In this paper, the authors give some sufficient conditions for an amalgamated
3-manifold along a compact connected surface F with boundary to be ?-irreducible in
terms of distances between some kinds of vertex subsets of the curve complex and the arc
complex of F. 相似文献
The statement in Rindler's book "Essential Relativity" [(Springer-Verlag, New York, 1977), p. 119] claiming that "the metric coefficients are time-independent if light signals tracing out the same path always take the same coordinate time" has two problems, the first one has been pointed out by us in a recent paper "relation between choosing ‘good' coordinates and the behavior of light signals" [Acta Physica Sinica (Overseas Edition), 3(1994), 881], while the second is the main focus of the present article. 相似文献
Photoresists are essential for the fabrication of flexible electronics through all-photolithographic processes. Single component semiconducting photoresist exhibits both semiconducting and photo-patterning properties, and as a result, the device fabrication process can be simplified. However, the design of semiconducting polymeric photoresist with ambipolar semiconducting property remains challenging. In this paper, we report a single component semiconducting photoresist (PFDPPF4T-N3) by incorporating azide groups and noncovalent conformation locks into the side alkyl chains and conjugated backbones of a diketopyrrolopyrrole-based conjugated polymer, respectively. The results reveal that PFDPP4FT-N3 exhibits ambipolar semiconducting property with hole and electron mobilities up to 1.12 and 1.17 cm2 V?1 s?1, respectively. Moreover, field effect transistors with the individual photo-patterned thin films of PFDPPF4T-N3 also show ambipolar semiconducting behavior with hole and electron mobilities up to 0.66 and 0.80 cm2 V?1 s?1, respectively. These results offer a simple yet effective design strategy for high-performance single component semiconducting photoresists, which hold great potential for flexible electronics processed by all photolithography.