Subsolidus phase diagram of Cu2OCuOMoO3 system

Five chemical compounds, CuMoO₄, Cu₃Mo₂O₉, Cu₂Mo₃O₁₀, Cu₆Mo₄O₁₅, and Cu_4?x Mo₃O₁₂ (0.10 ? x ? 0.40), were identified in the system Cu₂OCuOMoO₃ and characterized by DTA, X-ray powder patterns, ir spectra, and magnetic properties. Cupric molybdates CuMoO₄ and Cu₃Mo₂O₉ are stable in air up to 820 and 855°C, respectively, melting at these temperatures with simultaneous decomposition (oxygen loss). Congruent mp of cuprous molybdates Cu₂Mo₃O₁₀ and Cu₆Mo₄O₁₅, in argon, are 532 and 466°C, respectively. Nonstoichiometric phase Cu_4?x Mo₃O₁₂ = Cu²⁺₃Cu⁰_1?xMo⁶⁺₃O₁₂, melts in argon between 630 and 650°C depending on the value of x and at 525–530°C undergoes polymorphic transformation. Areas of coexistence of the above-mentioned phases are determined. The μ_eff of Cu²⁺ ions and θ values are: 1.80 B.M. and 28°K for CuMoO₄, 1.71 B.M. and ? 12°K for Cu₃Mo₂O₉, and 1.74 B.M. and ? 93°K for Cu_4?xMo₃O₁₂. Below 200°K CuMoO₄ becomes antiferromagnetic. Cu₂Mo₃O₁₀ and Cu₆Mo₄O₁₅ show weak temperature-independent paramagnetism.     

RNA Ligation for Mono and Dually Labeled RNAs

Labeled RNAs are invaluable probes for investigation of RNA function and localization. However, mRNA labeling remains challenging. Here, we developed an improved method for 3′-end labeling of in vitro transcribed RNAs. We synthesized novel adenosine 3′,5′-bisphosphate analogues modified at the N6 or C2 position of adenosine with an azide-containing linker, fluorescent label, or biotin and assessed these constructs as substrates for RNA labeling directly by T4 ligase or via postenzymatic strain-promoted alkyne-azide cycloaddition (SPAAC). All analogues were substrates for T4 RNA ligase. Analogues containing bulky fluorescent labels or biotin showed better overall labeling yields than postenzymatic SPAAC. We successfully labeled uncapped RNAs, NAD-capped RNAs, and 5′-fluorescently labeled m⁷Gp₃A_m-capped mRNAs. The obtained highly homogenous dually labeled mRNA was translationally active and enabled fluorescence-based monitoring of decapping. This method will facilitate the use of various functionalized mRNA-based probes.     

Atomic Hydrogen Induced Chemical Vapor Deposition of Silicon Oxycarbide Thin Films Derived from Diethoxymethylsilane Precursor

Amorphous silicon oxycarbide (a-SiOC:H) films produced by remote plasma RPCVD from diethoxymethylsilane (DEMS) were characterized in terms of their basic properties related to the coatings deposited using conventional plasma enhanced PECVD method. The effect of substrate temperature (T_S) on the growth rate, chemical composition, structure, and properties of resulting a-SiOC:H films is reported. Film growth is an adsorption-controlled process, wherein two mechanisms can be distinguished with a transition at about T_S=70°C. Depending on the temperature, films of different nature can be obtained, from polymer-like to highly crosslinked material with C-Si-O network. The chemical structure of a-SiOC:H films was characterized by FTIR, ¹³C and ²⁹Si solid-state NMR, and X-ray photoelectron spectroscopes. The a-SiOC:H films were also characterized in terms of their density, refractive index, surface morphology, conformality of coverage, hardness, adhesion to a substrate, and friction coefficient. The films were found to be morphologically homogeneous materials exhibiting good conformality of coverage and small surface roughness. Their refractive index exhibits anomalous effect revealing a minimum value at T_S=125°C. Due to their exceptional physical properties a-SiOC:H films produced by RPCVD from DEMS precursor seems to be useful as potential dielectric materials or coatings for various encapsulation applications.