冷却技术制备Fe-Fe50 wt.%Si扩散偶, 将制备的扩散偶进行1200℃不同磁感应强度下的热处理. 对获得热处理后试样进行SEM与EDS线扫描分析, 结果表明, 无论无磁场还是稳恒磁场下Fe-Fe50 wt.%Si扩散偶均生成两个扩散层, 即FeSi相层和Fe-Si固溶体层, 并且发现0.8 T下的两个扩散层宽度均小于0 T磁场下试样. 按照抛物线规律, 计算了扩散偶中间扩散层的互扩散系数, 发现0.8 T磁场下FeSi相层和Fe-Si固溶体层的互扩散系数较无磁场下 分别降低了26.7%与34.1%. 通过对磁吉布斯自由能的计算, 发现0.8 T磁场对扩散激活能Q的影响不足以影响扩散过程. 但扩散过程中原子振动频率ν会受到磁场的影响, 进而影响扩散常数D₀, 磁场对原子振动频率的影响可以用拉莫尔旋进理论进行解释. 关键词： Fe-Fe50wt.%Si扩散偶 稳恒磁场 FeSi相 Fe-Si固溶体     

近玻尔速度Ne2+离子穿过碳膜引起的电子发射

本文测量了入射能为2–25 keV/u的Ne²⁺离子穿过不同厚度碳膜诱导的前向、后向 (分别对应出射表面和入射表面) 电子发射产额. 实验中通过改变炮弹离子的能量, 系统的研究了势能沉积、电子能损以及反冲原子对前向、后向电子发射产额的贡献. 结果表明, 离子的势能沉积只对后向电子发射有贡献, 前向、后向电子发射产额分别与Ne²⁺离子在薄膜出射、入射表面的电子能损近似成正比关系, 其中电子能损很低 (对应于离子能量很低) 的时候, 反冲原子对电子发射的贡献不能忽略. 关键词： 近玻尔速度 电子发射 电子能损 反冲原子     

基于宽边耦合螺旋结构的低频小型化极化不敏感超材料吸波体

设计、仿真并实验验证了基于宽边耦合螺旋结构的低频小型化超材料吸波体. 实验测试结果表明, 该超材料吸波体在1.39 GHz吸收率达到最大为98%, 其单元尺寸和总厚度均为6.8 mm, 约为1/32工作波长, 实现小型化窄带吸波. 由于吸波体中螺旋结构是旋转对称排列的, 因而其对垂直入射电磁波的极化方向是不敏感的. 此外, 该超材料吸波体对斜入射横电和横磁极化电磁波在60°时, 仍具有强吸收. 关键词： 超材料 吸波体 小型化     

铀的结构相变及力学性能的第一性原理计算

基于密度泛函理论, 分别计算了α, γ铀的晶格常数、平衡态体积、体弹模量及其导数等, 与实验和其他第一性原理计算结果符合较好; 并根据焓-压强曲线得到了两相的相变压强～111GPa. 通过体心立方结构理想拉伸强度的计算, 分析其在极端加载条件下的结构行为. 另外, 计算了小应变情况下U-Nb (6.25at.%) 的能量-应变关系, 发现对应于剪切模量c’的应变会使得该结构的能量降低, 揭示了该结构的力学不稳定性. 关键词： 铀 相变 理想强度 结构稳定性     

高生长速度条件下的“层片↔棒状”共晶转变机理研究

低速生长条件下, 共晶“层片↔棒状”转变只由两相的体积分数控制. 高速情况下, 这种转变有时亦发生, 其转变机理不清楚. 本文应用竞争生长准则, 结合高速生长条件下层片共晶和棒状共晶生长模型研究了生长速度引起的“层片↔棒状”转变机理. 结果显示: 体积分数在临界值附近很小的范围内, 生长速度和溶质配分系数的增大可引起“棒状→ 层片”共晶转变; 而当体积分数远离临界值时, 转变不发生. 生长速度名义上引起“层片↔棒状”共晶转变实际上是由生长速度变化引起的体积分数的变化导致的. 关键词： “层片↔棒状”共晶转变 竞争生长 生长速度 体积分数     

The Effect of OMMT on the Morphology and Mechanical Properties of PVC/ABS Blends

Poly(vinyl chloride) (PVC)/acrylonitrile-butadiene-styrene (ABS) blends containing organically modified montmorillonite (OMMT) were prepared using a twin-screw extruder followed by injection molding. The OMMT dispersion was evaluated by X-ray diffraction and transmission electron microscopy. The clay was preferentially situated in the PVC phase and across the interfaces of PVC/ABS. The effect of the addition of OMMT on the morphology and mechanical properties was also evaluated. Scanning electron microscopy revealed a large reduction in domain size when OMMT was used. The mechanical properties were studied through tensile and impact tests. The yield stress increased when an appropriate amount of OMMT was used without impairing the impact strength.     

Interaction Between Neuroglobin and Caffeine by Multispectroscopic Methods

The interaction between neuroglobin (Ngb) and caffeine was studied by spectroscopy. UV-Vis spectra revealed that caffeine did not influence the native hexa-coordinated heme structure of neuroglobin. Fluorescence spectra indicated that caffeine could quench the intrinsic fluorescence of neuroglobin through static quenching mechanisms. The calculated thermodynamic parameters showed that the electrostatic force was the main intermolecular force in the reaction. Results also indicated that the microenvironmental changes of tryptophan and tyrosine residues within neuroglobin are inapparent. Furthermore, the circular dichroism (CD) spectra implied that caffeine could induce the formation of α-helix structure of neuroglobin.     

Effect of deposition power and pressure on rate deposition and resistivity of titanium thin films grown by DC magnetron sputtering

ABSTRACT

Based on magnetron sputtering deposition technology, titanium (Ti) thin films are deposited on silicon (Si) substrate using different preparation conditions such as sputtering power and pressure. The influence of altering these conditions on deposition rate and microstructure is studied. The results show that sputtering power significantly affects the rate of deposition and the resistivity. The deposition rate of the Ti thin film increases when the resistivity decreases under sputtering powers of 150–225?W with a pressure of 0.8?Pa and Argon (Ar) flux of 80 sccm. As sputtering power was increased further (from 225 to 250?W), the deposition rate reduced and the resistivity augmented. Pressure also has influence on the deposition rate and resistivity – when pressure increases from 0.6 to 0.8?Pa, the deposition rate escalates while the resistivity reduces; when the pressure is raised from 0.8 to 1.0?Pa with Ar flux of 100 sccm, the deposition rate decreases and resistivity increases. The surface chemical compositions and the structures of the Ti film were studied by using X-ray photoelectron spectroscopy (XPS) and X-ray diffractometer (XRD). Observing the cross-section of the thin-film samples produced by scanning electron microscope (SEM) reveals the influence of the preparation conditions used on the microstructure and confirms the influence of sputtering power and pressure on the resistivity.