Synthesis of photoreactive poly(ether ether ketone)s containing alkyl groups

Poly(ether ether ketone)s containing alkyl groups were prepared by nucleophilic substitution reaction of alkyl-substituted difluoro diaryl ethers with hydroquinone or by electrophilic substitution reaction of alkyl-substituted diaryl ether with 4,4′-oxydibenzoic acid in PPMA. Polycondensations proceeded smoothly and produced polymers having inherent viscosities up to 0.5-–1.6 dL/g. The polymers were quite soluble in strong acid, dipolar aprotic solvents, and chloroform at room temperature. Thermogravimetry of the polymers showed excellent thermal stability, indicating that 10% weight loses of the polymers were observed in the range above 450°C in nitrogen atmosphere. The glass transition temperatures of the polymers ranged from 128 to 146°C. Furthermore, Polymer 3b functioned as a photosensitive resist of negative type for UV radiation. The resist had a sensitivity of 42 mJ/cm² and a contrast of 2.5, when it was postbaked at 100°C for 10 min, followed by development with THF/acetone at room temperature. © 1996 John Wiley & Sons, Inc.     

Photosensitive organosilicon polymers for microlithographic application

Two new families of photosensitive organo-silicon polymers are described. One is based on the Si-Si σ-bond photochemistry and another is based on the combinations of new alkaline-soluble organosilicon polymers with diazoquinone photosensitizers. Both of these photoactive materials not only give positive photoresist formulations but can act as oxygen reactive ion etch masks in the double-layer resist scheme to finally offer steep submicrometer organic patterns with high aspect ratio.     

Structure of chain-ends in polybutadiene produced with the CoBr2(PPh3)2/MgCl2/SiPh2(OCH3)2-Al(CH3)3 catalyst system

Polymerization of 1,3-butadiene with the CoBr₂(PPh₃)₂/MgCl₂/SiPh₂(OCH₃)₂-Al(CH₃)₃ catalyst system was conducted in the presence of ethylene. It was found that addition of ethylene causes a marked decrease in the molecular weight of polybutadiene although ethylene is not incorporated at the chain-end. The structure of chain-ends was analyzed using very low molecular-weight polybutadiene produced in the presence of ethylene, which led to the conclusion that 1,2 and 2,1 insertion reactions predominate at the initiation and propagation steps, respectively.     

Simultaneous Double-Color Continuous Wave Raman Fiber Laser at 1239 nm and 1484 nm Using Phosphosilicate Fiber

Simultaneous double-color high-power continuous wave (CW) Raman fiber laser at 1239 nm and 1484 nm is demonstrated which uses CW 8.4 W Yb-doped double-clad fiber laser at 1064 nm as a pump, 1 km phosphosilicate fiber, and cascaded cavities consisting of two pairs of fiber Bragg grating (FBG) mirrors. Maximum output powers are 0.65 W at 1239 nm and 0.97 W at 1484 nm with a 50%/50% output mirror reflectivity pair, and 0.37 W at 1239 nm and 1.06 W at 1484 nm with a 75.5%/50% pair. The output characteristics of this laser for different FBG mirror reflectivities are reported.     

A uniform and one‐dimensional stacking of 2,5‐di­chloro­tetra­cyano­quinodimethanide mol­ecules in the tetra­methyl­arsonium salt

In the tetra­methyl­arsonium salt of 2,5‐di­chloro‐7,7,8,8‐tetra­cyano­quinodimethanide [systematic name: tetra­methyl­arson­ium 2,2′‐(2,5‐dichlorocyclohexa‐2,5‐diene‐1,4‐diylidene)bis(propanedinitrile)], C₄H₁₂As⁺·C₁₂H₂Cl₂N₄^? or [As(CH₃)₄](C₁₂H₂Cl₂N₄), the cation lies disordered about a twofold axis and the radical ion lies about an inversion center forming a uniform [interplanar distance 3.35 (2) Å] and one‐dimensional stacking without any slip. The electrical conductivity of the single crystal at room temperature was less than 10^?9 S cm^?1, and the temperature dependence of para­magnetic susceptibility obeyed a one‐dimensional antiferromagnetic Heisenberg model with a spin‐exchange integral of 83 K in the temperature range 1.8–320.0 K.